Рeculiarities of radiation oxidation of aluminum surface in contact with water
The peculiarities of the oxidation process and the dynamics of the formation of oxide nanostructures on the
 surface of aluminum and water at room temperature and under the influence of radiation were studied by IR
 reflection-absorption spectroscopy, radiothermoluminescence and atom...
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| Опубліковано в: : | Вопросы атомной науки и техники |
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| Дата: | 2018 |
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| Формат: | Стаття |
| Мова: | Англійська |
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Національний науковий центр «Харківський фізико-технічний інститут» НАН України
2018
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| Назва журналу: | Digital Library of Periodicals of National Academy of Sciences of Ukraine |
| Цитувати: | Рeculiarities of radiation oxidation of aluminum surface in contact with water / N.N. Gadzhieva
 // Вопросы атомной науки и техники. — 2018. — № 5. — С. 45-49. — Бібліогр.: 15 назв. — англ. |
Репозитарії
Digital Library of Periodicals of National Academy of Sciences of Ukraine| _version_ | 1860253871675277312 |
|---|---|
| author | Gadzhieva, N.N. |
| author_facet | Gadzhieva, N.N. |
| citation_txt | Рeculiarities of radiation oxidation of aluminum surface in contact with water / N.N. Gadzhieva
 // Вопросы атомной науки и техники. — 2018. — № 5. — С. 45-49. — Бібліогр.: 15 назв. — англ. |
| collection | DSpace DC |
| container_title | Вопросы атомной науки и техники |
| description | The peculiarities of the oxidation process and the dynamics of the formation of oxide nanostructures on the
surface of aluminum and water at room temperature and under the influence of radiation were studied by IR
reflection-absorption spectroscopy, radiothermoluminescence and atomic-force microscopy. The role of
intermediate surface-active particles in the dynamics of changes in the process of aluminum oxidation in the
absorbed dose range of 0.5…120 kGy is considered. It is established that the formation of nanostructured films is
dominated by molecular oxygen and other oxygen-containingion radicals generated by gamma-irradiation. It is
shown that the radiation modification of the surface leads to a change in the morphology and topography of the
surface state and is accompanied by the formation of oxide nanostructures whose defectiveness is determined by the
irradiation time. A possible mechanism for the radiation oxidation of aluminum in the Al/ads. H₂O system is
discussed.
Методами ІЧ відбивно-абсорбційної спектроскопії, радіотермолюмінесценції і атомно-силової
мікроскопії вивчені особливості процесу окислення і динаміка формування оксидних наноструктур на
поверхні алюмінію з водою при кімнатній температурі і при радіаційній дії. Розглянута роль проміжних
поверхнево-активних часток у динаміці змін процесу окислення алюмінію у області поглиненої дози
0,5…120 кГр. Встановлено, що при формуванні наноструктурних плівок основну роль відіграють
молекулярний кисень та інші кисневоскладові іон-радикальні групи, генеровані гамма-опроміненням.
Показано, що радіаційна модифікація поверхні призводить до зміни морфології і рельєфу поверхневого
стану і супроводжується формуванням оксидних наноструктур, дефектність яких визначається часом
опромінення. Обговорено можливий механізм радіаційного окислення алюмінію в системі Al/адс. H₂O.
Методами ИК отражательно-абсорбционной спектроскопии, радиотермолюминесценции и атомносиловой микроскопии изучены особенности процесса окисления и динамика формирования оксидных
наноструктур на поверхности алюминия с водой при комнатной температуре и при радиационном
воздействии. Рассмотрена роль промежуточных поверхностно-активных частиц в динамике изменений
процесса окисления алюминия в области поглощенной дозы 0,5…120 кГр. Установлено, что при
формировании наноструктурных пленок основную роль играют молекулярный кислород и другие
кислородосодержащие ион-радикальные группы, генерированные гамма-облучением. Показано, что радиационная модификация поверхности приводит к изменению морфологии и рельефа поверхностного
состоянии и сопровождается формированием оксидных наноструктур, дефектность которых определяется
временем облучения. Обсужден возможный механизм радиационного окисления алюминия в системе
Al/адс. H₂O.
|
| first_indexed | 2025-12-07T18:46:43Z |
| format | Article |
| fulltext |
ISSN 1562-6016. ВАНТ. 2018. №5(117) 45
UDC 541.183:547:211:539.104
PECULIARITIES OF RADIATION OXIDATION OF ALUMINUM
SURFACE IN CONTACT WITH WATER
N.N. Gadzhieva
Institute of Radiation Problems of NAS Azerbaijan,
AZ1143, Baku, Azerbaijan
E-mail:nushaba6@mail.ru
The peculiarities of the oxidation process and the dynamics of the formation of oxide nanostructures on the
surface of aluminum and water at room temperature and under the influence of radiation were studied by IR
reflection-absorption spectroscopy, radiothermoluminescence and atomic-force microscopy. The role of
intermediate surface-active particles in the dynamics of changes in the process of aluminum oxidation in the
absorbed dose range of 0.5…120 kGy is considered. It is established that the formation of nanostructured films is
dominated by molecular oxygen and other oxygen-containingion radicals generated by gamma-irradiation. It is
shown that the radiation modification of the surface leads to a change in the morphology and topography of the
surface state and is accompanied by the formation of oxide nanostructures whose defectiveness is determined by the
irradiation time. A possible mechanism for the radiation oxidation of aluminum in the Al/ads. H2O system is
discussed.
INTRODUCTION
The surface layer of metals is in a special physico-
chemical state. It is largely saturated with structural
defects (vacancies, dislocations, impurities) and its
properties differ from the bulk properties [1]. Contact
and interaction of water with the surface of metals leads
to their change and is accompanied by the formation of
an oxide layer. At the same time, a Me-
MeO heterosystem is formed on the surface. The
formation of a nanosystem plays a decisive role in
radiation-stimulated processes of water on the surface of
metals. The study of the initial stage of formation and
formation of oxide nanolayer is of fundamental
importance for solving the problems of surface
passivation and predetermines the course of the
corrosion process [24].
At the same time, a comprehensive study of the
process of radiation oxidation of the surface of metals is
of fundamental importance in radiation material science
from the point of view of the safety of nuclear and
nuclear reactors. Metallic aluminum is a promising
radiation material. Despite the fact that numerous
experimental and theoretical studies have been devoted
to his study, some questions remain open and
unresolved [5, 6].
In the present work, the features of the radiation
oxidation of the aluminum surface in contact with water
at room temperature and under the influence of gamma-
radiation are studied.
EXPERIMENTAL PART
Aluminum plates with dimensions of 20x10x2 mm,
were obtained by stage-by-stage pressing of cylindrical
Al granules with a diameter of 3 and a height of 6 mm
using a special mold designed for optical studies. The
resulting plates had a smooth polished surface with
R = 0.80…0.85 in the IR (λ = 15…2.2 μm) wavelength
region. Twenty samples with identical reflection
coefficients for comparative parallel experiments of
radiation oxidation in the aluminum-adsorbed water
system (Al/ads. H2O) were prepared by the methods of
radiothermoluminescence (RTL) and IR reflectance-
absorption spectroscopy (IRRAS). The IR reflection
spectra at the drop of linearly polarized radiation on
samples at an angle φ = 88° were measured in the region
2000…650 cm
-1
(Specord 71 IR) at room temperature
and under the influence of gamma-radiation [7]. From
the IR reflection spectra, the optical densities of the
absorption bands and their ratios of stretching vibrations
of the Al-O-groups in the initial and processed samples
were determined.
The samples were irradiated with γ-quanta on an
isotope
60
Co source with a dose rate dФγ/dt = 0.80 Gy/s.
Radiation oxidation in the Al/ads. H2O heterosystem
was carried out at room temperature (T = 300 K). The
absorbed dose varied in the range of
Фγ = 0.5…120 kGy.
RTL curves were obtained in the temperature range
80…500 K at a warming-up rate of 0.08 K/s. For RTL
analysis, the samples were further irradiated with a dose
of 10 kGy at 77 K.
The thickness of the oxide films was from 8 nm to
0.25 μm. The small thicknesses of oxide films were
estimated by the Stromeyer formula [8], applied to X-
ray-photoelectron spectra.
On the atomic force microscope (AFM) Nano
Educator SZMU-15, the initial surfaces of metallic
aluminum plates and the changes occurring on the
surface of these samples after radiation treatment at
room temperature and under the action of γ-quanta are
traced.
RESULTS AND ITS DISCUSSION
The formation of a surface oxide film in the
radiation oxidation of aluminum in contact with water
was monitored by IR reflection spectra in the range
ν ~ 1200…650 cm
-1
. Fig. 1 shows the changes in the
absorption band of the valence vibration of the Al-O
bond as a function of the contact time of aluminum with
water (τ) during the radiation oxidation of Al. The bands
with maxima of 1070 and 945 cm
-1
observed by us
should be attributed to the valence vibration of Me-OH,
where several aluminum atoms act as Me. The bands
46 ISSN 1562-6016. ВАНТ. 2018. №5(117)
with maxima of 1010, 830, and 720 cm
-1
can be
attributed to the stretching vibrations of the Al-O
surface oxide film formed on the aluminum surface as a
result of radiation interaction with water. The maxima at
830 and 720 cm
-1
refer to Al-O-groups bound to
tetrahedrally and octahedrally coordinated aluminum
atoms, respectively [9]. In the case of thin films
(d = 8 nm) at the contact time τ = 1 min we detected a
band with a maximum at 1010 cm
-1
, which refers to
Al2O3 and characterizes the valence vibration of Al-O.
Thickening of the oxide film from 8 nm to 0.25μm,
or an increase in the contact time up to 1 min. Up to
τ = 5 hours, this band shifts from 1010 to 950 cm
-1
(i. e.
by 60 cm
-1
) and to its broadening (half-width ν1/2
increases by 50 cm
-1
). The wide diffuse maximum of the
Al-O vibration band is characteristic of amorphous and
polycrystalline structures and confirms the in
homogeneities of relatively thick oxide films [4, 10].
In order to clarify and determine the role of relaxing
intermediate-active particles, in particular, oxygen hole
centers and other oxygen-containing groups in the
dynamics of the oxidation process in contact with water,
we used the RTL-method for the first time.
It is assumed that the main role in radiation
oxidation is played by surface oxygen holes generated
by γ-irradiation and capable of migrating into the
volume interacting with the metal atoms constituting it.
The mechanism of this process is presumable and
requires rigorous experimental evidence.
Irradiation of γ-quanta at 77 K temperature of
radiation-oxidized aluminum plates in contact with
water leads to the appearance of a number of RTL peaks
at temperatures of 170, 220, and 320 K (Fig. 2, curve 1).
A low-temperature peak at T = 170 K with an activation
energy Ea = 0.38 eV can be associated with the
thermally stimulated luminescence of chemisorbed
oxygen. According to [11], an oxygen peak in the
150…170 K region due to dissolved oxygen and other
oxygen-containing gases was also detected during the
radiation excitation of thermoluminescence in polymers.
The intensity of the peak with a maximum at 170 K
strongly depends on the time of contact of aluminum
with water at γ-irradiation in the system Al/ads. H2O,
from the thickness of the radiation-oxidized film. With
an increase in this thickness from 8 nm to 0.25 μm, the
intensity of the peak increases by a factor of 6 and
another peak appears at T = 175 K with an activation
energy Ea= 0.42 eV. The asymmetric peak at T = 220 K
also splits into two relatively narrow peaks, with the
peak at 320 K virtually unchanged (see Fig. 2, curves 2,
3).
Apparently, a narrow peak at T = 175 K is associated
with the thermally stimulated adsorboluminescence of
the molecular oxygen product of the radiation-
heterogeneous decomposition of water at surface-
localized hole centers of the O
-
type [12].
In favor of this is evidence of the luminescence of
the peak at 175 K after additional adsorption of dried O2
in the cell with the system under study and its
quenching after prolonged evacuation of this system at a
temperature T ≥ 773 K. The emission of electrons
accompanied by emission in the visible region of the
spectrum during the adsorboluminescence of oxygen on
aluminum was also observed by the authors of [12]. The
absorption of oxygen at hole centers in aluminum oxide
(Al2O3) was also observed by electron paramagnet
resonance (EPR) (cold signal g = 2.009), photo- and
thermal desorption and thermoluminescence [13].
Peaks at T = 195 and 230 K with activation energies
Ea = 0.50 and 0.65 eV belong to aluminum hydroxides.
The formation of various hydroxides is confirmed by IR
reflection spectra (see Fig. 1). A diffuse peak with a
maximum at 320 K, with an activation energy
Ea = 0.8…1.0 eV, is due to the thermally stimulated
luminescence of chemisorbed oxygen and other oxygen-
containing groups (OH
-
) on surface electronic F
+
and
F-centers.
Fig. 1. The change in the absorption band of the
stretching vibration of the Al-O bond as a function
of the contact time of aluminum with water at a
radiation (T = 300 K, dФγ = 6.67 Gy/s) oxidation,
τ = 1 min (1); 10 min (2); 5 h (3), and 18 h (4)
Fig. 2. Changes in the RTL curves of oxide films as a
function of the time of contact of aluminum with water
during the radiation oxidation of Al: τ = 1 min (1);
10 min (2), and 5 h (3)
The observed features of the manifestation of the
multicomponent structure of the RTL oxygen peak in
the region of 100…250 K (for relatively thick
nonuniform oxide films) are related both to the
inhomogeneity of the hole centers themselves and to the
fact that radiation-adsorbed oxygen can be on the
surface in different states (O
-
ads, O2ads, OH
-
ads, etc.). It
ISSN 1562-6016. ВАНТ. 2018. №5(117) 47
should be noted that with the thickening of the oxide
film, radiation-stimulated adsorption of oxygen occurs
already at the Al-Al2O3 interface. Therefore, the
increase in the intensity of the oxygen peak of RTL with
increasing oxide film thickness should be attributed to
an increase in the density of surface defect states in the
near-surface oxide layer of Al2O3, and hence, the
probability of oxygen adsorption at these centers.
Radiation modification of the surface leads to a
change in the morphology and relief of the near-surface
state. Therefore, it seems interesting to microscopically
study the morphology and topography of the surface of
radiation-oxidized aluminum plates at room temperature
and under the influence of γ-quanta. Three-dimensional
(3d) surface AFM images and histograms (curves of
distribution of surface images in sizes) before and after
radiation oxidation were obtained in order to reveal the
dynamics of morphological changes in the surface. As
the AFM investigations have shown, the radiation
modification of the surface relief is accompanied by the
formation of oxide nanostructures, the defectiveness of
which is determined by the irradiation time. As an
example, in Figs. 3 and 4 show three-dimensional (3d)
surface images and their histograms of aluminum
samples before (a) and after radiation oxidation at room
temperature (T = 300 K) (b, c). As can be seen from
three-dimensional images, the surface of the original
sample is characterized by the presence of a thin oxide
film (d = 8 nm) with a high degree of defectiveness (see
Fig. 3,a). The nanoparticles are evenly distributed and
have a depth of 60 nm. Radiation oxidation leads to a
change in the surface state of aluminum (see Fig. 3,b,c).
The surface is smoothed out and the nanoparticles have
a depth of 30 nm.
As the histograms of the AFM images of the surface
of the original aluminum show, nanoparticles
predominantly with sizes of 25…50 nm (the number is
2200 units) participate in the formation of a thin oxide
film (see Fig. 4,a).
Fig. 3. Three-dimensional (3d) images of the surface
of the initial (a) and radiation-oxidized Al at times
of contact with water of 10 min (b) and 5 hours (c)
The histogram of the surface of a radiation-oxidized
aluminum plate is characterized by a region of
distribution of nanoparticles with a size of 30…45 nm
(the number is 2000 units). In both cases, a symmetric
Gaussian distribution of nanoparticles is observed in
size.
Fig. 4. The histograms of the surface of the initial (a)
and radiation-oxidized Al at times of contact with water
of 10 min (b) and 5 h (c)
Further increase in the irradiation time τ
(corresponding to an increase in the thickness of the
oxide film from 8 to 250 nm) from 10 min to 5 h leads
to the formation of nanoclusters with a size 2 times on
the aluminum surface as compared to the initial
samples. At the same time, a continuous oxide layer
forms on the surface of Al.
The mechanism of oxidation of aluminum in the
presence of water under the action of -radiation can be
represented as follows: under the action of -radiation
on the surface of Al, active states S* (ions, localized
charges, etc.) are formed and secondary electronic
radiation (esec).
*, .
ВТ
Al S e
(1)
Their interaction with water leads to the excitation
of H2O molecules.
*
*
2 2 ,
ВТe
S
S
H O H O
(2)
where H2Os* is the excited adsorbed state of water
molecules.
On the surface-active states of S*, water molecules
are excited through the complexation stages and further
transfer of excitation energy of the complex to H2O
molecules. Then the decay of excited states of water
molecules occurs along a homogeneous mechanism [14]
and is accompanied by the formation of intermediate
(OH, OH
-
, O, H, H
+
, H2O
+
) and gaseous (H2, O2)
decomposition products. Intermediate active particles
can interact with the surfactant states of Al and form Al-
H hydrides and Al-OH aluminum hydroxides [15].
The formation of surface hole centers (oxygen holes)
occurs according to the scheme:
Al-OH → Al-O-Al + H2O, (3)
Al
+
+ H2O → Al
+
O
–
+ H2. (4)
The hole centers formed by the formula (4) migrate
into the volume and interact with the bulk atoms of
aluminum. The presence of oxygen during radiation
oxidation accelerates the oxidation process.
According to the calculation, the yield of molecular
hydrogen G(H2) in the Al/ads. H2O heterosystem with
allowance for the total absorbed dose of γ-radiation
under the conditions of our experiments is G(H2) =
2.25 molec./100 eV. It should be noted that the
48 ISSN 1562-6016. ВАНТ. 2018. №5(117)
hydrogen yield for a homogeneous phase (in the
absence of aluminum) is G(H2) = 0.40 molec./100 eV
[14].
CONCLUSION
The complex study of the process of oxidation of the
aluminum surface in contact with water at room
temperature was carried out using OAS-, RTL-, and
AFM-methods. The possibility of using the RTL-
method for studying the radiation oxidation of
aluminum in the Al/ads. H2O system is shown. It is
shown that the radiative decomposition of water in an
Al/ads. H2O heterosystem is accompanied by the
formation of an oxide film on the Al surface. The PTL
peaks are recorded in the temperature range
100…250 K with activation energies
Ea = 0.38…0.65 eV, which are associated with the
thermally stimulated adsorption and chemiluminescence
of oxygen and its groups at surface-localized centers
under γ-irradiation. It was found that the surface oxygen
hole centers generated by γ-irradiation and chemisorbed
oxygen play a major role in the formation of oxide
films. The formation of oxide films by the change in the
absorption band of the stretching vibration of the Al-O
bond (ν = 950 cm
-1
) is monitored by IR reflection
spectra as a function of the time of contact of aluminum
with water. According to the AFM studies (3d surface
images and their histograms), it is established that the
radiation modification of the surface relief is
accompanied by the formation of oxide nanostructures
whose defectiveness is determined by the irradiation
time. The possible mechanism of aluminum oxidation in
the Al/ads. H2O system is discussed.
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Статья поступила в редакцию 14.03.2018 г.
ОСОБЕННОСТИ РАДИАЦИОННОГО ОКИСЛЕНИЯ ПОВЕРХНОСТИ АЛЮМИНИЯ
В КОНТАКТЕ С ВОДОЙ
Н.Н. Гаджиева
Методами ИК отражательно-абсорбционной спектроскопии, радиотермолюминесценции и атомно-
силовой микроскопии изучены особенности процесса окисления и динамика формирования оксидных
наноструктур на поверхности алюминия с водой при комнатной температуре и при радиационном
воздействии. Рассмотрена роль промежуточных поверхностно-активных частиц в динамике изменений
процесса окисления алюминия в области поглощенной дозы 0,5…120 кГр. Установлено, что при
формировании наноструктурных пленок основную роль играют молекулярный кислород и другие
кислородосодержащие ион-радикальные группы, генерированные гамма-облучением. Показано, что
ISSN 1562-6016. ВАНТ. 2018. №5(117) 49
радиационная модификация поверхности приводит к изменению морфологии и рельефа поверхностного
состоянии и сопровождается формированием оксидных наноструктур, дефектность которых определяется
временем облучения. Обсужден возможный механизм радиационного окисления алюминия в системе
Al/адс. H2O.
ОСОБЛИВОСТІ РАДІАЦІЙНОГО ОКИСЛЕННЯ ПОВЕРХНІ АЛЮМІНІЮ
В КОНТАКТІ З ВОДОЮ
Н.Н. Гаджиєва
Методами ІЧ відбивно-абсорбційної спектроскопії, радіотермолюмінесценції і атомно-силової
мікроскопії вивчені особливості процесу окислення і динаміка формування оксидних наноструктур на
поверхні алюмінію з водою при кімнатній температурі і при радіаційній дії. Розглянута роль проміжних
поверхнево-активних часток у динаміці змін процесу окислення алюмінію у області поглиненої дози
0,5…120 кГр. Встановлено, що при формуванні наноструктурних плівок основну роль відіграють
молекулярний кисень та інші кисневоскладові іон-радикальні групи, генеровані гамма-опроміненням.
Показано, що радіаційна модифікація поверхні призводить до зміни морфології і рельєфу поверхневого
стану і супроводжується формуванням оксидних наноструктур, дефектність яких визначається часом
опромінення. Обговорено можливий механізм радіаційного окислення алюмінію в системі Al/адс. H2O.
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| id | nasplib_isofts_kiev_ua-123456789-147699 |
| institution | Digital Library of Periodicals of National Academy of Sciences of Ukraine |
| issn | 1562-6016 |
| language | English |
| last_indexed | 2025-12-07T18:46:43Z |
| publishDate | 2018 |
| publisher | Національний науковий центр «Харківський фізико-технічний інститут» НАН України |
| record_format | dspace |
| spelling | Gadzhieva, N.N. 2019-02-15T17:57:27Z 2019-02-15T17:57:27Z 2018 Рeculiarities of radiation oxidation of aluminum surface in contact with water / N.N. Gadzhieva
 // Вопросы атомной науки и техники. — 2018. — № 5. — С. 45-49. — Бібліогр.: 15 назв. — англ. 1562-6016 https://nasplib.isofts.kiev.ua/handle/123456789/147699 541.183:547:211:539.104 The peculiarities of the oxidation process and the dynamics of the formation of oxide nanostructures on the
 surface of aluminum and water at room temperature and under the influence of radiation were studied by IR
 reflection-absorption spectroscopy, radiothermoluminescence and atomic-force microscopy. The role of
 intermediate surface-active particles in the dynamics of changes in the process of aluminum oxidation in the
 absorbed dose range of 0.5…120 kGy is considered. It is established that the formation of nanostructured films is
 dominated by molecular oxygen and other oxygen-containingion radicals generated by gamma-irradiation. It is
 shown that the radiation modification of the surface leads to a change in the morphology and topography of the
 surface state and is accompanied by the formation of oxide nanostructures whose defectiveness is determined by the
 irradiation time. A possible mechanism for the radiation oxidation of aluminum in the Al/ads. H₂O system is
 discussed. Методами ІЧ відбивно-абсорбційної спектроскопії, радіотермолюмінесценції і атомно-силової
 мікроскопії вивчені особливості процесу окислення і динаміка формування оксидних наноструктур на
 поверхні алюмінію з водою при кімнатній температурі і при радіаційній дії. Розглянута роль проміжних
 поверхнево-активних часток у динаміці змін процесу окислення алюмінію у області поглиненої дози
 0,5…120 кГр. Встановлено, що при формуванні наноструктурних плівок основну роль відіграють
 молекулярний кисень та інші кисневоскладові іон-радикальні групи, генеровані гамма-опроміненням.
 Показано, що радіаційна модифікація поверхні призводить до зміни морфології і рельєфу поверхневого
 стану і супроводжується формуванням оксидних наноструктур, дефектність яких визначається часом
 опромінення. Обговорено можливий механізм радіаційного окислення алюмінію в системі Al/адс. H₂O. Методами ИК отражательно-абсорбционной спектроскопии, радиотермолюминесценции и атомносиловой микроскопии изучены особенности процесса окисления и динамика формирования оксидных
 наноструктур на поверхности алюминия с водой при комнатной температуре и при радиационном
 воздействии. Рассмотрена роль промежуточных поверхностно-активных частиц в динамике изменений
 процесса окисления алюминия в области поглощенной дозы 0,5…120 кГр. Установлено, что при
 формировании наноструктурных пленок основную роль играют молекулярный кислород и другие
 кислородосодержащие ион-радикальные группы, генерированные гамма-облучением. Показано, что радиационная модификация поверхности приводит к изменению морфологии и рельефа поверхностного
 состоянии и сопровождается формированием оксидных наноструктур, дефектность которых определяется
 временем облучения. Обсужден возможный механизм радиационного окисления алюминия в системе
 Al/адс. H₂O. en Національний науковий центр «Харківський фізико-технічний інститут» НАН України Вопросы атомной науки и техники Физика радиационных повреждений и явлений в твердых телах Рeculiarities of radiation oxidation of aluminum surface in contact with water Особливості радіаційного окислення поверхні алюмінію в контакті з водою Особенности радиационного окисления поверхности алюминия в контакте с водой Article published earlier |
| spellingShingle | Рeculiarities of radiation oxidation of aluminum surface in contact with water Gadzhieva, N.N. Физика радиационных повреждений и явлений в твердых телах |
| title | Рeculiarities of radiation oxidation of aluminum surface in contact with water |
| title_alt | Особливості радіаційного окислення поверхні алюмінію в контакті з водою Особенности радиационного окисления поверхности алюминия в контакте с водой |
| title_full | Рeculiarities of radiation oxidation of aluminum surface in contact with water |
| title_fullStr | Рeculiarities of radiation oxidation of aluminum surface in contact with water |
| title_full_unstemmed | Рeculiarities of radiation oxidation of aluminum surface in contact with water |
| title_short | Рeculiarities of radiation oxidation of aluminum surface in contact with water |
| title_sort | рeculiarities of radiation oxidation of aluminum surface in contact with water |
| topic | Физика радиационных повреждений и явлений в твердых телах |
| topic_facet | Физика радиационных повреждений и явлений в твердых телах |
| url | https://nasplib.isofts.kiev.ua/handle/123456789/147699 |
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