Degradation of phenolic compounds in water by non-thermal plasma treatment

• Veröffentlicht in: Химия и технология воды
• Datum: 2012
• ISSN: 0204-3556
• Hauptverfasser: Hsu-Hui Cheng, Shiao-Shing Chen, Kazuharu Yoshizuka, Yung-Chih Chen
• Format: Artikel
• Sprache: Englisch
• Veröffentlicht: Інститут колоїдної хімії та хімії води ім. А.В. Думанського НАН України 2012
• Schlagworte: Физическая химия процессов обработки воды
• Online Zugang: https://nasplib.isofts.kiev.ua/handle/123456789/130717
• Назва журналу: Digital Library of Periodicals of National Academy of Sciences of Ukraine
• Zitieren: Degradation of phenolic compounds in water by non-thermal plasma treatment / Hsu-Hui Cheng, Shiao-Shing Chen, Kazuharu Yoshizuka, Yung-Chih Chen // Химия и технология воды. — 2012. — Т. 34, № 4. — С. 304-319. — Бібліогр.: 24 назв. — англ.

A stainless-steel hollow needle type anode was used in the reactor to treat industrial wastewater by gas-liquid phase non-thermal plasma by corona discharge. The results showed that the short electrode gap, 1 cm, has a higher plasma energy density which improves the removal of the phenolic derivatives, reaching 100% after about 60 min. The H₂O₂ concentration was higher in the discharge system when the content of oxygen was increased. The efficiency of the phenol removal by chemical oxygen demand was only 10 – 31% after 60 minutes. The identifie dinterme diates were catechol, hydroquinone,1,4-benzoquinone, 2-nitrophenol,1,2-benzenedicarboxylic acid, diphenylmethanone, 2-methyl-hydroquinone, 2-methyl-1,4-bezoquinone, and trace amounts of organic.