Design and research of combined magnetron-ion-beam sputtering system

• Published in: Вопросы атомной науки и техники
• Date: 2018
• Main Authors: Dudin, S., Tkachenko, O., Shchybria, A., Yakovin, S., Zykov, A., Yefymenko, N.
• Format: Article
• Language: English
• Published: Національний науковий центр «Харківський фізико-технічний інститут» НАН України 2018
• Subjects: Низкотемпературная плазма и плазменные технологии
• Online Access: https://nasplib.isofts.kiev.ua/handle/123456789/149063
• Journal Title: Digital Library of Periodicals of National Academy of Sciences of Ukraine
• Cite this: Design and research of combined magnetron-ion-beam sputtering system / S. Dudin, O. Tkachenko, A. Shchybria, S. Yakovin, A. Zykov, N. Yefymenko // Вопросы атомной науки и техники. — 2018. — № 6. — С. 263-266. — Бібліогр.: 9 назв. — англ.

The design and characteristics of a new combined magnetron-ion-beam sputtering system are presented. The system allows coating deposition both by means of magnetron discharge, and by sputtering of complex composite targets by high-energy ion beam. Computer simulation and optimization of magnetic fie...