Simulation of plasma wakefield focusing and self-focusing of a short sequence of electron bunches depending on the bunch length, shape and distance between bunches

• Published in: Problems of Atomic Science and Technology
• Date: 2022
• Main Authors: Bondar, D.S., Maslov, V.I., Onishchenko, I.N.
• Format: Article
• Language: English
• Published: Національний науковий центр «Харківський фізико-технічний інститут» НАН України 2022
• Subjects: Basic plasma physics
• Online Access: https://nasplib.isofts.kiev.ua/handle/123456789/195882
• Journal Title: Digital Library of Periodicals of National Academy of Sciences of Ukraine
• Cite this: Simulation of plasma wakefield focusing and self-focusing of a short sequence of electron bunches depending on the bunch length, shape and distance between bunches / ПІБ // Problems of Atomic Science and Technology. — 2022. — № 6. — С. 36-39. — Бібліогр.: 14 назв. — англ.

By using two-dimensional numerical simulation, the ratio between the effects of wakefield focusing and self-focusing during the propagation of a short sequence of electron bunches in plasma has been simulated. Cases of dominant wakefield focusing have been demonstrated. In addition, the collection d...