Magnetron discharge intensification for effective deposition of coatings from difficult spray metals

• Veröffentlicht in: Вопросы атомной науки и техники
• Datum: 2020
• Hauptverfasser: Chunadra, А.G., Sereda, К.N., Tarasov, I.K., Vereshchaka, Y.A.
• Format: Artikel
• Sprache: Englisch
• Veröffentlicht: Національний науковий центр «Харківський фізико-технічний інститут» НАН України 2020
• Schlagworte: Low temperature plasma and plasma technologies
• Online Zugang: https://nasplib.isofts.kiev.ua/handle/123456789/194663
• Назва журналу: Digital Library of Periodicals of National Academy of Sciences of Ukraine
• Zitieren: Magnetron discharge intensification for effective deposition of coatings from difficult spray metals / А.G. Chunadra, К.N. Sereda, I.K. Tarasov, Y.A. Vereshchaka // Problems of atomic science and tecnology. — 2020. — № 6. — С. 146-149. — Бібліогр.: 4 назв. — англ.

The work is devoted to improvement of magnetron discharge parameters based on a standard magnetron sputtering system (MSS) of the MAG-5 type with an additional anode magnetic trap for discharge electrons in the conditions of localization of the discharge zone in the gap between electrodes to prevent...