Stydy on resistivity and micostructure of magnetron sputtered α-C:Si films

Electric resistivity and microstructure of silicon-doped (5 to 38 at. % Si) amorphous carbon (α-C) films deposited by de magnetron sputtering in argon plasma of composed (graphite + single crystalline silicon) target has been studied as a function of silicon content in films. The film resistivity pa...

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Veröffentlicht in:Functional Materials
Datum:2006
Hauptverfasser: Onoprienko, A.A., Yanchuk, I.B.
Format: Artikel
Sprache:English
Veröffentlicht: НТК «Інститут монокристалів» НАН України 2006
Online Zugang:https://nasplib.isofts.kiev.ua/handle/123456789/135059
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Назва журналу:Digital Library of Periodicals of National Academy of Sciences of Ukraine
Zitieren:Stydy on resistivity and micostructure of magnetron sputtered α-C:Si films / A.A. Onoprienko, I.B. Yanchuk // Functional Materials. — 2006. — Т. 13, № 4. — С. 652-656. — Бібліогр.: 17 назв. — англ.

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Digital Library of Periodicals of National Academy of Sciences of Ukraine
id nasplib_isofts_kiev_ua-123456789-135059
record_format dspace
spelling Onoprienko, A.A.
Yanchuk, I.B.
2018-06-14T14:46:31Z
2018-06-14T14:46:31Z
2006
Stydy on resistivity and micostructure of magnetron sputtered α-C:Si films / A.A. Onoprienko, I.B. Yanchuk // Functional Materials. — 2006. — Т. 13, № 4. — С. 652-656. — Бібліогр.: 17 назв. — англ.
1027-5495
https://nasplib.isofts.kiev.ua/handle/123456789/135059
Electric resistivity and microstructure of silicon-doped (5 to 38 at. % Si) amorphous carbon (α-C) films deposited by de magnetron sputtering in argon plasma of composed (graphite + single crystalline silicon) target has been studied as a function of silicon content in films. The film resistivity parallel and perpendicular to substrate surface was measured. The film structure was studied by electron diffraction and Raman spectroscopy. Doping with silicon did not influence the resistivity p⊥ over the whole range of silicon concentrations studied, but resulted in marked increase in resistivity p║. Incorporation of silicon atoms into graphite-like cluster structure of carbon films results in distortion and disordering thereof in planes parallel to the substrate surface, thus promoting an increase in p║.
en
НТК «Інститут монокристалів» НАН України
Functional Materials
Stydy on resistivity and micostructure of magnetron sputtered α-C:Si films
Дослідження електроопору та мікроструктури α-C:Si плівок, одержаних магнетронним розпиленням
Article
published earlier
institution Digital Library of Periodicals of National Academy of Sciences of Ukraine
collection DSpace DC
title Stydy on resistivity and micostructure of magnetron sputtered α-C:Si films
spellingShingle Stydy on resistivity and micostructure of magnetron sputtered α-C:Si films
Onoprienko, A.A.
Yanchuk, I.B.
title_short Stydy on resistivity and micostructure of magnetron sputtered α-C:Si films
title_full Stydy on resistivity and micostructure of magnetron sputtered α-C:Si films
title_fullStr Stydy on resistivity and micostructure of magnetron sputtered α-C:Si films
title_full_unstemmed Stydy on resistivity and micostructure of magnetron sputtered α-C:Si films
title_sort stydy on resistivity and micostructure of magnetron sputtered α-c:si films
author Onoprienko, A.A.
Yanchuk, I.B.
author_facet Onoprienko, A.A.
Yanchuk, I.B.
publishDate 2006
language English
container_title Functional Materials
publisher НТК «Інститут монокристалів» НАН України
format Article
title_alt Дослідження електроопору та мікроструктури α-C:Si плівок, одержаних магнетронним розпиленням
description Electric resistivity and microstructure of silicon-doped (5 to 38 at. % Si) amorphous carbon (α-C) films deposited by de magnetron sputtering in argon plasma of composed (graphite + single crystalline silicon) target has been studied as a function of silicon content in films. The film resistivity parallel and perpendicular to substrate surface was measured. The film structure was studied by electron diffraction and Raman spectroscopy. Doping with silicon did not influence the resistivity p⊥ over the whole range of silicon concentrations studied, but resulted in marked increase in resistivity p║. Incorporation of silicon atoms into graphite-like cluster structure of carbon films results in distortion and disordering thereof in planes parallel to the substrate surface, thus promoting an increase in p║.
issn 1027-5495
url https://nasplib.isofts.kiev.ua/handle/123456789/135059
citation_txt Stydy on resistivity and micostructure of magnetron sputtered α-C:Si films / A.A. Onoprienko, I.B. Yanchuk // Functional Materials. — 2006. — Т. 13, № 4. — С. 652-656. — Бібліогр.: 17 назв. — англ.
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first_indexed 2025-12-07T18:18:30Z
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