Structure of tantalum diboride thin films deposited by RF-magnetron sputtering
The tantalum diboride films have been deposited in various conditions by non-reactive RF magnetron sputtering. The film phase compositions and structures have been determined by X-ray diffraction, secondary ion mass spectrometry, and electron microscopy. The effect of the substrate temperature and o...
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| Опубліковано в: : | Functional Materials |
|---|---|
| Дата: | 2008 |
| Автори: | , , , , |
| Формат: | Стаття |
| Мова: | Англійська |
| Опубліковано: |
НТК «Інститут монокристалів» НАН України
2008
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| Теми: | |
| Онлайн доступ: | https://nasplib.isofts.kiev.ua/handle/123456789/137237 |
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| Назва журналу: | Digital Library of Periodicals of National Academy of Sciences of Ukraine |
| Цитувати: | Structure of tantalum diboride thin films deposited by RF-magnetron sputtering / V.A. Konovalov, D.N. Terpiy, N.A. Klyahina, I.G. Kostenko, L.A. Vasetskaya // Functional Materials. — 2008. — Т. 15, № 1. — С. 144-148. — Бібліогр.: 12 назв. — англ. |
Репозитарії
Digital Library of Periodicals of National Academy of Sciences of Ukraine| _version_ | 1862731566688501760 |
|---|---|
| author | Konovalov, V.A. Terpiy, D.N. Klyahina, N.A. Kostenko, I.G. Vasetskaya, L.A. |
| author_facet | Konovalov, V.A. Terpiy, D.N. Klyahina, N.A. Kostenko, I.G. Vasetskaya, L.A. |
| citation_txt | Structure of tantalum diboride thin films deposited by RF-magnetron sputtering / V.A. Konovalov, D.N. Terpiy, N.A. Klyahina, I.G. Kostenko, L.A. Vasetskaya // Functional Materials. — 2008. — Т. 15, № 1. — С. 144-148. — Бібліогр.: 12 назв. — англ. |
| collection | DSpace DC |
| container_title | Functional Materials |
| description | The tantalum diboride films have been deposited in various conditions by non-reactive RF magnetron sputtering. The film phase compositions and structures have been determined by X-ray diffraction, secondary ion mass spectrometry, and electron microscopy. The effect of the substrate temperature and of positive bias potential value on the texturing extent and phase composition has been defined. Some general regularities of the film growth have been established: the formation of quasi-amorphous structure and its transition to textured condensate with various texturing extent.
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| first_indexed | 2025-12-07T19:26:38Z |
| format | Article |
| fulltext | |
| id | nasplib_isofts_kiev_ua-123456789-137237 |
| institution | Digital Library of Periodicals of National Academy of Sciences of Ukraine |
| issn | 1027-5495 |
| language | English |
| last_indexed | 2025-12-07T19:26:38Z |
| publishDate | 2008 |
| publisher | НТК «Інститут монокристалів» НАН України |
| record_format | dspace |
| spelling | Konovalov, V.A. Terpiy, D.N. Klyahina, N.A. Kostenko, I.G. Vasetskaya, L.A. 2018-06-17T09:17:07Z 2018-06-17T09:17:07Z 2008 Structure of tantalum diboride thin films deposited by RF-magnetron sputtering / V.A. Konovalov, D.N. Terpiy, N.A. Klyahina, I.G. Kostenko, L.A. Vasetskaya // Functional Materials. — 2008. — Т. 15, № 1. — С. 144-148. — Бібліогр.: 12 назв. — англ. 1027-5495 https://nasplib.isofts.kiev.ua/handle/123456789/137237 The tantalum diboride films have been deposited in various conditions by non-reactive RF magnetron sputtering. The film phase compositions and structures have been determined by X-ray diffraction, secondary ion mass spectrometry, and electron microscopy. The effect of the substrate temperature and of positive bias potential value on the texturing extent and phase composition has been defined. Some general regularities of the film growth have been established: the formation of quasi-amorphous structure and its transition to textured condensate with various texturing extent. en НТК «Інститут монокристалів» НАН України Functional Materials Technology Structure of tantalum diboride thin films deposited by RF-magnetron sputtering Структурні характеристики тонких плівок диборида танталу, одержаних ВЧ-магнетронним розпиленням Article published earlier |
| spellingShingle | Structure of tantalum diboride thin films deposited by RF-magnetron sputtering Konovalov, V.A. Terpiy, D.N. Klyahina, N.A. Kostenko, I.G. Vasetskaya, L.A. Technology |
| title | Structure of tantalum diboride thin films deposited by RF-magnetron sputtering |
| title_alt | Структурні характеристики тонких плівок диборида танталу, одержаних ВЧ-магнетронним розпиленням |
| title_full | Structure of tantalum diboride thin films deposited by RF-magnetron sputtering |
| title_fullStr | Structure of tantalum diboride thin films deposited by RF-magnetron sputtering |
| title_full_unstemmed | Structure of tantalum diboride thin films deposited by RF-magnetron sputtering |
| title_short | Structure of tantalum diboride thin films deposited by RF-magnetron sputtering |
| title_sort | structure of tantalum diboride thin films deposited by rf-magnetron sputtering |
| topic | Technology |
| topic_facet | Technology |
| url | https://nasplib.isofts.kiev.ua/handle/123456789/137237 |
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