Chemical-dynamic polishing of InAs, InSb, GaAs and GaSb crystals with (NH₄)₂Cr₂O₇-HBr-citric acid etching composition

The chemical dissolution of InAs, InSb, GaAs and GaSb crystals in (NH₄)₂Cr₂O₇-HBr-C₆H₈O₇ etching solutions has been investigated. The dissolution rate of the semiconductor materials has been measured as a function of etchant composition, stirring rate and temperature. The limiting stages of dissolut...

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Veröffentlicht in:Functional Materials
Datum:2018
Hauptverfasser: Levchenko, I.V., Tomashyk, V.M., Stratiychuk, I.B., Malanych, G.P., Stanetska, A.S., Korchovyi, A.A.
Format: Artikel
Sprache:English
Veröffentlicht: НТК «Інститут монокристалів» НАН України 2018
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Online Zugang:https://nasplib.isofts.kiev.ua/handle/123456789/154462
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Zitieren:Chemical-dynamic polishing of InAs, InSb, GaAs and GaSb crystals with (NH₄)₂Cr₂O₇-HBr-citric acid etching composition / I.V. Levchenko, V.M. Tomashyk, I.B. Stratiychuk, G.P. Malanych, A.S. Stanetska, A.A. Korchovyi // Functional Materials. — 2018. — Т. 25, № 1. — С. 165-171. — Бібліогр.: 11 назв. — англ.

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Digital Library of Periodicals of National Academy of Sciences of Ukraine
id nasplib_isofts_kiev_ua-123456789-154462
record_format dspace
spelling Levchenko, I.V.
Tomashyk, V.M.
Stratiychuk, I.B.
Malanych, G.P.
Stanetska, A.S.
Korchovyi, A.A.
2019-06-15T15:48:52Z
2019-06-15T15:48:52Z
2018
Chemical-dynamic polishing of InAs, InSb, GaAs and GaSb crystals with (NH₄)₂Cr₂O₇-HBr-citric acid etching composition / I.V. Levchenko, V.M. Tomashyk, I.B. Stratiychuk, G.P. Malanych, A.S. Stanetska, A.A. Korchovyi // Functional Materials. — 2018. — Т. 25, № 1. — С. 165-171. — Бібліогр.: 11 назв. — англ.
1027-5495
DOI:https://doi.org/10.15407/fm25.01.165
https://nasplib.isofts.kiev.ua/handle/123456789/154462
The chemical dissolution of InAs, InSb, GaAs and GaSb crystals in (NH₄)₂Cr₂O₇-HBr-C₆H₈O₇ etching solutions has been investigated. The dissolution rate of the semiconductor materials has been measured as a function of etchant composition, stirring rate and temperature. The limiting stages of dissolution process, regions of the polishing and unpolishing solutions have been established. The polishing etchant compositions and conditions for chemical-dynamic polishing of the InAs, InSb, GaAs and GaSb crystals have been proposed and optimized.
en
НТК «Інститут монокристалів» НАН України
Functional Materials
Technology
Chemical-dynamic polishing of InAs, InSb, GaAs and GaSb crystals with (NH₄)₂Cr₂O₇-HBr-citric acid etching composition
Article
published earlier
institution Digital Library of Periodicals of National Academy of Sciences of Ukraine
collection DSpace DC
title Chemical-dynamic polishing of InAs, InSb, GaAs and GaSb crystals with (NH₄)₂Cr₂O₇-HBr-citric acid etching composition
spellingShingle Chemical-dynamic polishing of InAs, InSb, GaAs and GaSb crystals with (NH₄)₂Cr₂O₇-HBr-citric acid etching composition
Levchenko, I.V.
Tomashyk, V.M.
Stratiychuk, I.B.
Malanych, G.P.
Stanetska, A.S.
Korchovyi, A.A.
Technology
title_short Chemical-dynamic polishing of InAs, InSb, GaAs and GaSb crystals with (NH₄)₂Cr₂O₇-HBr-citric acid etching composition
title_full Chemical-dynamic polishing of InAs, InSb, GaAs and GaSb crystals with (NH₄)₂Cr₂O₇-HBr-citric acid etching composition
title_fullStr Chemical-dynamic polishing of InAs, InSb, GaAs and GaSb crystals with (NH₄)₂Cr₂O₇-HBr-citric acid etching composition
title_full_unstemmed Chemical-dynamic polishing of InAs, InSb, GaAs and GaSb crystals with (NH₄)₂Cr₂O₇-HBr-citric acid etching composition
title_sort chemical-dynamic polishing of inas, insb, gaas and gasb crystals with (nh₄)₂cr₂o₇-hbr-citric acid etching composition
author Levchenko, I.V.
Tomashyk, V.M.
Stratiychuk, I.B.
Malanych, G.P.
Stanetska, A.S.
Korchovyi, A.A.
author_facet Levchenko, I.V.
Tomashyk, V.M.
Stratiychuk, I.B.
Malanych, G.P.
Stanetska, A.S.
Korchovyi, A.A.
topic Technology
topic_facet Technology
publishDate 2018
language English
container_title Functional Materials
publisher НТК «Інститут монокристалів» НАН України
format Article
description The chemical dissolution of InAs, InSb, GaAs and GaSb crystals in (NH₄)₂Cr₂O₇-HBr-C₆H₈O₇ etching solutions has been investigated. The dissolution rate of the semiconductor materials has been measured as a function of etchant composition, stirring rate and temperature. The limiting stages of dissolution process, regions of the polishing and unpolishing solutions have been established. The polishing etchant compositions and conditions for chemical-dynamic polishing of the InAs, InSb, GaAs and GaSb crystals have been proposed and optimized.
issn 1027-5495
url https://nasplib.isofts.kiev.ua/handle/123456789/154462
citation_txt Chemical-dynamic polishing of InAs, InSb, GaAs and GaSb crystals with (NH₄)₂Cr₂O₇-HBr-citric acid etching composition / I.V. Levchenko, V.M. Tomashyk, I.B. Stratiychuk, G.P. Malanych, A.S. Stanetska, A.A. Korchovyi // Functional Materials. — 2018. — Т. 25, № 1. — С. 165-171. — Бібліогр.: 11 назв. — англ.
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last_indexed 2025-12-07T18:10:32Z
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