Some aspects of deposition of conductive, dielectric and protective coatings on insulators with using arc discharge dc and RF bias
Investigation results for technological process of low temperature plasma deposition of functional coverings for dielectric substrate at low temperatures (50…250 oC) are shown. Combined high frequency and arc plasma sources were used to provide high deposition rate and an opportunity to operate with...
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| Published in: | Вопросы атомной науки и техники |
|---|---|
| Date: | 2017 |
| Main Authors: | Taran, V.S., Muratov, R.M., Nezovibat'ko, Y.N., Leonovych, A.V., Sergiiets, M.A. |
| Format: | Article |
| Language: | English |
| Published: |
Національний науковий центр «Харківський фізико-технічний інститут» НАН України
2017
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| Subjects: | |
| Online Access: | https://nasplib.isofts.kiev.ua/handle/123456789/122183 |
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| Journal Title: | Digital Library of Periodicals of National Academy of Sciences of Ukraine |
| Cite this: | Some aspects of deposition of conductive, dielectric and protective coatings on insulators with using arc discharge dc and RF bias / V.S. Taran, R.M. Muratov, Y.N. Nezovibat'ko, A.V. Leonovych, M.A. Sergiiets // Вопросы атомной науки и техники. — 2017. — № 1. — С. 265-268. — Бібліогр.: 4 назв. — англ. |
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