Potential part of electric field of ICP coil

• Published in: Вопросы атомной науки и техники
• Date: 2021
• ISSN: 1562-6016
• Main Authors: Azarenkov, N.A., Gapon, A.V.
• Format: Article
• Language: English
• Published: Національний науковий центр «Харківський фізико-технічний інститут» НАН України 2021
• Subjects: Low temperature plasma and plasma technologies
• Online Access: https://nasplib.isofts.kiev.ua/handle/123456789/194775
• Journal Title: Digital Library of Periodicals of National Academy of Sciences of Ukraine
• Cite this: Potential part of electric field of ICP coil / N.A. Azarenkov, A.V. Gapon // Problems of atomic science and tecnology. — 2021. — № 1. — С. 150-153. — Бібліогр.: 2 назв. — англ.

ICP devices are widespread in modern technology, so the capacitive coupling in ICP is well known. It does not make a sufficient impact to the power deposition in plasma, and mostly it assumed to be a harmful effect [1]. Fortunately, making use of Faraday shield allows one to avoid a detail investiga...