VUV stimulated solid-phase reactions on the surface on Ni nano-layers on Si substrate
Using X-ray reflectometry method, the kinektics of solid state reactions at the surface of layered thin film nickel/Sisub system (effective nickel thickness 15 and 45 nm) under VUV irradiation of 8≤hv≤1.8 eV energy was studied. Nickel and nickel oxide layers have shown no changes both in thickness a...
Збережено в:
| Опубліковано в: : | Functional Materials |
|---|---|
| Дата: | 2006 |
| Автори: | , , , |
| Формат: | Стаття |
| Мова: | Англійська |
| Опубліковано: |
НТК «Інститут монокристалів» НАН України
2006
|
| Онлайн доступ: | https://nasplib.isofts.kiev.ua/handle/123456789/134056 |
| Теги: |
Додати тег
Немає тегів, Будьте першим, хто поставить тег для цього запису!
|
| Назва журналу: | Digital Library of Periodicals of National Academy of Sciences of Ukraine |
| Цитувати: | VUV stimulated solid-phase reactions on the surface on Ni nano-layers on Si substrate / I.F. Mikhailov, S.V. Malykhin , S.S. Borisova , L.P. Fomina // Functional Materials. — 2006. — Т. 13, № 3. — С. 381-386. — Бібліогр.: 28 назв. — англ. |
Репозитарії
Digital Library of Periodicals of National Academy of Sciences of Ukraine| _version_ | 1862647767761944576 |
|---|---|
| author | Mikhailov, I.F. Malykhin, S.V. Borisova, S.S. Fomina, L.P. |
| author_facet | Mikhailov, I.F. Malykhin, S.V. Borisova, S.S. Fomina, L.P. |
| citation_txt | VUV stimulated solid-phase reactions on the surface on Ni nano-layers on Si substrate / I.F. Mikhailov, S.V. Malykhin , S.S. Borisova , L.P. Fomina // Functional Materials. — 2006. — Т. 13, № 3. — С. 381-386. — Бібліогр.: 28 назв. — англ. |
| collection | DSpace DC |
| container_title | Functional Materials |
| description | Using X-ray reflectometry method, the kinektics of solid state reactions at the surface of layered thin film nickel/Sisub system (effective nickel thickness 15 and 45 nm) under VUV irradiation of 8≤hv≤1.8 eV energy was studied. Nickel and nickel oxide layers have shown no changes both in thickness and sesity. As a result of VUV stimulated silicon diffusion from the substrate and of its reaction with nitrogen, a new layer of silicon nitride with of (3.2...3.4) g*cm⁻³ desity in formed at the nickel film surface. The silicon nitride formation reaction, where nickel acts as a catalyst, is of zero order typical of radiation-(photo)-chemical processes and stops at the layer thickness about 1.5 nm. After aging in air, the surface layer density decreases down to 2.3 g*cm⁻³ and thickness increases to about 25 nm due to oxidation. Repeated cycles of irradiation and oxidation result in degradation of the film-substrate system due to breakink the film adhesion
|
| first_indexed | 2025-12-01T13:25:03Z |
| format | Article |
| fulltext | |
| id | nasplib_isofts_kiev_ua-123456789-134056 |
| institution | Digital Library of Periodicals of National Academy of Sciences of Ukraine |
| language | English |
| last_indexed | 2025-12-01T13:25:03Z |
| publishDate | 2006 |
| publisher | НТК «Інститут монокристалів» НАН України |
| record_format | dspace |
| spelling | Mikhailov, I.F. Malykhin, S.V. Borisova, S.S. Fomina, L.P. 2018-06-11T19:29:25Z 2018-06-11T19:29:25Z 2006 VUV stimulated solid-phase reactions on the surface on Ni nano-layers on Si substrate / I.F. Mikhailov, S.V. Malykhin , S.S. Borisova , L.P. Fomina // Functional Materials. — 2006. — Т. 13, № 3. — С. 381-386. — Бібліогр.: 28 назв. — англ. https://nasplib.isofts.kiev.ua/handle/123456789/134056 Using X-ray reflectometry method, the kinektics of solid state reactions at the surface of layered thin film nickel/Sisub system (effective nickel thickness 15 and 45 nm) under VUV irradiation of 8≤hv≤1.8 eV energy was studied. Nickel and nickel oxide layers have shown no changes both in thickness and sesity. As a result of VUV stimulated silicon diffusion from the substrate and of its reaction with nitrogen, a new layer of silicon nitride with of (3.2...3.4) g*cm⁻³ desity in formed at the nickel film surface. The silicon nitride formation reaction, where nickel acts as a catalyst, is of zero order typical of radiation-(photo)-chemical processes and stops at the layer thickness about 1.5 nm. After aging in air, the surface layer density decreases down to 2.3 g*cm⁻³ and thickness increases to about 25 nm due to oxidation. Repeated cycles of irradiation and oxidation result in degradation of the film-substrate system due to breakink the film adhesion en НТК «Інститут монокристалів» НАН України Functional Materials VUV stimulated solid-phase reactions on the surface on Ni nano-layers on Si substrate Твердофазні реакції на поверхні наношарів нікелю, стимульовані ВУФ опроміненням Article published earlier |
| spellingShingle | VUV stimulated solid-phase reactions on the surface on Ni nano-layers on Si substrate Mikhailov, I.F. Malykhin, S.V. Borisova, S.S. Fomina, L.P. |
| title | VUV stimulated solid-phase reactions on the surface on Ni nano-layers on Si substrate |
| title_alt | Твердофазні реакції на поверхні наношарів нікелю, стимульовані ВУФ опроміненням |
| title_full | VUV stimulated solid-phase reactions on the surface on Ni nano-layers on Si substrate |
| title_fullStr | VUV stimulated solid-phase reactions on the surface on Ni nano-layers on Si substrate |
| title_full_unstemmed | VUV stimulated solid-phase reactions on the surface on Ni nano-layers on Si substrate |
| title_short | VUV stimulated solid-phase reactions on the surface on Ni nano-layers on Si substrate |
| title_sort | vuv stimulated solid-phase reactions on the surface on ni nano-layers on si substrate |
| url | https://nasplib.isofts.kiev.ua/handle/123456789/134056 |
| work_keys_str_mv | AT mikhailovif vuvstimulatedsolidphasereactionsonthesurfaceonninanolayersonsisubstrate AT malykhinsv vuvstimulatedsolidphasereactionsonthesurfaceonninanolayersonsisubstrate AT borisovass vuvstimulatedsolidphasereactionsonthesurfaceonninanolayersonsisubstrate AT fominalp vuvstimulatedsolidphasereactionsonthesurfaceonninanolayersonsisubstrate AT mikhailovif tverdofazníreakcíínapoverhnínanošarívníkelûstimulʹovanívufopromínennâm AT malykhinsv tverdofazníreakcíínapoverhnínanošarívníkelûstimulʹovanívufopromínennâm AT borisovass tverdofazníreakcíínapoverhnínanošarívníkelûstimulʹovanívufopromínennâm AT fominalp tverdofazníreakcíínapoverhnínanošarívníkelûstimulʹovanívufopromínennâm |