Using of proton beam writing techniques for fabrication of micro difraction gratings

To obtain micrometric gratings with a high aspect ratio by lithographic technique, it is proposed to use a proton beam focused in a line and electromagnetic scanning in the transverse direction to irradiate the resistive material. Numerical modeling is carried out to optimize the parameters of the...

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Datum:2018
Hauptverfasser: Ponomarev, A.G., Kolinko, S.V., Rebrov, V.A., Kolomiets, V.N., Kravchenko, S.N.
Format: Artikel
Sprache:English
Veröffentlicht: Національний науковий центр «Харківський фізико-технічний інститут» НАН України 2018
Schriftenreihe:Вопросы атомной науки и техники
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Online Zugang:https://nasplib.isofts.kiev.ua/handle/123456789/147662
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Назва журналу:Digital Library of Periodicals of National Academy of Sciences of Ukraine
Zitieren:Using of proton beam writing techniques for fabrication of micro difraction gratings / A.G. Ponomarev, S.V. Kolinko, V.A. Rebrov, V.N. Kolomiets, S.N. Kravchenko // Вопросы атомной науки и техники. — 2018. — № 4. — С. 285-288. — Бібліогр.: 13 назв. — англ.

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Digital Library of Periodicals of National Academy of Sciences of Ukraine
Beschreibung
Zusammenfassung:To obtain micrometric gratings with a high aspect ratio by lithographic technique, it is proposed to use a proton beam focused in a line and electromagnetic scanning in the transverse direction to irradiate the resistive material. Numerical modeling is carried out to optimize the parameters of the probe forming system for this task. The calculations were confirmed during the experimental implementation of the proposed technique. A grating from the 23.4×2060 μm lines was made.