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Effect of pulsed substrate biasing on macroparticle in vacuum arc

An analytical model of the interaction of macroparticle (MP) with vacuum arc plasma in plasma immersion ion implantation (PIII) is presented. The proposed model is based on combination of the theory of charge dynamics of MP and sheath model for PIII. In the framework of this model, the MP charge dyn...

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Bibliographic Details
Published in:	Вопросы атомной науки и техники
Date:	2019
Main Authors:	Romashchenko, E.V., Bizyukov, A.A., Girka, I.О.
Format:	Article
Language:	English
Published:	Національний науковий центр «Харківський фізико-технічний інститут» НАН України 2019
Subjects:	Gas and plasma-beam discharges and their applications
Online Access:	https://nasplib.isofts.kiev.ua/handle/123456789/195192
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Journal Title:	Digital Library of Periodicals of National Academy of Sciences of Ukraine
Cite this:	Effect of pulsed substrate biasing on macroparticle in vacuum arc / E.V. Romashchenko, A.A. Bizyukov, I.О. Girka // Problems of atomic science and technology. — 2019. — № 4. — С. 120-123. — Бібліогр.: 17 назв. — англ.

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