Peculiarities of UV radiation from hollow cathode discharge plasma used for sterilization of medical articles

Influence of air and water molecules detached from the chamber walls under ion impacts on UV radiation from hollow cathode discharge plasma in oxygen, nitrogen, and air is studied. Dependencies of UV radiation intensity and dose on the discharge glow duration, working gas type and pressure, and the...

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Datum:2010
Hauptverfasser: Tsiolko, V.V., Bazhenov, V.Yu., Khomich, V.A., Piun, V.M.
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Sprache:Englisch
Veröffentlicht: Національний науковий центр «Харківський фізико-технічний інститут» НАН України 2010
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Zitieren:Peculiarities of UV radiation from hollow cathode discharge plasma used for sterilization of medical articles / V.V. Tsiolko, V.Yu. Bazhenov, V.A. Khomich, V.M. Piun // Вопросы атомной науки и техники. — 2010. — № 4. — С. 234-239. — Бібліогр.: 12 назв. — англ.

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Digital Library of Periodicals of National Academy of Sciences of Ukraine
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author Tsiolko, V.V.
Bazhenov, V.Yu.
Khomich, V.A.
Piun, V.M.
author_facet Tsiolko, V.V.
Bazhenov, V.Yu.
Khomich, V.A.
Piun, V.M.
citation_txt Peculiarities of UV radiation from hollow cathode discharge plasma used for sterilization of medical articles / V.V. Tsiolko, V.Yu. Bazhenov, V.A. Khomich, V.M. Piun // Вопросы атомной науки и техники. — 2010. — № 4. — С. 234-239. — Бібліогр.: 12 назв. — англ.
collection DSpace DC
description Influence of air and water molecules detached from the chamber walls under ion impacts on UV radiation from hollow cathode discharge plasma in oxygen, nitrogen, and air is studied. Dependencies of UV radiation intensity and dose on the discharge glow duration, working gas type and pressure, and the discharge power are determined. Исследовано влияние примесей молекул воздуха и воды, оторванных от стенок камеры под действием ионных ударов, на УФ-излучение плазмы разряда с полым катодом на кислороде, азоте и воздухе. Установлены зависимости интенсивности и дозы УФ-излучения от длительности горения разряда, вида рабочего газа, его давления и мощности в разряде. Досліджено вплив домішок молекул повітря та води, відірваних зі стінок камери під впливом іонних ударів, на УФ-випромінювання плазми розряду з порожнистим катодом на кисні, азоті та повітрі. Встановлено залежності інтенсивності та дози УФ-випромінювання від тривалості горіння розряду, виду робочого газу, його тиску та потужності в розряді.
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fulltext ________________________________________________________________ ВОПРОСЫ АТОМНОЙ НАУКИ И ТЕХНИКИ. 2010. № 4. Серия: Плазменная электроника и новые методы ускорения (7), с.234-239. 234 PECULIARITIES OF UV RADIATION FROM HOLLOW CATHODE DISCHARGE PLASMA USED FOR STERILIZATION OF MEDICAL ARTICLES V.V. Tsiolko, V.Yu. Bazhenov, V.A. Khomich, V.M. Piun Institute of Physics of National Academy of Sciences of Ukraine, Kiev, Ukraine E-mail: tsiolko@iop.kiev.ua Influence of air and water molecules detached from the chamber walls under ion impacts on UV radiation from hollow cathode discharge plasma in oxygen, nitrogen, and air is studied. Dependencies of UV radiation intensity and dose on the discharge glow duration, working gas type and pressure, and the discharge power are determined. PACS: 52.80.Hc, 52.70.Kz, 52.25.Os 1. INTRODUCTION A novel technique for sterilization of medical in- struments by gas discharge plasma offers many promis- ing features (efficiency, reliability, low temperature of processed items) in comparison with conventional ster- ilization methods – dry or moist heat, chemical treat- ments by EtO. It was shown in [1,2] for the first time that in the case of gaseous plasma generating media main role in the sterilization of open surfaces is per- formed by ultraviolet radiation of the plasma. In subse- quent years, different aspects of both generation of UV radiation by the plasmas of low pressure discharges, and action of this radiation on the microorganisms were stu- died in multiple proceedings. However, all researches of the sterilization efficiency in different wavelength ranges of VUV/UV radiation from a discharge plasma were performed at stable and controlled system parame- ters, that is with permanent in time component content of a gas mixture, its pressure / gas flow, etc. In case of actual plasma sterilizers based on low pressure dis- charges the situation is somewhat more complicated. Ultimate parameters of a sterilizer are minimum sterili- zation time (more correctly, minimum time from load- ing to unloading of processed items), and the design simplicity. These requirements to the device are in a certain contradiction with experimental conditions listed above, because through working chamber evacuation with removal of atmospheric air residuals (N2, O2, water vapor) is required for providing stable and controllable content of required gas mixture. And the last can be don only at the expense of prolongation of evacuation time and the use of high vacuum pumps. Experimental researches of sterilization efficiency by UV radiation under actual conditions, that is with varying in time component content of the gas mixture in the discharge due to atmospheric air admixtures to working gas (nitrogen, oxygen, argon) were performed in [3]. It has been determined that higher inactivation efficiency by UV radiation of the discharge plasma on oxygen is due to peculiarities of its emission spectra, particularly, high radiation intensity in wavelength range ≈ 215…230 nm. Due to that, purpose of our work consisted in the study of peculiarities of generation of UV radiation by hollow cathode discharge plasma in nitrogen, oxygen and air with О2, N2 and H2O admixtures. 2. DESCRIPTION OF SETUP AND METHODS The experiments were performed at setup which was described in details in [2]. Plasma was formed by means of direct current discharge inside cylindrical chamber with 260 mm diameter and 420 mm length (which si- multaneously served as hollow cathode of the dis- charge). Oxygen, nitrogen and ambient air were used as working gases. Specific power introduced into the dis- charge was varied in a range of 0.0025…0.0125 W/cm3. Temperature of water cooled chamber walls was about 20°C. Measurements of spectrum dependencies of the plasma UV radiation in wavelength range of 200…300 nm on the discharge glow time tg were per- formed by means of spectrometer SL40-2-2048USB (SOLAR TII, Ltd). At the measurements, the end of quartz waveguide of the spectrometer was located in a plane which corresponded to placement of Petri dishes with Bac.subtilis spores during medical-biological re- searches. Due to fact that experimental studies of decontami- nation efficiency of Bac. subtilis spores were performed with the use of UV radiation with essentially different spectrum shape, in this proceeding the method of de- termining effective irradiation fluence for studied sam- ple was used which enabled correct comparison of the results obtained with the use of mentioned UV sources. Essence of the method consisted in “weighing” spectral irradiance values for each used type of UV radiation. At determination of “weighing” function, first of all, results of works [7, 8] devoted to studies of DNA mole- cule absorption and efficiency of bactericidal action of UV radiation on the microorganisms in dependence on the radiation frequency were taken into account. It has been shown in [4] that DNA absorption spectrum in considered wavelength range (≈180…300 nm) repre- sents superposition of broad absorption bands having maxim at about 190 and 260 nm due to electron excita- tion of diene and triene fragments of DNA molecule chain. In experiments with Bacillus subtilis spores [5] it has been shown that spores inactivation action spectra (i.e. dependence inactivation rate vs UV wavelength) has more complicated behavior in comparison with DNA absorption spectrum. In wavelength range 50…300 nm the spores inactivation rate has peaks at ≈ 150 nm, ≈ (220…230) nm and ≈ (260…270) nm. (Such difference is most likely due to absorption of ra- diation by the structures surrounding DNA – exospo- rium, plasma membranes, protoplast, etc.). In our work we used “weighing” function (Fig.1) obtained by multi- plying inactivation action spectra for Bac. subtilis spores type RCF from [5] and transmission curve of KU-1 filter. 235 0150 175 200 225 250 275 30 0,0 0,2 0,4 0,6 0,8 1,0 ΙΙΙ 3 2 1 A. U . Wavelength, nm Fig.1. 1 − Bac. subtilis spores inactivation action spec- trum; 2 − transmission curve of quartz KU-1 filter with 3-mm thickness; 3 − “weighing” curve, obtained by multiplying of the spores inactivation action spectrum and transmission curve of KU-1 filter Dash-dot vertical line represents bottom boundary (200 nm) of spectra measurements of UV radiation from the discharge plasma. (It should be noted that, at the use of “weighing” function of the inactivation spectra for others spore types from [8], obtained values of “weighed” UV fluence rate Ew and fluence Hw of the radiation differ by no more than 15…20%). Procedure of accomplishing the experiments on ster- ilization / radiation spectra measurement was, as fol- lows: - the chamber was filled by air up to atmospheric pressure after glow of the discharge with particular pa- rameters (working gas type, pressure, specific power in the discharge Wd); - Petri dishes with Bac. Subtilis spores were unloaded from / loaded to the chamber (with about 10 minutes duration of the procedure), or the chamber was held at atmospheric pressure for the same time in case of UV spectra measurements; - the chamber was evacuated by means of forevacuum pump down to residual air pressure of about 1 Pa; - after that the chamber was purged by working gas at working pressure for 5…10 minutes; - in subsequent, the discharge was ignited in the chamber with predetermined specific power Wd and the sterilization was performed, or the plasma UV radiation spectra were measured in dependence on the discharge glow time tg; - the discharge was turned off, the chamber was filled by ambient air up to atmospheric pressure, unloading / loading of Petri dishes was performed, or the chamber was held at atmospheric pressure for about 10 minutes; - the same procedure of sterilization / UV radiation spectra measurements was repeated for other gas type, working pressure in the chamber, specific power in the discharge Wd. Due to fact that prior to evacuation the chamber was held for a long time at atmospheric pressure, air and water vapor were adsorbed at the walls. Chamber evac- uation and purge by working gases did not remove ad- sorbed particles from the walls completely (first of all, oxygen and water molecules), and due to that they were admixed with working gas at the expense of “knocking down” by fast plasma ions. Thus, the discharge glow occurred in working gas with admixtures of detached air and water molecules, at that content of these admixtures decreased with time tg. 3. MEASUREMENTS OF SPECTRA OF UV RADIATION FROM THE DISCHARGE PLASMA IN A RANGE OF 200…300 nm Fig.2 shows “weighed” spectrum intensity distribu- tions of UV radiation obtained at the discharge glow with different working media. 200 220 240 260 280 300 0 10 20 30 40 50 60 (a) U V In te ns ity , a .u . Wavelength, nm a 200 220 240 260 280 300 0 10 20 30 40 50 60 (b)b U V In te ns ity , a .u . Wavelength, nm 200 220 240 260 280 300 0 40 80 120 160 200 240 (c) U V In te ns ity , a .u . Wavelength, nm c Fig.2. Distributions of “weighed” intensity of UV radia- tion over spectrum on different working media of the discharge: a − oxygen; b – nitrogen; c − air. Pressure Р= 15.6 Pa, Wd = 0.08 W/cc, duration of discharge glowing td = 240 s As one can see from analysis of these spectra, at oxygen use main contribution to UV radiation of the plasma occurs due to emission of the second negative system (SNS) O2 + (А2Пu – X2Пg) and Schumann-Runge system (SRS) O2 (B3Σu - – X3Σg -), and at the use of am- bient air and nitrogen due to emission of γ system NO (A2∑+ - X2П). (Occurrence of radiation of γ system NO in the discharge plasma in nitrogen is due to presence of oxygen molecules at the expense of their detachment from the chamber walls under action of the fast plasma ions). One can see from comparison of Fig.2,a,b,c that in case of oxygen use main “weighed” power of UV radiation is concentrated in spectrum range of ≈ 210…230 nm, whereas at the use of air and nitrogen power of UV radiation is spread over several bands in range of ≈ 210…260 nm. As it was already noted above, at accomplishing the measurements component content of the gas in the chamber could somewhat vary at the time of the dis- charge glow tg due to air and water vapor detachment from the chamber walls by flows of high-energy (W ≈ 400…600 eV) ions from the discharge plasma. Respectively, this effect can lead to dependence of UV radiation spectrum intensity and/or shape on time tg. However, spectra measurements have shown that in a range of working pressure gas (oxygen, nitrogen and air) in the chamber of ≈ 4…25 Pa detachment of gases / vapors from the chamber walls has no significant effect on UV radiation spectrum shape in wavelength range of 200…300 nm. An exclusion is represented by the dis- charge in oxygen at ≈ 4…7 Pa pressure, when for initial 40…50 s of the discharge glow, in addition to radiation of O2 and O2 + molecules, bands of γ system NO are also observed in UV spectrum. At the same time, value of “weighed” fluence rate Ew of UV radiation in this wave- length range essentially depends on both tg , and work- ing gas pressure in the chamber, at that these dependen- cies are different for various working gases (Fig.3,а,b,c). 236 Common behavior for all Ew dependencies consists in rapid growth of UV radiation intensity during initial ≈ 40…60 s, and after that their behavior in time depends on particular values of pressure and working gas type. This initial rapid growth of Ww is, first of all, due to pressure variations in the chamber at the discharge turn- ing on. (At the discharge turning on, pressure in the chamber initially (for about 1 s) exhibits a jump by ∆ Р ≈ 2…3 Pa, and after that for ∼ 40…60 s decreases monotonously down to predetermined pressure value in the chamber.) Plasma radiation intensity growth for this time period is, first of all, due to fact that pressure de- crease in the chamber results in a growth of mean en- ergy of the plasma electrons and, consequently, to in- crease of rates of elementary processes with participa- tion of electrons. In subsequent, (at tg > ∼ (40…60) s) when pressure in the chamber comes to its quasistationary value, be- havior of Ew dependencies on tg is, first of all, deter- mined by ratios between concentrations of O2, N2 and H2O molecules detached from the walls and working gas concentrations. Let us consider in more details Ww dependencies on time at tg > ( ∼ 30…60) s. One can see from Fig.3,a that in case of the dis- charge in oxygen UV radiation fluence rate Ew at higher gas pressures is practically independent on tg , and mo- notonously decreases with oxygen pressure increase in the chamber. However, at oxygen pressure of about 4 Pa behavior of Ew dependence on time is different – UV radiation intensity reaches its maximum at about 30 s of the discharge glow, after that it starts a decrease until its minimum at ≈ 150 s, and then it starts a growth again. (It should be noted that similar behavior of Ew depend- ence on time tg is also observed at 7 Pa pressure, al- though its non-monotony is exhibited not so obviously). This effect may result from EEDF “depletion” in a range of ≈ (10…30 eV) due to losses of electron energy, first of all, for H2O dissociation and OH excitation. And, since excitation cross sections of SRS О2 and SNS О2 + are approximately in the same energy range, such EEDF “depletion” results in decrease of intensity of UV radiation from oxygen plasma. 0 100 200 300 400 500 600 0 200 400 600 800 1000 1200 1400 1600 5 4 3 2 1 a) U V "w ei gh ed " f lu en ce ra te E w , a .u . Time t , s 0 200 400 600 800 1000 1200 0 200 400 600 800 1000 1200 a g 5 4 3 2 1 U V "w ei gh ed " f lu en ce ra te E w , a .u . Time t , s 0 200 400 600 800 1000 1200 0 400 800 1200 1600 2000 2400 b)b g c)c 5 4 3 2 1 U V 'w ei gh ed ' f lu en ce ra te E w a. u. Time t , s g Fig.3. Dependence of “weighed” fluence rate E w of UV radiation in wavelength range of 200…300 nm on the discharge glow time tg at different pressure values Р: a - oxygen; b - nitrogen; c - air. 1 - 4.5 Pa; 2 - 7.0 Pa; 3 - 11 Pa; 4 – 15 Pa; 5 – 21 Pa; Wd = 0.08 W/cc Unlike the case of the discharge in oxygen, Ew value of UV radiation for the discharge in nitrogen continues a growth in time as well after ≈ 30…40 s of the dis- charge glow, however, with slower rate, and in subse- quent, after reaching its maximum, it starts a decrease. At that, increase of nitrogen pressure in the chamber from ≈ 4 up to 20 Pa results in decrease of a time of reaching Ww maximum values from ≈ 300 s down to ≈ 100 s. Such behavior of Ew dependencies on tg is, first of all, due to temporal variations of O2 and H2O concen- trations in the chamber. For this reason, let us consider in more details main elementary processes which de- termine NO(A) concentration (and, consequently, UV radiation intensity of γ system NO) in our discharge plasma in nitrogen with O2 and H2O admixtures. It was determined in [6,7] that in a plasma of positive column of glow discharge in N2-O2 mixture main channel of NO(A) birth is represented by reaction: N2(A) + NO(X) = N2(X) + NO(A), (1) k = 6.6⋅10-11 cm3·s−1. In turn, NO(X) concentration in such discharge is mainly determined by ratio of rates of birth and death in reactions (2)-(4) and (5), respectively: N2(X, v≥13) + O → NO(X) + N(4S), (2) k = 10-13 cm3s−1; N2(A) + O = NO(X) + N(2D), (3) k = 7⋅10-12 cm3s−1; N(4S) + O2 = NO(X) + O, (4) k = 1.1⋅10-14 *T*exp(3150/T) cm3s−1; N(4S) + NO = N2(X,v≈3) + O, (5) k = 1.05⋅10-12 * (T)0.5 cm3s−1. Fig.4 exhibits experimentally measured dependen- cies of UV radiation intensity of γ system NO and weighed power of UV radiation Ww of our discharge plasma on oxygen content η in N2-O2 mixture. One can see that mentioned above dependencies show non- monotonous behavior – their initial growth changes to decrease at η ≈ 25%, at that radiation intensity of γ sys- tem NO in subsequent (at η ≈ (75…80)%) falls down practically to zero value, and Ew retains finite value due to contribution of oxygen UV radiation. Such behavior of γ system NO is determined by fact that the dependen- cies of N2(A) and NO(X) concentrations on oxygen con- tent in the gas mixture also possess non-monotonous behavior, at that N2(A) concentration reaches its maxi- mum value at lower η values [7]. 0 10 20 30 40 50 60 70 80 0 20 40 60 80 100 120 NO, 237 nm E w 23 7 nm in te ns ity , f lu en ce ra te E w , a .u . Oxygen content η, % Fig.4. Dependencies of radiation intensity of γ system NO (λ = 237 nm) and “weighed” fluence rate Ew on oxygen content in N2 - O2 mixture. P = 8 Pa, tg = 240 s, Wd = 0.08 W/cc It also follows from Fig.4 that in case of our discharge in nitrogen Ew value (as it was noted above, it is actually radiation of γ system NO) after tg ≥ 40…60 s (that is, after establishing stationary value of gas mixture pressure in the chamber) should decrease in time, since concentra- tion of molecular oxygen admixture in the discharge vol- ume decreases in a process of the chamber evacuation. However, as one can see from Fig.3,b, such behavior of Ew is observed only at high nitrogen pressure in the dis- charge chamber, whereas at low pressure values Ew con- tinues a growth until tg ≈ 400 s, and only after that starts a decrease. From our viewpoint, such behavior of Ew is due to water vapor influence (more exactly, ОН(Х) and Н particles which arise at H2O decomposition in the dis- charge plasma) on N2(A) concentration. Particularly, in [8-10] it was shown that N2(A) deactivation in reactions with ОН(X) and Н N2(A) + OH(X) = N2(X) + OH(A), (6) N2(A) + H = N2H, (7) 237 occurs with a very high rate constant – about 1⋅10-10 cm3·s−1. Thus, we see that water vapor adding to N2-O2 mix- ture results in decrease of concentration of N2(A) and, respectively, NO(A). In case of our discharge in nitro- gen it means that Ew in each time point tg is determined by “competitive” influence of O2 and H2O admixtures on NO(A) concentration. On one side, decrease of oxy- gen admixture in time should lead to diminishing con- centrations of O and NO(X) (and in the last case NO(A), respectively). But, from another side, decrease of water vapor amount in the discharge promotes in- crease of NO(A) concentration due to lower expense of N2(A) to excitation of hydroxyl radicals OH(X). Thus, if for certain time rate of vapor removal from the chamber exceeds rate of oxygen leaving, it can result in increase of NO(A) concentration, even if quantity of NO(X) mo- lecules in the chamber decreases at that. At low nitrogen pressure influence of mentioned above processes on NO(A) concentration and, consequently, on UV radia- tion intensity, is more evident due to higher relative contribution of water vapor admixture to total pressure in the chamber. Let us consider now Ew behavior in case of the dis- charge in ambient air. As it was already mentioned above, UV radiation intensity Ww in this case increases monotonously in time at all used pressure values of am- bient air. At the use of air as working gas, influence of oxygen admixture coming from the chamber walls on behavior of Ew dependence on tg should be considerably less due to relative smallness of the amount of this ad- mixture, as compared to oxygen amount in air. Due to that, NO(A) concentration (and, consequently, Ew value) in each time point should be mainly determined only by the processes of quenching N2(A) excited molecules by ОН(X) and H particles. Thus, with a decrease of amount of water vapor amount detached from the chamber walls Еw value should grow up. Behavior of temporal depend- encies of O2 and H concentrations in our experiments is estimated by radiation of Schumann-Runge system O2 and Balmer line of hydrogen Hα (radiation intensities of these particles are, in the first approximation, propor- tional to their densities, since their excitation occurs only by electron impacts). One can see from Fig.5 that the intensity of radiation of oxygen molecules diminishes in time rather quickly, and already at tg ≈ 100 s reaches its quasistationary value (that is, О2 concentration in the chamber returns to the value corresponding the content in ambient air). 0 100 200 300 400 500 600 0 100 200 300 400 500 600 700 2 1In te ns ity , a .u . Time t g , s Fig.5. Dependencies of radiation intensities of certain lines of plasma particles of the discharge in ambient air on glow time tg. 1 - Hα, 656.3 nm, 2 - O2 (Schumann- Runge system), 219.4 nm. P = 8 Pa, Wd = 0.08 W/cc At the same time, decrease of Balmer hydrogen line Hα radiation intensity (in other words, water vapor con- centration) occurs considerably slower (practically “syn- chronously” with Ew value growth), thus approving the assumption expressed by us. As it was already mentioned above, Ew depends not only on the discharge glow time tg, but as well on gas pressure in the discharge chamber. One can see from Fig. 6 that in case of oxygen use Ew decreases monoto- nously with pressure increase in a whole used range of oxygen pressure, and curves of Ew dependencies for the discharges in air and nitrogen possess a maximum. 2 4 6 8 10 12 14 16 18 20 22 24 0 200 400 600 800 1000 1200 1400 1600 1800 2000 c) b) a) U V flu en ce ra te E w, a. u. Pressure P, Pa 238 Fig.6. Dependence of “weighed” fluence rate Ew of UV radiation on pressure of gases: a - oxygen; b - nitrogen; c - ambient air at tg = 240 s. Wd = 0.08 W/cc It should be noted that 1) in spite of fact that main channel of NO(A) generation is reaction (1) with par- ticipation of only electrically neutral particles, concen- tration of the last is determined by processes with par- ticipation of electrons; 2) our previous researches have shown that, at constant specific power introduced into the discharge, plasma concentration is practically inde- pendent on pressure variation in a range of ≈ (4…20) Pa. Due to that, in all cases Ew behavior is determined by ratio of the rates of concentration growth for oxygen and nitrogen molecules and by decrease of the rates of reactions of their dissociation and excitation by electron impact at pressure increase (the last results in diminishing mean energy of the plasma electrons and, consequently, in decrease of rates of these reactions). That is, in case of the discharge in oxygen the reason of monotonous Ew decrease with pressure growth is due to fact that, in all range of Р variation, excitation rates of SNS O2 + and SRS O2 fall down faster than О2 concen- tration grows up. Respectively, presence of maximum at Ew dependencies on Р at the use of nitrogen and ambient air is due to lower, as compared to the case of oxygen, pace of diminishing the rates of oxygen dissociation reactions and excitation of nitrogen vibration levels. Let us consider in more details the reasons of such differ- ence in paces of diminishing the rates of these elemen- tary processes with pressure variation. In the first ap- proximation, rates of the processes with participation of electrons k ∼ σ(ε)*f(ε), where σ(ε) is the process cross section, f(ε) is plasma electron energy distribution func- tion. As it is known [11,12], threshold energies for cross sections of oxygen dissociation and excitation of nitro- gen vibration levels are lower than threshold energies for cross sections of excitation of SNS O2 + and SRS O2. And, since at decrease of mean energy of plasma elec- trons with gas pressure growth electron quantity in a range of cross sections of oxygen dissociation and exci- tation of nitrogen vibration level falls down slower than in a range of cross sections of excitation of SNS O2 + and SRS O2, this results in lower rates of reactions of O2 dissociation and excitation of N2 vibration levels, as compared to the rates of reactions of excitation of O2 and O2 +. Here it should be also noted that in case of the discharge in nitrogen the behavior of Ew dependence on P is influenced by oxygen concentration decrease, as nitrogen pressure in the discharge chamber increases. Respective decrease of NO(X) concentration results in fact that Ew reaches its maximum values at lower gas pressure, as compared to the case of ambient air use. It has been already determined that for all used gases fluence Fw of UV radiation practically linearly grows with tg (see. Fig.7), at that Fw value for the discharge plasma in ambient air considerably exceeds UV fluence for the discharges in oxygen and nitrogen (which are close in their values) in the whole range of tg variation. c a b 0 200 400 600 800 1000 1200 0,0 0,2 0,4 0,6 0,8 1,0 1,2 c) a) b) U V flu en ce F w , a .u . Time t d , s c b a Fig.7. Dependencies of “weighed” fluence Fw of UV radiation on the discharge glow time tg: a - oxygen; b - nitrogen; c - ambient air. Wd = 0.08 W/cc, P = 15 Pa The experiments have also shown that at all gas pressure values UV fluence value grows up linearly with the increase of power introduced into the discharge Wd (Fig.8 represents respective dependencies for the case of the discharge in ambient air at pressure of 16.4 Pa). 0,03 0,04 0,05 0,06 0,07 0,08 0,09 0,0 0,1 0,2 0,3 0,4 0,5 0,6 0,7 0,8 U V F lu en ce F w , a .u . Power Wd, W/cc 500 s 300 s 200 s 100 s Fig.8. Dependencies of “weighed” fluence Fw of UV radiation on specific power in the discharge Wd at the use of ambient air for different time points tg. P = 16.4 Pa REFERENCES 1. V.A. Khomich, I.A. Soloshenko, V.V. Tsiolko, et al. Investigation of Principal Factors of the Sterilization by Plasma DC Glow Discharge // Proceedings of the International Congress on Plasma Physics, Prague. 1998, p.2745-2748. 239 2. I.A. Soloshenko, V.V. Tsiolko, V.A. Khomich, et al. Sterilization of medical products in low-pressure glow discharges//Plasma physics reports. 2000, v.26, №9, p.792-800. 3. V.V. Tsiolko, V.Yu. Bazhenov, and V.A. Khomich. Features of the Bac. subtilis Spores inactivation by UV radiation of cold hollow cathode discharge plasma // Proceedings of the III Central European Symposium on Plasma Chemistry, Kyiv. 2009, p.63-64. 4. T. Inagaki, R.N. Hamm, E.T. Arakawa, and L.R. Painter. Optical and dielectric properties of DNA in extreme ultraviolet // J. Chem. Phys. 1974, v.61, №10, p.4246-4250. 5. N. Munakata, M. Saito, and K. Hiera. Inactivation action spectra of Bacillus subtilis spores in extended ultraviolet wavelengths (50-300 nm) obtained with synchrotron radiation // Photochemistry and Photo- biology. 1991, v.54, №5, p.761-768. 6. B.F. Gordiets, C.M. Ferreira, V.L. Guerra, et al. Ki- netic model of a low-pressure N2-O2 flowing glow discharge // IEEE Trans. Plasma Sci. 1995, v.23, №4, p.750-768. 7. V.L. Guerra and J. Loureiro. Self-consistent elec- trons and heavy particles kinetics in a low-pressure N2-O2 glow discharge // Plasma source science and technology. 1997, v.6, p.373-385. 8. G. Dilecce, M. Simek, and S. De Benedictis, The N2(A3Σu +) energy transfer to OH(A2Σ+) in low pres- sure pulsed RF discharge // J. Phys. D: Appl. Phys. 2001, v.34, p.1799-1806. 9. M. Kubo, M. Kogoma, T. Moriwaki, and S. Okazaki. Rate constants for deactivation of N2* (A3Σu +, nu =0, 1) by H and D atoms // J. Phys. B: At. Mol. Opt. Phys. 1989, v.22, p.3011-3016. 10. M. Kubo, M. Kogoma, M. Miyamoto, S. Okazaki. Elemental kinetics in NH synthesis in N -H - plasma; behavior of N ( A) in ammonia synthesis // Proceedings of the ISPC-9, Pugnochiuso, Italy. 1989, p.786-789. 3 2 2 2 * 3 11. Y. Itikawa, A. Ichimura, K. Onda, et al. Cross Sec- tion for Collisions of Electrons and Photons with Oxygen Molecules // J. Phys. Chem. Ref. Data. 1989, v.18, №1, p.12-42. 12. Y. Itikawa, M. Hayashi, A. Ichimura, et al. Cross Section for Collisions of Electrons and Photons with Nitrogen Molecules // J. Phys. Chem. Ref. Data. 1986, v.15, №3, p.985-1010. Статья поступила в редакцию 31.05.2010 г. ОСОБЕННОСТИ УЛЬТРАФИОЛЕТОВОГО ИЗЛУЧЕНИЯ ПЛАЗМЫ РАЗРЯДА С ПОЛЫМ КАТОДОМ, ИСПОЛЬЗУЕМОГО ДЛЯ СТЕРИЛИЗАЦИИ МЕДИЦИНСКИХ ИЗДЕЛИЙ В.В. Циолко, В.Ю. Баженов, В.А. Хомич, В.М. Пиун Исследовано влияние примесей молекул воздуха и воды, оторванных от стенок камеры под действием ионных ударов, на УФ-излучение плазмы разряда с полым катодом на кислороде, азоте и воздухе. Установ- лены зависимости интенсивности и дозы УФ-излучения от длительности горения разряда, вида рабочего газа, его давления и мощности в разряде. ОСОБЛИВОСТІ УЛЬТРАФІОЛЕТОВОГО ВИПРОМІНЮВАННЯ ПЛАЗМИ РОЗРЯДУ З ПОРОЖНИСТИМ КАТОДОМ, ЩО ВИКОРИСТОВУЄТЬСЯ ДЛЯ СТЕРИЛІЗАЦІЇ МЕДИЧНИХ ВИРОБІВ В.В. Ціолко, В.Ю. Баженов, В.О. Хомич, В.М. Піун Досліджено вплив домішок молекул повітря та води, відірваних зі стінок камери під впливом іонних ударів, на УФ-випромінювання плазми розряду з порожнистим катодом на кисні, азоті та повітрі. Встанов- лено залежності інтенсивності та дози УФ-випромінювання від тривалості горіння розряду, виду робочого газу, його тиску та потужності в розряді. http://www.iop.org/EJ/search_author?query2=M%20Kogoma&searchfield2=authors&journaltype=all&datetype=all&sort=date_cover&submit=1 http://www.iop.org/EJ/search_author?query2=T%20Moriwaki&searchfield2=authors&journaltype=all&datetype=all&sort=date_cover&submit=1 http://www.iop.org/EJ/search_author?query2=S%20Okazaki&searchfield2=authors&journaltype=all&datetype=all&sort=date_cover&submit=1 http://www.iop.org/EJ/search_author?query2=M%20Kubo&searchfield2=authors&journaltype=all&datetype=all&sort=date_cover&submit=1 http://www.iop.org/EJ/search_author?query2=M%20Kogoma&searchfield2=authors&journaltype=all&datetype=all&sort=date_cover&submit=1 ОСОБЛИВОСТІ УЛЬТРАФІОЛЕТОВОГО ВИПРОМІНЮВАННЯ ПЛАЗМИ РОЗРЯДУ З ПОРОЖНИСТИМ КАТОДОМ, ЩО ВИКОРИСТОВУЄТЬСЯ ДЛЯ СТЕРИЛІЗАЦІЇ МЕДИЧНИХ ВИРОБІВ
id nasplib_isofts_kiev_ua-123456789-17337
institution Digital Library of Periodicals of National Academy of Sciences of Ukraine
issn 1562-6016
language English
last_indexed 2025-11-28T17:46:50Z
publishDate 2010
publisher Національний науковий центр «Харківський фізико-технічний інститут» НАН України
record_format dspace
spelling Tsiolko, V.V.
Bazhenov, V.Yu.
Khomich, V.A.
Piun, V.M.
2011-02-25T13:47:19Z
2011-02-25T13:47:19Z
2010
Peculiarities of UV radiation from hollow cathode discharge plasma used for sterilization of medical articles / V.V. Tsiolko, V.Yu. Bazhenov, V.A. Khomich, V.M. Piun // Вопросы атомной науки и техники. — 2010. — № 4. — С. 234-239. — Бібліогр.: 12 назв. — англ.
1562-6016
https://nasplib.isofts.kiev.ua/handle/123456789/17337
Influence of air and water molecules detached from the chamber walls under ion impacts on UV radiation from hollow cathode discharge plasma in oxygen, nitrogen, and air is studied. Dependencies of UV radiation intensity and dose on the discharge glow duration, working gas type and pressure, and the discharge power are determined.
Исследовано влияние примесей молекул воздуха и воды, оторванных от стенок камеры под действием ионных ударов, на УФ-излучение плазмы разряда с полым катодом на кислороде, азоте и воздухе. Установлены зависимости интенсивности и дозы УФ-излучения от длительности горения разряда, вида рабочего газа, его давления и мощности в разряде.
Досліджено вплив домішок молекул повітря та води, відірваних зі стінок камери під впливом іонних ударів, на УФ-випромінювання плазми розряду з порожнистим катодом на кисні, азоті та повітрі. Встановлено залежності інтенсивності та дози УФ-випромінювання від тривалості горіння розряду, виду робочого газу, його тиску та потужності в розряді.
en
Національний науковий центр «Харківський фізико-технічний інститут» НАН України
Плазменно-пучковый разряд, газовый разряд и плазмохимия
Peculiarities of UV radiation from hollow cathode discharge plasma used for sterilization of medical articles
Особенности ультрафиолетового излучения плазмы разряда с полым катодом, используемого для стерилизации медицинских изделий
Особливості ультрафіолетового випромінювання плазми розряду з порожнистим катодом, що використовується для стерилізації медичних виробів
Article
published earlier
spellingShingle Peculiarities of UV radiation from hollow cathode discharge plasma used for sterilization of medical articles
Tsiolko, V.V.
Bazhenov, V.Yu.
Khomich, V.A.
Piun, V.M.
Плазменно-пучковый разряд, газовый разряд и плазмохимия
title Peculiarities of UV radiation from hollow cathode discharge plasma used for sterilization of medical articles
title_alt Особенности ультрафиолетового излучения плазмы разряда с полым катодом, используемого для стерилизации медицинских изделий
Особливості ультрафіолетового випромінювання плазми розряду з порожнистим катодом, що використовується для стерилізації медичних виробів
title_full Peculiarities of UV radiation from hollow cathode discharge plasma used for sterilization of medical articles
title_fullStr Peculiarities of UV radiation from hollow cathode discharge plasma used for sterilization of medical articles
title_full_unstemmed Peculiarities of UV radiation from hollow cathode discharge plasma used for sterilization of medical articles
title_short Peculiarities of UV radiation from hollow cathode discharge plasma used for sterilization of medical articles
title_sort peculiarities of uv radiation from hollow cathode discharge plasma used for sterilization of medical articles
topic Плазменно-пучковый разряд, газовый разряд и плазмохимия
topic_facet Плазменно-пучковый разряд, газовый разряд и плазмохимия
url https://nasplib.isofts.kiev.ua/handle/123456789/17337
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