Investigation of interaction between ion-beam plasma and processed surface during the synthesis of tantalum diboride and pentaoxide
The paper is devoted to investigation of spatial distributions of ion current density to a sample in technological set-up with magnetron sputtering system and ICP source. The dependence of the ion flux towards the processed surface on the parameters of the deposition process was measured. The follow...
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| Veröffentlicht in: | Вопросы атомной науки и техники |
|---|---|
| Datum: | 2019 |
| Hauptverfasser: | Yakovin, S., Zykov, A., Dudin, S., Dakhov, A., Yefymenko, N. |
| Format: | Artikel |
| Sprache: | English |
| Veröffentlicht: |
Національний науковий центр «Харківський фізико-технічний інститут» НАН України
2019
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| Schlagworte: | |
| Online Zugang: | https://nasplib.isofts.kiev.ua/handle/123456789/194909 |
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| Назва журналу: | Digital Library of Periodicals of National Academy of Sciences of Ukraine |
| Zitieren: | Investigation of interaction between ion-beam plasma and processed surface during the synthesis of tantalum diboride and pentaoxide / S. Yakovin, A. Zykov, S. Dudin, A. Dakhov, N. Yefymenko // Problems of atomic science and technology. — 2019. — № 1. — С. 229-232. — Бібліогр.: 10 назв. — англ. |
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