Chunadra, А., Sereda, К., Tarasov, I., Makhlai, V., & Kozhukhovskyi, B. (2022). Influence of magnetic field configuration and strength on plasma parameters and efficiency of coatings deposition in magnetron sputtering system. Problems of Atomic Science and Technology.
Чикаго стиль цитування (17-те видання)Chunadra, А.G, К.N Sereda, I.K Tarasov, V.A Makhlai, та B.M Kozhukhovskyi. "Influence of Magnetic Field Configuration and Strength on Plasma Parameters and Efficiency of Coatings Deposition in Magnetron Sputtering System." Problems of Atomic Science and Technology 2022.
Стиль цитування MLA (8-ме видання)Chunadra, А.G, et al. "Influence of Magnetic Field Configuration and Strength on Plasma Parameters and Efficiency of Coatings Deposition in Magnetron Sputtering System." Problems of Atomic Science and Technology, 2022.