Plasma assisted deposition of TaB₂ coatings by magnetron sputtering system

• Published in: Вопросы атомной науки и техники
• Date: 2017
• Main Authors: Yakovin, S., Zykov, A., Dudin, S., Farenik, V., Goncharov, A., Shelest, I., Kuznetsov, V.
• Format: Article
• Language: English
• Published: Національний науковий центр «Харківський фізико-технічний інститут» НАН України 2017
• Subjects: Низкотемпературная плазма и плазменные технологии
• Online Access: https://nasplib.isofts.kiev.ua/handle/123456789/122171
• Journal Title: Digital Library of Periodicals of National Academy of Sciences of Ukraine
• Cite this: Plasma assisted deposition of TaB₂ coatings by magnetron sputtering system / S. Yakovin, A. Zykov, S. Dudin, V. Farenik, A. Goncharov, I. Shelest, V. Kuznetsov // Вопросы атомной науки и техники. — 2017. — № 1. — С. 187-190. — Бібліогр.: 15 назв. — англ.

In the present paper the results of TaB₂ coating deposition in cluster set-up comprising a low pressure planar magnetron and an inductive plasma source are presented. The system allows to control independently the fluxes of the deposited Ta and B atoms from the sputtered TaB₂ target, and the fluxes...