Deposition of TiN-based coatings using vacuum arc plasma in increased negative substrate bias voltage

• Veröffentlicht in: Вопросы атомной науки и техники
• Datum: 2019
• Hauptverfasser: Kuprin, A.S., Leonov, S.A., Ovcharenko, V.D., Reshetnyak, E.N., Belous, V.A., Vasilenko, R.L., Tolmachova, G.N., Kovalenko, V.I., Klimenko, I.O.
• Format: Artikel
• Sprache: Englisch
• Veröffentlicht: Національний науковий центр «Харківський фізико-технічний інститут» НАН України 2019
• Schlagworte: Physics of radiotechnology and ion-plasma technologies
• Online Zugang: https://nasplib.isofts.kiev.ua/handle/123456789/195216
• Назва журналу: Digital Library of Periodicals of National Academy of Sciences of Ukraine
• Zitieren: Deposition of TiN-based coatings using vacuum arc plasma in increased negative substrate bias voltage / A.S. Kuprin, S.A. Leonov, V.D. Ovcharenko, E.N. Reshetnyak, V.A. Belous, R.L. Vasilenko, G.N. Tolmachova, V.I. Kovalenko, I.O. Klimenko // Problems of atomic science and technology. — 2019. — № 5. — С. 154-160. — Бібліогр.: 29 назв. — англ.

The paper presents the results of the study on the influence of a high substrate bias voltage from 300 up to 1300 V on the titanium nitride coating deposition under nitrogen pressure of 2 Pa. The deposition rate, phase and chemical composition, adhesion and mechanical properties of coatings, macropa...