Influence of intensive etching processes on structure and properties of carbon nitride films
The influence of electromagnetic radiation and oxygen impurity in the growth atmosphere on the growth processes of nanostructured carbon nitride CNx films has been studied. The oxygen impurity in the gas mixture and an UV irradiation has been found to decrease the thickness and refraction index of c...
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| Veröffentlicht in: | Functional Materials |
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| Datum: | 2008 |
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| Sprache: | English |
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НТК «Інститут монокристалів» НАН України
2008
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| Online Zugang: | https://nasplib.isofts.kiev.ua/handle/123456789/136548 |
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| Назва журналу: | Digital Library of Periodicals of National Academy of Sciences of Ukraine |
| Zitieren: | Influence of intensive etching processes on structure and properties of carbon nitride films // R.V. Shalaev, V.N. Varyukhin, A.M. Prudnikov, A.I. Linnik, I.V. Zhikharev, N.N. Belousov, D.V. Raspornya, A.N. Ulyanov // Functional Materials. — 2008. — Т. 15, № 4. — С. 580-584. — Бібліогр.: 15 назв. — англ. |
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Shalaev, R.V. Varyukhin, V.N. Prudnikov, A.M. Linnik, A.I. Zhikharev, I.V. Belousov, N.N. Raspornya, D.V. Ulyanov, A.N. 2018-06-16T13:37:43Z 2018-06-16T13:37:43Z 2008 Influence of intensive etching processes on structure and properties of carbon nitride films // R.V. Shalaev, V.N. Varyukhin, A.M. Prudnikov, A.I. Linnik, I.V. Zhikharev, N.N. Belousov, D.V. Raspornya, A.N. Ulyanov // Functional Materials. — 2008. — Т. 15, № 4. — С. 580-584. — Бібліогр.: 15 назв. — англ. 1027-5495 https://nasplib.isofts.kiev.ua/handle/123456789/136548 The influence of electromagnetic radiation and oxygen impurity in the growth atmosphere on the growth processes of nanostructured carbon nitride CNx films has been studied. The oxygen impurity in the gas mixture and an UV irradiation has been found to decrease the thickness and refraction index of carbon nitride films, while increasing the optical band gap width. The intensive etching processes result in the formation of closepacked columnar film nanostructures of carbon nitride. Подано результати досліджень впливу електромагнітного випромінювання і домішок кисню у ростовій атмосфері на процеси росту наноструктурних плівок нітриду вуглецю CNx. Виявлено, що домішка кисню у газовій суміші і ультрафіолетове опромінювання зменшують товщину і коефіцієнт заломлення плівок нітриду вуглецю, збільшують ширину забороненої зони. Показано, що інтенсивні процеси травлення приводять до утворення щільноупакованих колонарних плівкових наноструктур нітриду вуглецю. Представлены результаты исследований влияния электромагнитного излучения и примесей кислорода в ростовой атмосфере на процессы роста наноструктурных пленок нитрида углерода CNx. Обнаружено, что примесь кислорода в газовой смеси и УФ облучение уменьшают толщину и коэффициент преломления пленок нитрида углерода и увеличивают ширину запрещенной зоны. Интенсивные травящие процессы приводят к образованию плотноупакованных колонарных пленочных наноструктур нитрида углерода. en НТК «Інститут монокристалів» НАН України Functional Materials Technology Influence of intensive etching processes on structure and properties of carbon nitride films Вплив інтенсивних процесів травлення на структуру та властивості плівок нітриду вуглецю Article published earlier |
| institution |
Digital Library of Periodicals of National Academy of Sciences of Ukraine |
| collection |
DSpace DC |
| title |
Influence of intensive etching processes on structure and properties of carbon nitride films |
| spellingShingle |
Influence of intensive etching processes on structure and properties of carbon nitride films Shalaev, R.V. Varyukhin, V.N. Prudnikov, A.M. Linnik, A.I. Zhikharev, I.V. Belousov, N.N. Raspornya, D.V. Ulyanov, A.N. Technology |
| title_short |
Influence of intensive etching processes on structure and properties of carbon nitride films |
| title_full |
Influence of intensive etching processes on structure and properties of carbon nitride films |
| title_fullStr |
Influence of intensive etching processes on structure and properties of carbon nitride films |
| title_full_unstemmed |
Influence of intensive etching processes on structure and properties of carbon nitride films |
| title_sort |
influence of intensive etching processes on structure and properties of carbon nitride films |
| author |
Shalaev, R.V. Varyukhin, V.N. Prudnikov, A.M. Linnik, A.I. Zhikharev, I.V. Belousov, N.N. Raspornya, D.V. Ulyanov, A.N. |
| author_facet |
Shalaev, R.V. Varyukhin, V.N. Prudnikov, A.M. Linnik, A.I. Zhikharev, I.V. Belousov, N.N. Raspornya, D.V. Ulyanov, A.N. |
| topic |
Technology |
| topic_facet |
Technology |
| publishDate |
2008 |
| language |
English |
| container_title |
Functional Materials |
| publisher |
НТК «Інститут монокристалів» НАН України |
| format |
Article |
| title_alt |
Вплив інтенсивних процесів травлення на структуру та властивості плівок нітриду вуглецю |
| description |
The influence of electromagnetic radiation and oxygen impurity in the growth atmosphere on the growth processes of nanostructured carbon nitride CNx films has been studied. The oxygen impurity in the gas mixture and an UV irradiation has been found to decrease the thickness and refraction index of carbon nitride films, while increasing the optical band gap width. The intensive etching processes result in the formation of closepacked columnar film nanostructures of carbon nitride.
Подано результати досліджень впливу електромагнітного випромінювання і домішок кисню у ростовій атмосфері на процеси росту наноструктурних плівок нітриду вуглецю CNx. Виявлено, що домішка кисню у газовій суміші і ультрафіолетове опромінювання зменшують товщину і коефіцієнт заломлення плівок нітриду вуглецю, збільшують ширину забороненої зони. Показано, що інтенсивні процеси травлення приводять до утворення щільноупакованих колонарних плівкових наноструктур нітриду вуглецю.
Представлены результаты исследований влияния электромагнитного излучения и примесей кислорода в ростовой атмосфере на процессы роста наноструктурных пленок нитрида углерода CNx. Обнаружено, что примесь кислорода в газовой смеси и УФ облучение уменьшают толщину и коэффициент преломления пленок нитрида углерода и увеличивают ширину запрещенной зоны. Интенсивные травящие процессы приводят к образованию плотноупакованных колонарных пленочных наноструктур нитрида углерода.
|
| issn |
1027-5495 |
| url |
https://nasplib.isofts.kiev.ua/handle/123456789/136548 |
| citation_txt |
Influence of intensive etching processes on structure and properties of carbon nitride films // R.V. Shalaev, V.N. Varyukhin, A.M. Prudnikov, A.I. Linnik, I.V. Zhikharev, N.N. Belousov, D.V. Raspornya, A.N. Ulyanov // Functional Materials. — 2008. — Т. 15, № 4. — С. 580-584. — Бібліогр.: 15 назв. — англ. |
| work_keys_str_mv |
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| first_indexed |
2025-11-25T23:46:43Z |
| last_indexed |
2025-11-25T23:46:43Z |
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