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Control of ionization processes in magnetron sputtering system by changing magnetic field configuration

This work is devoted to measuring the function of the distribution of charged particles of gas-discharge plasma in a magnetron sputtering system under conditions of non-potential “earth”. Measurements are carried out with the help of a three-electrode probe, which is installed in the cathode sputter...

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Veröffentlicht in:	Вопросы атомной науки и техники
Datum:	2021
Hauptverfasser:	Chunadra, А.G., Sereda, К.N., Tarasov, I.K., Makhlai, V.A.
Format:	Artikel
Sprache:	Englisch
Veröffentlicht:	Національний науковий центр «Харківський фізико-технічний інститут» НАН України 2021
Schlagworte:	Low temperature plasma and plasma technologies
Online Zugang:	https://nasplib.isofts.kiev.ua/handle/123456789/194765
Tags:	Tag hinzufügen Keine Tags, Fügen Sie den ersten Tag hinzu!
Назва журналу:	Digital Library of Periodicals of National Academy of Sciences of Ukraine
Zitieren:	Control of ionization processes in magnetron sputtering system by changing magnetic field configuration / А.G. Chunadra, К.N. Sereda, I.K. Tarasov, V.A. Makhlai // Problems of atomic science and tecnology. — 2021. — № 1. — С. 102-105. — Бібліогр.: 7 назв. — англ.

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