Chunadra, А., Sereda, К., Tarasov, I., Makhlai, V., & Kozhukhovskyi, B. (2022). Influence of magnetic field configuration and strength on plasma parameters and efficiency of coatings deposition in magnetron sputtering system. Problems of Atomic Science and Technology.
Chicago-Zitierstil (17. Ausg.)Chunadra, А.G, К.N Sereda, I.K Tarasov, V.A Makhlai, und B.M Kozhukhovskyi. "Influence of Magnetic Field Configuration and Strength on Plasma Parameters and Efficiency of Coatings Deposition in Magnetron Sputtering System." Problems of Atomic Science and Technology 2022.
MLA-Zitierstil (8. Ausg.)Chunadra, А.G, et al. "Influence of Magnetic Field Configuration and Strength on Plasma Parameters and Efficiency of Coatings Deposition in Magnetron Sputtering System." Problems of Atomic Science and Technology, 2022.