Structure and optical properties of AlN films obtained using the cathodic arc plasma deposition technique
Aluminum nitride (AlN) film coatings have been obtained by a new technique of hybrid helikon-arc ion-plasma deposition. Possibility to combine the magnetic-filtered arc plasma deposition technique with a treatment in RF plasma of helicon discharge allowed us to deposit AlN coatings on thermolabile s...
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| Veröffentlicht in: | Semiconductor Physics Quantum Electronics & Optoelectronics |
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| Datum: | 2015 |
| Hauptverfasser: | , , , , , , , , |
| Format: | Artikel |
| Sprache: | Englisch |
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Інститут фізики напівпровідників імені В.Є. Лашкарьова НАН України
2015
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| Online Zugang: | https://nasplib.isofts.kiev.ua/handle/123456789/121821 |
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| Назва журналу: | Digital Library of Periodicals of National Academy of Sciences of Ukraine |
| Zitieren: | Structure and optical properties of AlN films obtained using the cathodic arc plasma deposition technique / A.P. Shapovalov, I.V. Korotash, E.M. Rudenko, F.F. Sizov, D.S. Dubyna, L.S. Osipov, D.Yu. Polotskiy, Z.F. Tsybrii, A.A. Korchovyi // Semiconductor Physics Quantum Electronics & Optoelectronics. — 2015. — Т. 18, № 2. — С. 117-122. — Бібліогр.: 18 назв. — англ. |
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Digital Library of Periodicals of National Academy of Sciences of Ukraine| _version_ | 1862710475254398976 |
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| author | Shapovalov, A.P. Korotash, I.V. Rudenko, E.M. Sizov, F.F. Dubyna, D.S. Osipov, L.S. Polotskiy, D.Yu. Tsybrii, Z.F. Korchovyi, A.A. |
| author_facet | Shapovalov, A.P. Korotash, I.V. Rudenko, E.M. Sizov, F.F. Dubyna, D.S. Osipov, L.S. Polotskiy, D.Yu. Tsybrii, Z.F. Korchovyi, A.A. |
| citation_txt | Structure and optical properties of AlN films obtained using the cathodic arc plasma deposition technique / A.P. Shapovalov, I.V. Korotash, E.M. Rudenko, F.F. Sizov, D.S. Dubyna, L.S. Osipov, D.Yu. Polotskiy, Z.F. Tsybrii, A.A. Korchovyi // Semiconductor Physics Quantum Electronics & Optoelectronics. — 2015. — Т. 18, № 2. — С. 117-122. — Бібліогр.: 18 назв. — англ. |
| collection | DSpace DC |
| container_title | Semiconductor Physics Quantum Electronics & Optoelectronics |
| description | Aluminum nitride (AlN) film coatings have been obtained by a new technique of hybrid helikon-arc ion-plasma deposition. Possibility to combine the magnetic-filtered arc plasma deposition technique with a treatment in RF plasma of helicon discharge allowed us to deposit AlN coatings on thermolabile substrates, significantly increasing the deposition rate. A study of spectral properties of AlN films (reflection and transmission spectra within the range 2…25 µm) has been carried out by using the infrared Fourier spectrometer Spectrum BX-II. It has been shown that the obtained composite structures (AlN coatings on teflon and mylar substrates) could be used as passive filters in the infrared spectral range.
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| first_indexed | 2025-12-07T17:24:35Z |
| format | Article |
| fulltext | |
| id | nasplib_isofts_kiev_ua-123456789-121821 |
| institution | Digital Library of Periodicals of National Academy of Sciences of Ukraine |
| issn | 1560-8034 |
| language | English |
| last_indexed | 2025-12-07T17:24:35Z |
| publishDate | 2015 |
| publisher | Інститут фізики напівпровідників імені В.Є. Лашкарьова НАН України |
| record_format | dspace |
| spelling | Shapovalov, A.P. Korotash, I.V. Rudenko, E.M. Sizov, F.F. Dubyna, D.S. Osipov, L.S. Polotskiy, D.Yu. Tsybrii, Z.F. Korchovyi, A.A. 2017-06-18T10:44:03Z 2017-06-18T10:44:03Z 2015 Structure and optical properties of AlN films obtained using the cathodic arc plasma deposition technique / A.P. Shapovalov, I.V. Korotash, E.M. Rudenko, F.F. Sizov, D.S. Dubyna, L.S. Osipov, D.Yu. Polotskiy, Z.F. Tsybrii, A.A. Korchovyi // Semiconductor Physics Quantum Electronics & Optoelectronics. — 2015. — Т. 18, № 2. — С. 117-122. — Бібліогр.: 18 назв. — англ. 1560-8034 DOI: 10.15407/spqeo18.02.117 PACS 52.77.Dq, 73.61.Ey, 73.61.Jc, 78.40.Pg, 78.66.Fd https://nasplib.isofts.kiev.ua/handle/123456789/121821 Aluminum nitride (AlN) film coatings have been obtained by a new technique of hybrid helikon-arc ion-plasma deposition. Possibility to combine the magnetic-filtered arc plasma deposition technique with a treatment in RF plasma of helicon discharge allowed us to deposit AlN coatings on thermolabile substrates, significantly increasing the deposition rate. A study of spectral properties of AlN films (reflection and transmission spectra within the range 2…25 µm) has been carried out by using the infrared Fourier spectrometer Spectrum BX-II. It has been shown that the obtained composite structures (AlN coatings on teflon and mylar substrates) could be used as passive filters in the infrared spectral range. en Інститут фізики напівпровідників імені В.Є. Лашкарьова НАН України Semiconductor Physics Quantum Electronics & Optoelectronics Structure and optical properties of AlN films obtained using the cathodic arc plasma deposition technique Article published earlier |
| spellingShingle | Structure and optical properties of AlN films obtained using the cathodic arc plasma deposition technique Shapovalov, A.P. Korotash, I.V. Rudenko, E.M. Sizov, F.F. Dubyna, D.S. Osipov, L.S. Polotskiy, D.Yu. Tsybrii, Z.F. Korchovyi, A.A. |
| title | Structure and optical properties of AlN films obtained using the cathodic arc plasma deposition technique |
| title_full | Structure and optical properties of AlN films obtained using the cathodic arc plasma deposition technique |
| title_fullStr | Structure and optical properties of AlN films obtained using the cathodic arc plasma deposition technique |
| title_full_unstemmed | Structure and optical properties of AlN films obtained using the cathodic arc plasma deposition technique |
| title_short | Structure and optical properties of AlN films obtained using the cathodic arc plasma deposition technique |
| title_sort | structure and optical properties of aln films obtained using the cathodic arc plasma deposition technique |
| url | https://nasplib.isofts.kiev.ua/handle/123456789/121821 |
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