Ion-plasma deposition of thin quasicrystalline Al-Cu-Fe and Al-Cu-Co films

• Published in: Вопросы атомной науки и техники
• Date: 2020
• Main Authors: Ryabtsev, S.I., Sukhova, O.V.
• Format: Article
• Language: English
• Published: Національний науковий центр «Харківський фізико-технічний інститут» НАН України 2020
• Subjects: Physics of radiation and ion-plasma technologies
• Online Access: https://nasplib.isofts.kiev.ua/handle/123456789/194377
• Journal Title: Digital Library of Periodicals of National Academy of Sciences of Ukraine
• Cite this: Ion-plasma deposition of thin quasicrystalline Al-Cu-Fe and Al-Cu-Co films / S.I. Ryabtsev, O.V. Sukhova // Problems of atomic science and tecnology. — 2020. — № 2. — С. 145-150. — Бібліогр.: 32 назв. — англ.

Al-Cu-Fe and Al-Co-Cu thin films were firstly deposited on sodium chloride or glass-ceramic substrates by modernized method of three-electrode ion-plasma sputtering. The nominal compositions of the films were chosen in the regions of quasicrystalline phases formation. The as-sputtered films were typ...