Production of nano-pore track membranes based on PET films irradiated by Ar ions

Changes in diameters and depths of pores were studied in the process of etching polyethyleneterephthalate films irradiated with Ar ions having the energy of 1 MeV/n. Information about the pore diameters and lengths was obtained with electron microscopy methods. 0.5 N and 2 N solutions of NaOH were u...

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Published in:Functional Materials
Date:2007
Main Authors: Bomko, V.A., Burban, A.F., Kobets, A.F., Kryshtal, A., Vorobyova, I.V., Zaitsev, B.V.
Format: Article
Language:English
Published: НТК «Інститут монокристалів» НАН України 2007
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Online Access:https://nasplib.isofts.kiev.ua/handle/123456789/136944
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Journal Title:Digital Library of Periodicals of National Academy of Sciences of Ukraine
Cite this:Production of nano-pore track membranes based on PET films irradiated by Ar ions / V.A. Bomko, A.F. Burban, A.F. Kobets, A. Kryshtal, I.V. Vorobyova, B.V. Zaitsev // Functional Materials. — 2007. — Т. 14, № 4. — С. 562-568. — Бібліогр.: 19 назв. — англ.

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Digital Library of Periodicals of National Academy of Sciences of Ukraine
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Summary:Changes in diameters and depths of pores were studied in the process of etching polyethyleneterephthalate films irradiated with Ar ions having the energy of 1 MeV/n. Information about the pore diameters and lengths was obtained with electron microscopy methods. 0.5 N and 2 N solutions of NaOH were used as etchants. Etching was performed at 55 and 70°C. Two methods of sensitization were used: the first one by UV illumination and treating in dimethylformamide, the second method just by in UV illumination. It was found that diameters and depths of pores are larger in films treated according to the first sensitization method. Etching duration (breakthrough time) which leads to through-going pores of the minimal radius was established. After sensitization according to the first method the track etch rate grows quicker than the transverse etch rate. This gives a possibility to obtain through pores with diameters ranging from 50 nm to several micrometers.
ISSN:1027-5495