Electrochemical deposition of cadmium telluride films
The mechanisms of electrochemical processes in the electrolyte for cadmium telluride semi-conducting film deposition and in corresponding partial solutions containing cadmium and tellurium ions have been studied by voltammetry with linear potential scanning and by cyclic voltammetry. The differences...
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| Опубліковано в: : | Functional Materials |
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| Дата: | 2008 |
| Автори: | , , , , |
| Формат: | Стаття |
| Мова: | Англійська |
| Опубліковано: |
НТК «Інститут монокристалів» НАН України
2008
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| Теми: | |
| Онлайн доступ: | https://nasplib.isofts.kiev.ua/handle/123456789/137232 |
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| Назва журналу: | Digital Library of Periodicals of National Academy of Sciences of Ukraine |
| Цитувати: | Electrochemical deposition of cadmium telluride films / N.P. Klochko, N.D. Volkova, M.V. Dobrotvorskaya, V.R. Kopach, T.A. Li // Functional Materials. — 2008. — Т. 15, № 1. — С. 119-126. — Бібліогр.: 13 назв. — англ. |
Репозитарії
Digital Library of Periodicals of National Academy of Sciences of Ukraine| _version_ | 1862567666589368320 |
|---|---|
| author | Klochko, N.P. Volkova, N.D. Dobrotvorskaya, M.V. Kopach, V.R. T.A. Li |
| author_facet | Klochko, N.P. Volkova, N.D. Dobrotvorskaya, M.V. Kopach, V.R. T.A. Li |
| citation_txt | Electrochemical deposition of cadmium telluride films / N.P. Klochko, N.D. Volkova, M.V. Dobrotvorskaya, V.R. Kopach, T.A. Li // Functional Materials. — 2008. — Т. 15, № 1. — С. 119-126. — Бібліогр.: 13 назв. — англ. |
| collection | DSpace DC |
| container_title | Functional Materials |
| description | The mechanisms of electrochemical processes in the electrolyte for cadmium telluride semi-conducting film deposition and in corresponding partial solutions containing cadmium and tellurium ions have been studied by voltammetry with linear potential scanning and by cyclic voltammetry. The differences between cathodic processes on chemically inert titanium nitride substrates and catalytically active molybdenum surface have been revealed. Basing on these studies, the nature of impurities discovered in this work by X-ray photoelectron spectroscopy at the surface and inside the cadmium telluride films deposited on molybdenum and titanium nitride surfaces has been explained. The latter made it possible to select the electrodeposition parameters and the substrate material which provide the stoichiometric film composition.
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| first_indexed | 2025-11-26T00:11:07Z |
| format | Article |
| fulltext | |
| id | nasplib_isofts_kiev_ua-123456789-137232 |
| institution | Digital Library of Periodicals of National Academy of Sciences of Ukraine |
| issn | 1027-5495 |
| language | English |
| last_indexed | 2025-11-26T00:11:07Z |
| publishDate | 2008 |
| publisher | НТК «Інститут монокристалів» НАН України |
| record_format | dspace |
| spelling | Klochko, N.P. Volkova, N.D. Dobrotvorskaya, M.V. Kopach, V.R. T.A. Li 2018-06-17T09:14:47Z 2018-06-17T09:14:47Z 2008 Electrochemical deposition of cadmium telluride films / N.P. Klochko, N.D. Volkova, M.V. Dobrotvorskaya, V.R. Kopach, T.A. Li // Functional Materials. — 2008. — Т. 15, № 1. — С. 119-126. — Бібліогр.: 13 назв. — англ. 1027-5495 https://nasplib.isofts.kiev.ua/handle/123456789/137232 The mechanisms of electrochemical processes in the electrolyte for cadmium telluride semi-conducting film deposition and in corresponding partial solutions containing cadmium and tellurium ions have been studied by voltammetry with linear potential scanning and by cyclic voltammetry. The differences between cathodic processes on chemically inert titanium nitride substrates and catalytically active molybdenum surface have been revealed. Basing on these studies, the nature of impurities discovered in this work by X-ray photoelectron spectroscopy at the surface and inside the cadmium telluride films deposited on molybdenum and titanium nitride surfaces has been explained. The latter made it possible to select the electrodeposition parameters and the substrate material which provide the stoichiometric film composition. en НТК «Інститут монокристалів» НАН України Functional Materials Technology Electrochemical deposition of cadmium telluride films Електохімічне осадження плівок телуриду кадмію Article published earlier |
| spellingShingle | Electrochemical deposition of cadmium telluride films Klochko, N.P. Volkova, N.D. Dobrotvorskaya, M.V. Kopach, V.R. T.A. Li Technology |
| title | Electrochemical deposition of cadmium telluride films |
| title_alt | Електохімічне осадження плівок телуриду кадмію |
| title_full | Electrochemical deposition of cadmium telluride films |
| title_fullStr | Electrochemical deposition of cadmium telluride films |
| title_full_unstemmed | Electrochemical deposition of cadmium telluride films |
| title_short | Electrochemical deposition of cadmium telluride films |
| title_sort | electrochemical deposition of cadmium telluride films |
| topic | Technology |
| topic_facet | Technology |
| url | https://nasplib.isofts.kiev.ua/handle/123456789/137232 |
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