Stydy on resistivity and micostructure of magnetron sputtered α-C:Si films
Electric resistivity and microstructure of silicon-doped (5 to 38 at. % Si) amorphous carbon (α-C) films deposited by de magnetron sputtering in argon plasma of composed (graphite + single crystalline silicon) target has been studied as a function of silicon content in films. The film resistivity pa...
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| Veröffentlicht in: | Functional Materials |
|---|---|
| Datum: | 2006 |
| Hauptverfasser: | , |
| Format: | Artikel |
| Sprache: | English |
| Veröffentlicht: |
НТК «Інститут монокристалів» НАН України
2006
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| Online Zugang: | https://nasplib.isofts.kiev.ua/handle/123456789/135059 |
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| Назва журналу: | Digital Library of Periodicals of National Academy of Sciences of Ukraine |
| Zitieren: | Stydy on resistivity and micostructure of magnetron sputtered α-C:Si films / A.A. Onoprienko, I.B. Yanchuk // Functional Materials. — 2006. — Т. 13, № 4. — С. 652-656. — Бібліогр.: 17 назв. — англ. |
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