Influence of intensive etching processes on structure and properties of carbon nitride films

• Veröffentlicht in: Functional Materials
• Datum: 2008
• Hauptverfasser: Shalaev, R.V., Varyukhin, V.N., Prudnikov, A.M., Linnik, A.I., Zhikharev, I.V., Belousov, N.N., Raspornya, D.V., Ulyanov, A.N.
• Format: Artikel
• Sprache: Englisch
• Veröffentlicht: НТК «Інститут монокристалів» НАН України 2008
• Schlagworte: Technology
• Online Zugang: https://nasplib.isofts.kiev.ua/handle/123456789/136548
• Назва журналу: Digital Library of Periodicals of National Academy of Sciences of Ukraine
• Zitieren: Influence of intensive etching processes on structure and properties of carbon nitride films // R.V. Shalaev, V.N. Varyukhin, A.M. Prudnikov, A.I. Linnik, I.V. Zhikharev, N.N. Belousov, D.V. Raspornya, A.N. Ulyanov // Functional Materials. — 2008. — Т. 15, № 4. — С. 580-584. — Бібліогр.: 15 назв. — англ.

The influence of electromagnetic radiation and oxygen impurity in the growth atmosphere on the growth processes of nanostructured carbon nitride CNx films has been studied. The oxygen impurity in the gas mixture and an UV irradiation has been found to decrease the thickness and refraction index of c...