Control of ionization processes in magnetron sputtering system by changing magnetic field configuration
This work is devoted to measuring the function of the distribution of charged particles of gas-discharge plasma in a magnetron sputtering system under conditions of non-potential “earth”. Measurements are carried out with the help of a three-electrode probe, which is installed in the cathode sputter...
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| Date: | 2021 |
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| Main Authors: | , , , |
| Format: | Article |
| Language: | English |
| Published: |
Національний науковий центр «Харківський фізико-технічний інститут» НАН України
2021
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| Series: | Вопросы атомной науки и техники |
| Subjects: | |
| Online Access: | https://nasplib.isofts.kiev.ua/handle/123456789/194765 |
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| Journal Title: | Digital Library of Periodicals of National Academy of Sciences of Ukraine |
| Cite this: | Control of ionization processes in magnetron sputtering system by changing magnetic field configuration / А.G. Chunadra, К.N. Sereda, I.K. Tarasov, V.A. Makhlai // Problems of atomic science and tecnology. — 2021. — № 1. — С. 102-105. — Бібліогр.: 7 назв. — англ. |