Buchumschlag

Influence of magnetic field configuration and strength on plasma parameters and efficiency of coatings deposition in magnetron sputtering system

Paper presents results of evaluation of the influence of the parameters of the additional anode electromagnetic trap for discharge electrons in a magnetron sputtering system. The efficiency of ionization processes is also investigated. It has been shown experimentally that a slight increase of the a...

Ausführliche Beschreibung

Gespeichert in:

Bibliographische Detailangaben
Veröffentlicht in:	Problems of Atomic Science and Technology
Datum:	2022
Hauptverfasser:	Chunadra, А.G., Sereda, К.N., Tarasov, I.K., Makhlai, V.A., Kozhukhovskyi, B.M.
Format:	Artikel
Sprache:	Englisch
Veröffentlicht:	Національний науковий центр «Харківський фізико-технічний інститут» НАН України 2022
Schlagworte:	Low temperature plasma and plasma technologies
Online Zugang:	https://nasplib.isofts.kiev.ua/handle/123456789/195896
Tags:	Tag hinzufügen Keine Tags, Fügen Sie den ersten Tag hinzu!
Назва журналу:	Digital Library of Periodicals of National Academy of Sciences of Ukraine
Zitieren:	Influence of magnetic field configuration and strength on plasma parameters and efficiency of coatings deposition in magnetron sputtering system / А.G. Chunadra, К.N. Sereda, I.K. Tarasov, V.A. Makhlai, B.M. Kozhukhovskyi // Problems of Atomic Science and Technology. — 2022. — № 6. — С. 103-106. — Бібліогр.: 6 назв. — англ.

Institution

Digital Library of Periodicals of National Academy of Sciences of Ukraine

Ähnliche Einträge

Control of ionization processes in magnetron sputtering system by changing magnetic field configuration
von: Chunadra, А.G., et al.
Veröffentlicht: (2021)

Magnetron discharge intensification for effective deposition of coatings from difficult spray metals
von: Chunadra, А.G., et al.
Veröffentlicht: (2020)

Features of high-current pulsed regimes in regimes in magnetron sputtering systems
von: Bizyukov, A.A., et al.
Veröffentlicht: (2005)

Synthesis of thin-film Ta₂O₅ coatings by reactive magnetron sputtering
von: Yakovin, S., et al.
Veröffentlicht: (2016)

Solid ion source based on hollow-cylindrical magnetron sputtering discharge
von: Azarenkov, N.A., et al.
Veröffentlicht: (2003)

The antimicrobial activity of magnetron sputtered Ag doped aluminum oxide coatings in vitro
von: Safonov, V., et al.
Veröffentlicht: (2019)

Method for measuring external and internal parameters of plasma with ungrounded gas discharge electrodes
von: Chunadra, А.G., et al.
Veröffentlicht: (2019)

The flow density of atoms sputtered from a cathode of cylinder magnetron
von: Panchenko, O.A., et al.
Veröffentlicht: (2005)

Vacuum-arc equipment for ion-plasma deposition of coatings
von: Aksenov, I.I., et al.
Veröffentlicht: (2000)

Optical and mass spectra from reactive plasma at magnetron deposition of tantalum oxynitride
von: Dudin, S., et al.
Veröffentlicht: (2021)

Discharge characteristics of combined low energy ion source – magnetron sputtering system
von: Zykov, A., et al.
Veröffentlicht: (2020)

The investigation of the optical spectra in process of magnetron deposition
von: Demchishin, A.V., et al.
Veröffentlicht: (2008)

Oxygen activation effect on reactive magnetron synthesis of alumina coatings
von: Walkowicz, J., et al.
Veröffentlicht: (2007)

Oxygen activation effect on reactive magnetron synthesis of alumina coatings
von: Walkowicz, J., et al.
Veröffentlicht: (2007)

Application of pulse power supply for diamond coatings deposition in glow discharge plasma
von: Koshevoy, K.I., et al.
Veröffentlicht: (2019)

Bone-like coatings deposition by using of modern pulsed ion-plasma technology
von: Zykova, A.V., et al.
Veröffentlicht: (2003)

Using of electron cyclotron resonance discharge in ion beam sputtering systems for space charge compensation
von: Bizyukov, A.A., et al.
Veröffentlicht: (2019)

Plasma characteristics of two-step vacuum-arc discharge and its application for a coatings deposition
von: Timoshenko, A.I., et al.
Veröffentlicht: (2007)

Redistribution of sputtered material in a plane ion-plasma system with an abnormal glow discharge
von: Kuzmichev, A.I., et al.
Veröffentlicht: (2020)

Coating in the arc discharges with plasma flow filtration
von: Gasilin, V. V., et al.
Veröffentlicht: (2006)

The influence of surface parameters of coatings deposited by various vacuum-plasma methods on the cell/material interaction in vitro tests
von: Zykova, A., et al.
Veröffentlicht: (2007)

Plasma devices for ion beam and plasma deposition applications
von: Goncharov, A., et al.
Veröffentlicht: (2005)

TiN coating etching from a surface of the instrument in beam-plasma system
von: Bizyukov, A.A., et al.
Veröffentlicht: (2000)

Characteristics of the plasma created by ECR plasma source for thin films deposition
von: Fedorchenko, V.D., et al.
Veröffentlicht: (2005)

Cylindrical magnetron based on the plasmaoptical principles
von: Dobrovol's'kii, A.M., et al.
Veröffentlicht: (2007)

Magnetically filtered vacuum-arc plasma deposition systems
von: Aksenov, I.I.
Veröffentlicht: (2002)

Application of arc plasma for a deposition of superconducting films
von: Langner, J., et al.
Veröffentlicht: (2002)

Application of pulsed plasma streams for materials alloying and coatings modification
von: Byrka, O.V., et al.
Veröffentlicht: (2002)

Performance of thermal barrier coatings produced by smart plasma processing
von: Kobayashi, Akira
Veröffentlicht: (2006)

Some aspects of electrolytic-plasma processing technology
von: Tarasov, I.K., et al.
Veröffentlicht: (2023)

The formation of the low-sized high density plasma structures in the self-maintained plasma-beam discharge
von: Borisko, V.N., et al.
Veröffentlicht: (2006)

Modification of coating-substrate systems under the action of compression plasma flow
von: Astashynski, V.M., et al.
Veröffentlicht: (2005)

Deposition of refractory metal films with planar plasma ECR source
von: Fedorchenko, V.D., et al.
Veröffentlicht: (2007)

Characteristics of TiN coating deposited by vacuum-arc method on rotating cylindrical sample
von: Kalinichenko, A.I., et al.
Veröffentlicht: (2019)

Structure and properties of the (Cr, Al)N coatings deposited by PIII&D method
von: Vasyliev, V.V., et al.
Veröffentlicht: (2016)

Nanostructured formations and coatings created on the surface of materials exposed to compression plasma flows
von: Astashynski, V.M., et al.
Veröffentlicht: (2005)

Thin niobium superconducting film prepared by modified cylindrical magnetron
von: Langner, J., et al.
Veröffentlicht: (2000)

Plasma deposited diamond-like carbon films for large neural arrays
von: Brown, I.G., et al.
Veröffentlicht: (2005)

Evaporation of micro-droplets in cathode arc plasma coating under formed electron beam
von: Goncharov, A.A., et al.
Veröffentlicht: (2022)

Application of coatings on inner surfaces of metallic and dielectric pipes with the use of HF -plasma source
von: Gasilin, V.V., et al.
Veröffentlicht: (2005)