Digital processing of optical emission spectra of magnetron sputtering plasma system

• Datum: 2019
• Hauptverfasser: Afanasіeva, I.A., Afanasiev, S.N., Azarenkov, N.A., Bobkov, V.V., Gritsyna, V.V., Logachev, Yu.E., Okseniuk, I.I., Skrypnyk, A.A., Shevchenko, D.I., Chornous, V.M.
• Format: Artikel
• Sprache: English
• Veröffentlicht: Національний науковий центр «Харківський фізико-технічний інститут» НАН України 2019
• Schriftenreihe: Вопросы атомной науки и техники
• Schlagworte: Physics of radiotechnology and ion-plasma technologies
• Online Zugang: https://nasplib.isofts.kiev.ua/handle/123456789/194956
• Назва журналу: Digital Library of Periodicals of National Academy of Sciences of Ukraine
• Zitieren: Digital processing of optical emission spectra of magnetron sputtering plasma system / I.A. Afanasіeva, S.N. Afanasiev, N.A. Azarenkov, V.V. Bobkov, V.V. Gritsyna, Yu.E. Logachev, I.I. Okseniuk, A.A. Skrypnyk, D.I. Shevchenko, V.M. Chornous // Problems of atomic science and technology. — 2019. — № 2. — С. 164. — Бібліогр.: 7 назв. — англ.

To solve the actual problem of the analysis of the sputtered particles radiation during coating deposition in a magnetron sputtering system, a digital technique was proposed for processing the emission spectra of the discharge plasma. A graphic OSA application has been created, which allows obtainin...