Control of ionization processes in magnetron sputtering system by changing magnetic field configuration

• Published in: Вопросы атомной науки и техники
• Date: 2021
• Main Authors: Chunadra, А.G., Sereda, К.N., Tarasov, I.K., Makhlai, V.A.
• Format: Article
• Language: English
• Published: Національний науковий центр «Харківський фізико-технічний інститут» НАН України 2021
• Subjects: Low temperature plasma and plasma technologies
• Online Access: https://nasplib.isofts.kiev.ua/handle/123456789/194765
• Journal Title: Digital Library of Periodicals of National Academy of Sciences of Ukraine
• Cite this: Control of ionization processes in magnetron sputtering system by changing magnetic field configuration / А.G. Chunadra, К.N. Sereda, I.K. Tarasov, V.A. Makhlai // Problems of atomic science and tecnology. — 2021. — № 1. — С. 102-105. — Бібліогр.: 7 назв. — англ.

This work is devoted to measuring the function of the distribution of charged particles of gas-discharge plasma in a magnetron sputtering system under conditions of non-potential “earth”. Measurements are carried out with the help of a three-electrode probe, which is installed in the cathode sputter...