Formation of porous zinc nanosystems using direct and reverse flows of DC magnetron sputtering

The work is devoted to comparative analysis of two technological solutions for Zn nanosystems formation which have been implemented on the basis of direct-current magnetron sputtering. In the first case, conventional magnetron sputtering was used and direct flows were deposited on the substrate posi...

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Бібліографічні деталі
Опубліковано в: :Functional Materials
Дата:2017
Автори: Latyshev, V.M., Perekrestov, V.I., Kornyushchenko, A.S., Zahaiko, I.V.
Формат: Стаття
Мова:English
Опубліковано: НТК «Інститут монокристалів» НАН України 2017
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Онлайн доступ:https://nasplib.isofts.kiev.ua/handle/123456789/136669
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Назва журналу:Digital Library of Periodicals of National Academy of Sciences of Ukraine
Цитувати:Formation of porous zinc nanosystems using direct and reverse flows of DC magnetron sputtering / V.M. Latyshev, V.I. Perekrestov, A.S. Kornyushchenko, I.V. Zahaiko // Functional Materials. — 2017. — Т. 24, № 1. — С. 154-161. — Бібліогр.: 35 назв. — англ.

Репозитарії

Digital Library of Periodicals of National Academy of Sciences of Ukraine
id nasplib_isofts_kiev_ua-123456789-136669
record_format dspace
spelling Latyshev, V.M.
Perekrestov, V.I.
Kornyushchenko, A.S.
Zahaiko, I.V.
2018-06-16T15:01:34Z
2018-06-16T15:01:34Z
2017
Formation of porous zinc nanosystems using direct and reverse flows of DC magnetron sputtering / V.M. Latyshev, V.I. Perekrestov, A.S. Kornyushchenko, I.V. Zahaiko // Functional Materials. — 2017. — Т. 24, № 1. — С. 154-161. — Бібліогр.: 35 назв. — англ.
1027-5495
DOI: https://doi.org/10.15407/fm24.01.154
https://nasplib.isofts.kiev.ua/handle/123456789/136669
The work is devoted to comparative analysis of two technological solutions for Zn nanosystems formation which have been implemented on the basis of direct-current magnetron sputtering. In the first case, conventional magnetron sputtering was used and direct flows were deposited on the substrate positioned in the front of a sputterer. In the second case, reverse flows were used and the substrate was located inside the magnetron sputterer. It has been shown experimentally, that the second technological approach gives more reproducible results as compared to the classical one. In addition, usage of the reverse flows leads to significant increase in the nanosystems deposition rates.
en
НТК «Інститут монокристалів» НАН України
Functional Materials
Technology
Formation of porous zinc nanosystems using direct and reverse flows of DC magnetron sputtering
Article
published earlier
institution Digital Library of Periodicals of National Academy of Sciences of Ukraine
collection DSpace DC
title Formation of porous zinc nanosystems using direct and reverse flows of DC magnetron sputtering
spellingShingle Formation of porous zinc nanosystems using direct and reverse flows of DC magnetron sputtering
Latyshev, V.M.
Perekrestov, V.I.
Kornyushchenko, A.S.
Zahaiko, I.V.
Technology
title_short Formation of porous zinc nanosystems using direct and reverse flows of DC magnetron sputtering
title_full Formation of porous zinc nanosystems using direct and reverse flows of DC magnetron sputtering
title_fullStr Formation of porous zinc nanosystems using direct and reverse flows of DC magnetron sputtering
title_full_unstemmed Formation of porous zinc nanosystems using direct and reverse flows of DC magnetron sputtering
title_sort formation of porous zinc nanosystems using direct and reverse flows of dc magnetron sputtering
author Latyshev, V.M.
Perekrestov, V.I.
Kornyushchenko, A.S.
Zahaiko, I.V.
author_facet Latyshev, V.M.
Perekrestov, V.I.
Kornyushchenko, A.S.
Zahaiko, I.V.
topic Technology
topic_facet Technology
publishDate 2017
language English
container_title Functional Materials
publisher НТК «Інститут монокристалів» НАН України
format Article
description The work is devoted to comparative analysis of two technological solutions for Zn nanosystems formation which have been implemented on the basis of direct-current magnetron sputtering. In the first case, conventional magnetron sputtering was used and direct flows were deposited on the substrate positioned in the front of a sputterer. In the second case, reverse flows were used and the substrate was located inside the magnetron sputterer. It has been shown experimentally, that the second technological approach gives more reproducible results as compared to the classical one. In addition, usage of the reverse flows leads to significant increase in the nanosystems deposition rates.
issn 1027-5495
url https://nasplib.isofts.kiev.ua/handle/123456789/136669
citation_txt Formation of porous zinc nanosystems using direct and reverse flows of DC magnetron sputtering / V.M. Latyshev, V.I. Perekrestov, A.S. Kornyushchenko, I.V. Zahaiko // Functional Materials. — 2017. — Т. 24, № 1. — С. 154-161. — Бібліогр.: 35 назв. — англ.
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first_indexed 2025-12-07T19:01:29Z
last_indexed 2025-12-07T19:01:29Z
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