Structure and optical properties of AlN films obtained using the cathodic arc plasma deposition technique
Aluminum nitride (AlN) film coatings have been obtained by a new technique of hybrid helikon-arc ion-plasma deposition. Possibility to combine the magnetic-filtered arc plasma deposition technique with a treatment in RF plasma of helicon discharge allowed us to deposit AlN coatings on thermolabile s...
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| Опубліковано в: : | Semiconductor Physics Quantum Electronics & Optoelectronics |
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| Дата: | 2015 |
| Автори: | , , , , , , , , |
| Формат: | Стаття |
| Мова: | English |
| Опубліковано: |
Інститут фізики напівпровідників імені В.Є. Лашкарьова НАН України
2015
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| Онлайн доступ: | https://nasplib.isofts.kiev.ua/handle/123456789/121821 |
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| Назва журналу: | Digital Library of Periodicals of National Academy of Sciences of Ukraine |
| Цитувати: | Structure and optical properties of AlN films obtained using the cathodic arc plasma deposition technique / A.P. Shapovalov, I.V. Korotash, E.M. Rudenko, F.F. Sizov, D.S. Dubyna, L.S. Osipov, D.Yu. Polotskiy, Z.F. Tsybrii, A.A. Korchovyi // Semiconductor Physics Quantum Electronics & Optoelectronics. — 2015. — Т. 18, № 2. — С. 117-122. — Бібліогр.: 18 назв. — англ. |
Репозитарії
Digital Library of Periodicals of National Academy of Sciences of Ukraine| id |
nasplib_isofts_kiev_ua-123456789-121821 |
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dspace |
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Shapovalov, A.P. Korotash, I.V. Rudenko, E.M. Sizov, F.F. Dubyna, D.S. Osipov, L.S. Polotskiy, D.Yu. Tsybrii, Z.F. Korchovyi, A.A. 2017-06-18T10:44:03Z 2017-06-18T10:44:03Z 2015 Structure and optical properties of AlN films obtained using the cathodic arc plasma deposition technique / A.P. Shapovalov, I.V. Korotash, E.M. Rudenko, F.F. Sizov, D.S. Dubyna, L.S. Osipov, D.Yu. Polotskiy, Z.F. Tsybrii, A.A. Korchovyi // Semiconductor Physics Quantum Electronics & Optoelectronics. — 2015. — Т. 18, № 2. — С. 117-122. — Бібліогр.: 18 назв. — англ. 1560-8034 DOI: 10.15407/spqeo18.02.117 PACS 52.77.Dq, 73.61.Ey, 73.61.Jc, 78.40.Pg, 78.66.Fd https://nasplib.isofts.kiev.ua/handle/123456789/121821 Aluminum nitride (AlN) film coatings have been obtained by a new technique of hybrid helikon-arc ion-plasma deposition. Possibility to combine the magnetic-filtered arc plasma deposition technique with a treatment in RF plasma of helicon discharge allowed us to deposit AlN coatings on thermolabile substrates, significantly increasing the deposition rate. A study of spectral properties of AlN films (reflection and transmission spectra within the range 2…25 µm) has been carried out by using the infrared Fourier spectrometer Spectrum BX-II. It has been shown that the obtained composite structures (AlN coatings on teflon and mylar substrates) could be used as passive filters in the infrared spectral range. en Інститут фізики напівпровідників імені В.Є. Лашкарьова НАН України Semiconductor Physics Quantum Electronics & Optoelectronics Structure and optical properties of AlN films obtained using the cathodic arc plasma deposition technique Article published earlier |
| institution |
Digital Library of Periodicals of National Academy of Sciences of Ukraine |
| collection |
DSpace DC |
| title |
Structure and optical properties of AlN films obtained using the cathodic arc plasma deposition technique |
| spellingShingle |
Structure and optical properties of AlN films obtained using the cathodic arc plasma deposition technique Shapovalov, A.P. Korotash, I.V. Rudenko, E.M. Sizov, F.F. Dubyna, D.S. Osipov, L.S. Polotskiy, D.Yu. Tsybrii, Z.F. Korchovyi, A.A. |
| title_short |
Structure and optical properties of AlN films obtained using the cathodic arc plasma deposition technique |
| title_full |
Structure and optical properties of AlN films obtained using the cathodic arc plasma deposition technique |
| title_fullStr |
Structure and optical properties of AlN films obtained using the cathodic arc plasma deposition technique |
| title_full_unstemmed |
Structure and optical properties of AlN films obtained using the cathodic arc plasma deposition technique |
| title_sort |
structure and optical properties of aln films obtained using the cathodic arc plasma deposition technique |
| author |
Shapovalov, A.P. Korotash, I.V. Rudenko, E.M. Sizov, F.F. Dubyna, D.S. Osipov, L.S. Polotskiy, D.Yu. Tsybrii, Z.F. Korchovyi, A.A. |
| author_facet |
Shapovalov, A.P. Korotash, I.V. Rudenko, E.M. Sizov, F.F. Dubyna, D.S. Osipov, L.S. Polotskiy, D.Yu. Tsybrii, Z.F. Korchovyi, A.A. |
| publishDate |
2015 |
| language |
English |
| container_title |
Semiconductor Physics Quantum Electronics & Optoelectronics |
| publisher |
Інститут фізики напівпровідників імені В.Є. Лашкарьова НАН України |
| format |
Article |
| description |
Aluminum nitride (AlN) film coatings have been obtained by a new technique of hybrid helikon-arc ion-plasma deposition. Possibility to combine the magnetic-filtered arc plasma deposition technique with a treatment in RF plasma of helicon discharge allowed us to deposit AlN coatings on thermolabile substrates, significantly increasing the deposition rate. A study of spectral properties of AlN films (reflection and transmission spectra within the range 2…25 µm) has been carried out by using the infrared Fourier spectrometer Spectrum BX-II. It has been shown that the obtained composite structures (AlN coatings on teflon and mylar substrates) could be used as passive filters in the infrared spectral range.
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| issn |
1560-8034 |
| url |
https://nasplib.isofts.kiev.ua/handle/123456789/121821 |
| citation_txt |
Structure and optical properties of AlN films obtained using the cathodic arc plasma deposition technique / A.P. Shapovalov, I.V. Korotash, E.M. Rudenko, F.F. Sizov, D.S. Dubyna, L.S. Osipov, D.Yu. Polotskiy, Z.F. Tsybrii, A.A. Korchovyi // Semiconductor Physics Quantum Electronics & Optoelectronics. — 2015. — Т. 18, № 2. — С. 117-122. — Бібліогр.: 18 назв. — англ. |
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