Influence of magnetic field configuration and strength on plasma parameters and efficiency of coatings deposition in magnetron sputtering system

• Published in: Problems of Atomic Science and Technology
• Date: 2022
• Main Authors: Chunadra, А.G., Sereda, К.N., Tarasov, I.K., Makhlai, V.A., Kozhukhovskyi, B.M.
• Format: Article
• Language: English
• Published: Національний науковий центр «Харківський фізико-технічний інститут» НАН України 2022
• Subjects: Low temperature plasma and plasma technologies
• Online Access: https://nasplib.isofts.kiev.ua/handle/123456789/195896
• Journal Title: Digital Library of Periodicals of National Academy of Sciences of Ukraine
• Cite this: Influence of magnetic field configuration and strength on plasma parameters and efficiency of coatings deposition in magnetron sputtering system / А.G. Chunadra, К.N. Sereda, I.K. Tarasov, V.A. Makhlai, B.M. Kozhukhovskyi // Problems of Atomic Science and Technology. — 2022. — № 6. — С. 103-106. — Бібліогр.: 6 назв. — англ.

Paper presents results of evaluation of the influence of the parameters of the additional anode electromagnetic trap for discharge electrons in a magnetron sputtering system. The efficiency of ionization processes is also investigated. It has been shown experimentally that a slight increase of the a...