Features of plasma chemical etching of lithium tantalate substrate (LiTaO₃)

• Published in: Вопросы атомной науки и техники
• Date: 2021
• Main Authors: Fedorovich, O.A., Hladkovska, O.V., Hladkovskyi, V.V., Nedybaliuk, A.F.
• Format: Article
• Language: English
• Published: Національний науковий центр «Харківський фізико-технічний інститут» НАН України 2021
• Subjects: Applications and technologies
• Online Access: https://nasplib.isofts.kiev.ua/handle/123456789/195429
• Journal Title: Digital Library of Periodicals of National Academy of Sciences of Ukraine
• Cite this: Features of plasma chemical etching of lithium tantalate substrate (LiTaO₃) / O.A. Fedorovich, O.V. Hladkovska, V.V. Hladkovskyi, A.F. Nedybaliuk // Problems of Atomic Science and Technology. — 2021. — № 4. — С. 188-190. — Бібліогр.: 4 назв. — англ.

The results of researches of plasma chemical treatment of lithium monocrystalline tantalate (LiTaO₃) from gas type, bias voltage (energy of chemically active ions) and from current of additional bias generator are given. A closed-loop electron drift plasma chemical reactor and gas mixtures containin...