Structure and optical properties of AlN films obtained using the cathodic arc plasma deposition technique

Aluminum nitride (AlN) film coatings have been obtained by a new technique of hybrid helikon-arc ion-plasma deposition. Possibility to combine the magnetic-filtered arc plasma deposition technique with a treatment in RF plasma of helicon discharge allowed us to deposit AlN coatings on thermolabile s...

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Бібліографічні деталі
Опубліковано в: :Semiconductor Physics Quantum Electronics & Optoelectronics
Дата:2015
Автори: Shapovalov, A.P., Korotash, I.V., Rudenko, E.M., Sizov, F.F., Dubyna, D.S., Osipov, L.S., Polotskiy, D.Yu., Tsybrii, Z.F., Korchovyi, A.A.
Формат: Стаття
Мова:English
Опубліковано: Інститут фізики напівпровідників імені В.Є. Лашкарьова НАН України 2015
Онлайн доступ:https://nasplib.isofts.kiev.ua/handle/123456789/121821
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Назва журналу:Digital Library of Periodicals of National Academy of Sciences of Ukraine
Цитувати:Structure and optical properties of AlN films obtained using the cathodic arc plasma deposition technique / A.P. Shapovalov, I.V. Korotash, E.M. Rudenko, F.F. Sizov, D.S. Dubyna, L.S. Osipov, D.Yu. Polotskiy, Z.F. Tsybrii, A.A. Korchovyi // Semiconductor Physics Quantum Electronics & Optoelectronics. — 2015. — Т. 18, № 2. — С. 117-122. — Бібліогр.: 18 назв. — англ.

Репозитарії

Digital Library of Periodicals of National Academy of Sciences of Ukraine
id nasplib_isofts_kiev_ua-123456789-121821
record_format dspace
spelling Shapovalov, A.P.
Korotash, I.V.
Rudenko, E.M.
Sizov, F.F.
Dubyna, D.S.
Osipov, L.S.
Polotskiy, D.Yu.
Tsybrii, Z.F.
Korchovyi, A.A.
2017-06-18T10:44:03Z
2017-06-18T10:44:03Z
2015
Structure and optical properties of AlN films obtained using the cathodic arc plasma deposition technique / A.P. Shapovalov, I.V. Korotash, E.M. Rudenko, F.F. Sizov, D.S. Dubyna, L.S. Osipov, D.Yu. Polotskiy, Z.F. Tsybrii, A.A. Korchovyi // Semiconductor Physics Quantum Electronics & Optoelectronics. — 2015. — Т. 18, № 2. — С. 117-122. — Бібліогр.: 18 назв. — англ.
1560-8034
DOI: 10.15407/spqeo18.02.117
PACS 52.77.Dq, 73.61.Ey, 73.61.Jc, 78.40.Pg, 78.66.Fd
https://nasplib.isofts.kiev.ua/handle/123456789/121821
Aluminum nitride (AlN) film coatings have been obtained by a new technique of hybrid helikon-arc ion-plasma deposition. Possibility to combine the magnetic-filtered arc plasma deposition technique with a treatment in RF plasma of helicon discharge allowed us to deposit AlN coatings on thermolabile substrates, significantly increasing the deposition rate. A study of spectral properties of AlN films (reflection and transmission spectra within the range 2…25 µm) has been carried out by using the infrared Fourier spectrometer Spectrum BX-II. It has been shown that the obtained composite structures (AlN coatings on teflon and mylar substrates) could be used as passive filters in the infrared spectral range.
en
Інститут фізики напівпровідників імені В.Є. Лашкарьова НАН України
Semiconductor Physics Quantum Electronics & Optoelectronics
Structure and optical properties of AlN films obtained using the cathodic arc plasma deposition technique
Article
published earlier
institution Digital Library of Periodicals of National Academy of Sciences of Ukraine
collection DSpace DC
title Structure and optical properties of AlN films obtained using the cathodic arc plasma deposition technique
spellingShingle Structure and optical properties of AlN films obtained using the cathodic arc plasma deposition technique
Shapovalov, A.P.
Korotash, I.V.
Rudenko, E.M.
Sizov, F.F.
Dubyna, D.S.
Osipov, L.S.
Polotskiy, D.Yu.
Tsybrii, Z.F.
Korchovyi, A.A.
title_short Structure and optical properties of AlN films obtained using the cathodic arc plasma deposition technique
title_full Structure and optical properties of AlN films obtained using the cathodic arc plasma deposition technique
title_fullStr Structure and optical properties of AlN films obtained using the cathodic arc plasma deposition technique
title_full_unstemmed Structure and optical properties of AlN films obtained using the cathodic arc plasma deposition technique
title_sort structure and optical properties of aln films obtained using the cathodic arc plasma deposition technique
author Shapovalov, A.P.
Korotash, I.V.
Rudenko, E.M.
Sizov, F.F.
Dubyna, D.S.
Osipov, L.S.
Polotskiy, D.Yu.
Tsybrii, Z.F.
Korchovyi, A.A.
author_facet Shapovalov, A.P.
Korotash, I.V.
Rudenko, E.M.
Sizov, F.F.
Dubyna, D.S.
Osipov, L.S.
Polotskiy, D.Yu.
Tsybrii, Z.F.
Korchovyi, A.A.
publishDate 2015
language English
container_title Semiconductor Physics Quantum Electronics & Optoelectronics
publisher Інститут фізики напівпровідників імені В.Є. Лашкарьова НАН України
format Article
description Aluminum nitride (AlN) film coatings have been obtained by a new technique of hybrid helikon-arc ion-plasma deposition. Possibility to combine the magnetic-filtered arc plasma deposition technique with a treatment in RF plasma of helicon discharge allowed us to deposit AlN coatings on thermolabile substrates, significantly increasing the deposition rate. A study of spectral properties of AlN films (reflection and transmission spectra within the range 2…25 µm) has been carried out by using the infrared Fourier spectrometer Spectrum BX-II. It has been shown that the obtained composite structures (AlN coatings on teflon and mylar substrates) could be used as passive filters in the infrared spectral range.
issn 1560-8034
url https://nasplib.isofts.kiev.ua/handle/123456789/121821
citation_txt Structure and optical properties of AlN films obtained using the cathodic arc plasma deposition technique / A.P. Shapovalov, I.V. Korotash, E.M. Rudenko, F.F. Sizov, D.S. Dubyna, L.S. Osipov, D.Yu. Polotskiy, Z.F. Tsybrii, A.A. Korchovyi // Semiconductor Physics Quantum Electronics & Optoelectronics. — 2015. — Т. 18, № 2. — С. 117-122. — Бібліогр.: 18 назв. — англ.
work_keys_str_mv AT shapovalovap structureandopticalpropertiesofalnfilmsobtainedusingthecathodicarcplasmadepositiontechnique
AT korotashiv structureandopticalpropertiesofalnfilmsobtainedusingthecathodicarcplasmadepositiontechnique
AT rudenkoem structureandopticalpropertiesofalnfilmsobtainedusingthecathodicarcplasmadepositiontechnique
AT sizovff structureandopticalpropertiesofalnfilmsobtainedusingthecathodicarcplasmadepositiontechnique
AT dubynads structureandopticalpropertiesofalnfilmsobtainedusingthecathodicarcplasmadepositiontechnique
AT osipovls structureandopticalpropertiesofalnfilmsobtainedusingthecathodicarcplasmadepositiontechnique
AT polotskiydyu structureandopticalpropertiesofalnfilmsobtainedusingthecathodicarcplasmadepositiontechnique
AT tsybriizf structureandopticalpropertiesofalnfilmsobtainedusingthecathodicarcplasmadepositiontechnique
AT korchovyiaa structureandopticalpropertiesofalnfilmsobtainedusingthecathodicarcplasmadepositiontechnique
first_indexed 2025-12-07T17:24:35Z
last_indexed 2025-12-07T17:24:35Z
_version_ 1850871146656825344