Effect of pulsed substrate biasing on macroparticle in vacuum arc

• Published in: Вопросы атомной науки и техники
• Date: 2019
• Main Authors: Romashchenko, E.V., Bizyukov, A.A., Girka, I.О.
• Format: Article
• Language: English
• Published: Національний науковий центр «Харківський фізико-технічний інститут» НАН України 2019
• Subjects: Gas and plasma-beam discharges and their applications
• Online Access: https://nasplib.isofts.kiev.ua/handle/123456789/195192
• Journal Title: Digital Library of Periodicals of National Academy of Sciences of Ukraine
• Cite this: Effect of pulsed substrate biasing on macroparticle in vacuum arc / E.V. Romashchenko, A.A. Bizyukov, I.О. Girka // Problems of atomic science and technology. — 2019. — № 4. — С. 120-123. — Бібліогр.: 17 назв. — англ.

An analytical model of the interaction of macroparticle (MP) with vacuum arc plasma in plasma immersion ion implantation (PIII) is presented. The proposed model is based on combination of the theory of charge dynamics of MP and sheath model for PIII. In the framework of this model, the MP charge dyn...