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Simulation of plasma wakefield focusing and self-focusing of a short sequence of electron bunches depending on the bunch length, shape and distance between bunches

By using two-dimensional numerical simulation, the ratio between the effects of wakefield focusing and self-focusing during the propagation of a short sequence of electron bunches in plasma has been simulated. Cases of dominant wakefield focusing have been demonstrated. In addition, the collection d...

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Veröffentlicht in:	Problems of Atomic Science and Technology
Datum:	2022
Hauptverfasser:	Bondar, D.S., Maslov, V.I., Onishchenko, I.N.
Format:	Artikel
Sprache:	Englisch
Veröffentlicht:	Національний науковий центр «Харківський фізико-технічний інститут» НАН України 2022
Schlagworte:	Basic plasma physics
Online Zugang:	https://nasplib.isofts.kiev.ua/handle/123456789/195882
Tags:	Tag hinzufügen Keine Tags, Fügen Sie den ersten Tag hinzu!
Назва журналу:	Digital Library of Periodicals of National Academy of Sciences of Ukraine
Zitieren:	Simulation of plasma wakefield focusing and self-focusing of a short sequence of electron bunches depending on the bunch length, shape and distance between bunches / ПІБ // Problems of Atomic Science and Technology. — 2022. — № 6. — С. 36-39. — Бібліогр.: 14 назв. — англ.

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Digital Library of Periodicals of National Academy of Sciences of Ukraine

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