XPS study of ammonia-exposed C₆₀ films both original and photopolymerized

• Опубліковано в: : Functional Materials
• Дата: 2004
• Автори: Dobrotvorska, M.V., Karachevtsev, V.A., Vovk, O.M., Rao, A.M.
• Формат: Стаття
• Мова: Англійська
• Опубліковано: НТК «Інститут монокристалів» НАН України 2004
• Онлайн доступ: https://nasplib.isofts.kiev.ua/handle/123456789/139580
• Назва журналу: Digital Library of Periodicals of National Academy of Sciences of Ukraine
• Цитувати: XPS study of ammonia-exposed C₆₀ films both original and photopolymerized / M.V. Dobrotvorska, V.A. Karachevtsev , O.M. Vovk , A.M. Rao // Functional Materials. — 2004. — Т. 11, № 4. — С. 755-760. — Бібліогр.: 27 назв. — англ.

Surface of C₆₀ films (original and photopolymerized with UV radiation) exposed to ammonia at different pressure was investigated by the method of X-ray photoelectron spectroscopy. Effect of X-ray stimulated interaction between films and adsorbed water, which resulted in bonds like C-O-H and enhanced...