Equilibrium helium film in the thick film limit
For the thickness of a liquid or solid quantum film, like liquid helium or solid hydrogen, there exist still open questions about how the film thickness develops in certain limits. One of these is the thick film limit, i.e., the crossover from the thick film to bulk. We have performed measurements i...
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| Опубліковано в: : | Физика низких температур |
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| Дата: | 2003 |
| Автори: | , , , |
| Формат: | Стаття |
| Мова: | Англійська |
| Опубліковано: |
Фізико-технічний інститут низьких температур ім. Б.І. Вєркіна НАН України
2003
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| Онлайн доступ: | https://nasplib.isofts.kiev.ua/handle/123456789/128915 |
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| Назва журналу: | Digital Library of Periodicals of National Academy of Sciences of Ukraine |
| Цитувати: | Equilibrium helium film in the thick film limit / J. Klier, F. Schletterer, P. Leiderer, V. Shikin // Физика низких температур. — 2003. — Т. 29, № 9-10. — С. 957-960. — Бібліогр.: 6 назв. — англ. |
Репозитарії
Digital Library of Periodicals of National Academy of Sciences of Ukraine| _version_ | 1862653873980702720 |
|---|---|
| author | Klier, J. Schletterer, F. Leiderer, P. Shikin, V. |
| author_facet | Klier, J. Schletterer, F. Leiderer, P. Shikin, V. |
| citation_txt | Equilibrium helium film in the thick film limit / J. Klier, F. Schletterer, P. Leiderer, V. Shikin // Физика низких температур. — 2003. — Т. 29, № 9-10. — С. 957-960. — Бібліогр.: 6 назв. — англ. |
| collection | DSpace DC |
| container_title | Физика низких температур |
| description | For the thickness of a liquid or solid quantum film, like liquid helium or solid hydrogen, there exist still open questions about how the film thickness develops in certain limits. One of these is the thick film limit, i.e., the crossover from the thick film to bulk. We have performed measurements in this range using the surface plasmon resonance technique and an evaporated Ag film deposited on glass as substrate. The thickness of the adsorbed helium film is varied by changing the distance h of the bulk reservoir to the surface of the substrate. In the limiting case, when h → 0, the film thickness approaches about 100 nm following the van der Waals law in the retarded regime. The film thickness and its dependence on h is precisely determined and theoretically modeled. The equilibrium film thickness behaviour is discussed in detail. The agreement between theory and experiment is very good.
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| first_indexed | 2025-12-01T23:46:00Z |
| format | Article |
| fulltext | |
| id | nasplib_isofts_kiev_ua-123456789-128915 |
| institution | Digital Library of Periodicals of National Academy of Sciences of Ukraine |
| issn | 0132-6414 |
| language | English |
| last_indexed | 2025-12-01T23:46:00Z |
| publishDate | 2003 |
| publisher | Фізико-технічний інститут низьких температур ім. Б.І. Вєркіна НАН України |
| record_format | dspace |
| spelling | Klier, J. Schletterer, F. Leiderer, P. Shikin, V. 2018-01-14T12:52:27Z 2018-01-14T12:52:27Z 2003 Equilibrium helium film in the thick film limit / J. Klier, F. Schletterer, P. Leiderer, V. Shikin // Физика низких температур. — 2003. — Т. 29, № 9-10. — С. 957-960. — Бібліогр.: 6 назв. — англ. 0132-6414 PACS: 67.70.+n, 68.15.+e, 68.43.-h, 68.55.-a https://nasplib.isofts.kiev.ua/handle/123456789/128915 For the thickness of a liquid or solid quantum film, like liquid helium or solid hydrogen, there exist still open questions about how the film thickness develops in certain limits. One of these is the thick film limit, i.e., the crossover from the thick film to bulk. We have performed measurements in this range using the surface plasmon resonance technique and an evaporated Ag film deposited on glass as substrate. The thickness of the adsorbed helium film is varied by changing the distance h of the bulk reservoir to the surface of the substrate. In the limiting case, when h → 0, the film thickness approaches about 100 nm following the van der Waals law in the retarded regime. The film thickness and its dependence on h is precisely determined and theoretically modeled. The equilibrium film thickness behaviour is discussed in detail. The agreement between theory and experiment is very good. This work was supported by the DFG-Schwerpunkt ‘Wetting and Structure Formation at Interfaces’ under Kl 1186/1. en Фізико-технічний інститут низьких температур ім. Б.І. Вєркіна НАН України Физика низких температур Physics in Quantum Crystals Equilibrium helium film in the thick film limit Article published earlier |
| spellingShingle | Equilibrium helium film in the thick film limit Klier, J. Schletterer, F. Leiderer, P. Shikin, V. Physics in Quantum Crystals |
| title | Equilibrium helium film in the thick film limit |
| title_full | Equilibrium helium film in the thick film limit |
| title_fullStr | Equilibrium helium film in the thick film limit |
| title_full_unstemmed | Equilibrium helium film in the thick film limit |
| title_short | Equilibrium helium film in the thick film limit |
| title_sort | equilibrium helium film in the thick film limit |
| topic | Physics in Quantum Crystals |
| topic_facet | Physics in Quantum Crystals |
| url | https://nasplib.isofts.kiev.ua/handle/123456789/128915 |
| work_keys_str_mv | AT klierj equilibriumheliumfilminthethickfilmlimit AT schlettererf equilibriumheliumfilminthethickfilmlimit AT leidererp equilibriumheliumfilminthethickfilmlimit AT shikinv equilibriumheliumfilminthethickfilmlimit |