Probe measurements of parameters of dense gasmetallic plasma in the inhomogeneous magnetic field of a planar magnetron discharge
The paper presents measurements of the electron temperature and plasma concentration in both stationary and pulsed operation modes of a longitudinal planar MDC with a magnetically insulated anode in stationary and highcurrent pulsed operation modes with a high-voltage impulse voltage addition. The...
Gespeichert in:
| Datum: | 2018 |
|---|---|
| Hauptverfasser: | Chunadra, А.G., Sereda, К.N., Tarasov, I.K. |
| Format: | Artikel |
| Sprache: | English |
| Veröffentlicht: |
Національний науковий центр «Харківський фізико-технічний інститут» НАН України
2018
|
| Schriftenreihe: | Вопросы атомной науки и техники |
| Schlagworte: | |
| Online Zugang: | https://nasplib.isofts.kiev.ua/handle/123456789/149062 |
| Tags: |
Tag hinzufügen
Keine Tags, Fügen Sie den ersten Tag hinzu!
|
| Назва журналу: | Digital Library of Periodicals of National Academy of Sciences of Ukraine |
| Zitieren: | Probe measurements of parameters of dense gasmetallic plasma in the inhomogeneous magnetic field of a planar magnetron discharge / А.G. Chunadra, К.N. Sereda, I.K. Tarasov // Вопросы атомной науки и техники. — 2018. — № 6. — С. 252-254. — Бібліогр.: 4 назв. — англ. |
Institution
Digital Library of Periodicals of National Academy of Sciences of UkraineÄhnliche Einträge
-
Probe measurements of parameters of dense gasmetallic plasma in the inhomogeneous magnetic field of a planar magnetron discharge
von: Chunadra, А.G., et al.
Veröffentlicht: (2018) -
High-current pulsed operation modes of the planar MSS with magnetically insulated anode without transition to the arc discharge
von: Bizyukov, A.A., et al.
Veröffentlicht: (2012) -
Control of planar magnetron sputtering system operating modes by additional anode magnetic field
von: Bizyukov, A.A., et al.
Veröffentlicht: (2010) -
Increasing of mass transfer efficiency at magnetron deposition of metal coating
von: Chunadra, A.G., et al.
Veröffentlicht: (2015) -
Features of coatings deposition in combined stationary-pulsed operation mode of the magnetron sputtering system
von: Chunadra, А.G., et al.
Veröffentlicht: (2017)