Redistribution of sputtered material in a plane ion-plasma system with an abnormal glow discharge

• Published in: Вопросы атомной науки и техники
• Date: 2020
• Main Authors: Kuzmichev, A.I., Melnichenko, M.S., Shinkarenko, V.G., Shulaev, V.M.
• Format: Article
• Language: English
• Published: Національний науковий центр «Харківський фізико-технічний інститут» НАН України 2020
• Subjects: Low temperature plasma and plasma technologies
• Online Access: https://nasplib.isofts.kiev.ua/handle/123456789/194653
• Journal Title: Digital Library of Periodicals of National Academy of Sciences of Ukraine
• Cite this: Redistribution of sputtered material in a plane ion-plasma system with an abnormal glow discharge / A.I. Kuzmichev, M.S. Melnichenko, V.G. Shinkarenko, V.M. Shulaev // Problems of atomic science and tecnology. — 2020. — № 6. — С. 103-106. — Бібліогр.: 10 назв. — англ.

The redistribution of the flow of sputtered material of a target (cathode) between the collector and the target in a plane–parallel electrode system with an anomalous glow discharge is analyzed in the kinetic approximation. Sputtering is the result of bombardment of the target by gas ions accelerate...