Investigation of interaction between ion-beam plasma and processed surface during the synthesis of tantalum diboride and pentaoxide

The paper is devoted to investigation of spatial distributions of ion current density to a sample in technological set-up with magnetron sputtering system and ICP source. The dependence of the ion flux towards the processed surface on the parameters of the deposition process was measured. The follow...

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Veröffentlicht in:Вопросы атомной науки и техники
Datum:2019
Hauptverfasser: Yakovin, S., Zykov, A., Dudin, S., Dakhov, A., Yefymenko, N.
Format: Artikel
Sprache:English
Veröffentlicht: Національний науковий центр «Харківський фізико-технічний інститут» НАН України 2019
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Online Zugang:https://nasplib.isofts.kiev.ua/handle/123456789/194909
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Назва журналу:Digital Library of Periodicals of National Academy of Sciences of Ukraine
Zitieren:Investigation of interaction between ion-beam plasma and processed surface during the synthesis of tantalum diboride and pentaoxide / S. Yakovin, A. Zykov, S. Dudin, A. Dakhov, N. Yefymenko // Problems of atomic science and technology. — 2019. — № 1. — С. 229-232. — Бібліогр.: 10 назв. — англ.

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