Deuterium trapping and sputtering of tungsten coatings exposed to low-energy deuterium plasma
Processes of sputtering, surface modification and deuterium retention of tungsten coatings were studied under the influence of low-energy (500 eV) deuterium plasma with fluence (2·10²⁴D+/m²) at room temperature. The method of cathodic arc evaporation was used to deposit W and WN-coatings on stainles...
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| Published in: | Вопросы атомной науки и техники |
|---|---|
| Date: | 2020 |
| Main Authors: | Tolstolutskaya, G.D., Kuprin, A.S., Nikitin, A.V., Kopanets, I.E., Voyevodin, V.N., Kolodiy, I.V., Vasilenko, R.L., Ilchenko, A.V. |
| Format: | Article |
| Language: | English |
| Published: |
Національний науковий центр «Харківський фізико-технічний інститут» НАН України
2020
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| Online Access: | https://nasplib.isofts.kiev.ua/handle/123456789/194363 |
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| Journal Title: | Digital Library of Periodicals of National Academy of Sciences of Ukraine |
| Cite this: | Deuterium trapping and sputtering of tungsten coatings exposed to low-energy deuterium plasma / G.D. Tolstolutskaya, A.S. Kuprin, A.V. Nikitin, I.E. Kopanets, V.N. Voyevodin, I.V. Kolodiy, R.L. Vasilenko, A.V. Ilchenko // Problems of atomic science and tecnology. — 2020. — № 2. — С. 54-59. — Бібліогр.: 23 назв. — англ. |
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