Stydy on resistivity and micostructure of magnetron sputtered α-C:Si films

Electric resistivity and microstructure of silicon-doped (5 to 38 at. % Si) amorphous carbon (α-C) films deposited by de magnetron sputtering in argon plasma of composed (graphite + single crystalline silicon) target has been studied as a function of silicon content in films. The film resistivity pa...

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Bibliographic Details
Published in:Functional Materials
Date:2006
Main Authors: Onoprienko, A.A., Yanchuk, I.B.
Format: Article
Language:English
Published: НТК «Інститут монокристалів» НАН України 2006
Online Access:https://nasplib.isofts.kiev.ua/handle/123456789/135059
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Journal Title:Digital Library of Periodicals of National Academy of Sciences of Ukraine
Cite this:Stydy on resistivity and micostructure of magnetron sputtered α-C:Si films / A.A. Onoprienko, I.B. Yanchuk // Functional Materials. — 2006. — Т. 13, № 4. — С. 652-656. — Бібліогр.: 17 назв. — англ.

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Digital Library of Periodicals of National Academy of Sciences of Ukraine