Morphology and sputtering of tungsten nitrides coatings exposed to deuterium plasma
Processes of sputtering, surface modification and change in the stoichiometric composition of W and WN coatings deposited on stainless steel by cathodic arc evaporation were studied under the influence of low-energy (500 eV/D) deuterium plasma with fluence of (1…4.5)·10²⁴ D₂⁺/m² at room temperature....
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Національний науковий центр «Харківський фізико-технічний інститут» НАН України
2023
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| Cite this: | Morphology and sputtering of tungsten nitrides coatings exposed to deuterium plasma / G.D. Tolstolutskaya, A.S. Kuprin, A.V. Nikitin, R.L. Vasilenko // Problems of Atomic Science and Technology. — 2023. — № 1. — С. 57-62. — Бібліогр.: 25 назв. — англ. |
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Digital Library of Periodicals of National Academy of Sciences of Ukraine| _version_ | 1859481673419194368 |
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| author | Tolstolutskaya, G.D. Kuprin, A.S. Nikitin, A.V. Vasilenko, R.L. |
| author_facet | Tolstolutskaya, G.D. Kuprin, A.S. Nikitin, A.V. Vasilenko, R.L. |
| citation_txt | Morphology and sputtering of tungsten nitrides coatings exposed to deuterium plasma / G.D. Tolstolutskaya, A.S. Kuprin, A.V. Nikitin, R.L. Vasilenko // Problems of Atomic Science and Technology. — 2023. — № 1. — С. 57-62. — Бібліогр.: 25 назв. — англ. |
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| description | Processes of sputtering, surface modification and change in the stoichiometric composition of W and WN coatings deposited on stainless steel by cathodic arc evaporation were studied under the influence of low-energy (500 eV/D) deuterium plasma with fluence of (1…4.5)·10²⁴ D₂⁺/m² at room temperature. The composition of the WN coating changes under the influence of deuterium plasma, its enrichment with tungsten up to 100% is observed. Results of erosion studies indicated that the sputtering yields for coatings WN and W are ∼2.4·10⁻² at./ion and to be systematically higher than the published data which were measured for bulk materials.
Досліджено вплив низькоенергетичної (500 еВ/D) дейтерієвої плазми з флюенсом (1…4,5)·10²⁴ D₂⁺/m² за кімнатної температури на процеси розпилення, модифікацію поверхні та зміну стехіометричного складу покриттів W і WN, осаджених на нержавіючу сталь катодним дуговим випаровуванням. Опромінення дейтерієвою плазмою змінює склад покриття WN, спостерігається його збагачення вольфрамом до 100%. Результати досліджень ерозії показали, що коефіцієнти розпилення для покриттів WN і W становлять ∼2.4·10⁻² ат./іон і систематично перевищують опубліковані дані для об’ємних матеріалів.
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ISSN 1562-6016. Problems of Atomic Science and Technology. 2023. №1(143).
Series: Plasma Physics (29), p. 57-62. 57
https://doi.org/10.46813/2023-143-057
MORPHOLOGY AND SPUTTERING OF TUNGSTEN NITRIDES
COATINGS EXPOSED TO DEUTERIUM PLASMA
G.D. Tolstolutskaya, A.S. Kuprin, A.V. Nikitin, R.L. Vasilenko
National Science Center “Kharkov Institute of Physics and Technology”,
Kharkiv, Ukraine
E-mail: g.d.t@kipt.kharkov.ua
Processes of sputtering, surface modification and change in the stoichiometric composition of W and WN
coatings deposited on stainless steel by cathodic arc evaporation were studied under the influence of low-energy
(500 eV/D) deuterium plasma with fluence of (1…4.5)1024 D2
+/m2 at room temperature. The composition of the
WN coating changes under the influence of deuterium plasma, its enrichment with tungsten up to 100 % is observed.
Results of erosion studies indicated that the sputtering yields for coatings WN and W are ~2.410-2 at./ion and to be
systematically higher than the published data which were measured for bulk materials.
PACS: 52.40Hf, 28.52Fa, 68.49Sf, 79.20Rf
INTRODUCTION
Tungsten has become the main choice for current
and future nuclear devices, specially at the divertor,
thanks to its favorable thermo-mechanical properties,
low sputtering erosion yield, high thermal conductivity
and no chemical reaction with hydrogen [1].
Currently, it is believed that because of the high cost
of tungsten, the difficulties in machining due to its
hardness and brittleness, the unwieldiness and large
weight of the structure, it is not economically
reasonable to make the first wall of a fusion reactor
entirely of tungsten. Tungsten coatings on a stainless-
steel substrate can be considered as a good solution in
terms of economic and the protection of structural
material from interaction with the plasma [2].
Nevertheless, for both solid tungsten and tungsten
coatings there are some drawbacks that need to be
solved. One of the major problems is the eroded
tungsten atoms can enter the plasma core if not
sufficiently screened out. An efficient method to reduce
tungsten erosion at the divertor consist on the seeding of
gas impurities to decrease the temperature of the plasma
at this region by atomic radiation.
Different noble gases like Ne and Ar have been
tested but the best results have been obtained with N2
seeding in ASDEX [3] and JET [4] tokamaks. In both
devices an overall enhancement of the plasma
confinement was also detected. This improvement is
caused by the strongly reduced power load to divertor
tiles thanks to the low plasma temperature, but also
because of the total suppression of W influx into the
plasma [5]. This last effect has been ascribed to the
development of tungsten nitrides films at the surface of
the W tiles.
Recent experiments have shown that tungsten nitride
formed on the W surface due to nitrogen gas seeding [6-
8] can prevent H diffusion to the first wall. In [8] it was
shown that after exposure of tungsten nitride films to H
isotopes at 300 K, H isotopes were detected only in the
implantation zone and did not diffuse throughout the
material.
However, pre-irradiation with nitrogen increased the
retention of D on the near-surface layer. Deuterium
diffusion out of the sample was shown to decrease and,
consequently, D diffusion inward was increased. It is
assumed that these phenomena are related to the barrier
effect of the N-containing surface layer. This
contradictory situation raises a fundamental interest in
studying the mechanisms of interaction of H with
tungsten nitrides.
There are two ways to obtain tungsten nitrides: by
plasma nitriding of tungsten or by direct deposition.
Nitriding: by ion bombardment the nitrogen atoms
are implanted into the tungsten surface at a depth
depending on the bombarding energy [1, 9, 10]. This is
the best method to simulate the tungsten nitrides
formation in a nuclear fusion device. At the low energy
of the ions at the divertor (10...20 eV) the nitrogen
cannot be implanted, but seems to be enough to react
with surface tungsten atoms.
Direct deposition: tungsten nitrides films are usually
grown by gas methods like Chemical Vapor Deposition
(CVD) and Reactive Magnetron Sputtering (RMS) [11-
13]. The main advantage of RMS is that it uses only
simple gases as nitrogen and argon with solid W acting
as cathode, not the dangerous gases usually employed in
CVD. However, RMS is very difficult to optimize as the
reactive gas nitrogen in this case can poison the cathode.
This effect is observed by a decrease of the growth rate
and composition of the film when the quantity of the
reactive gas is increased over a certain threshold, which
could even stop the deposition.
The most fully realized technology is the physical
vapor deposition (PVD) technology [14], which creates
a dense coating due to the optimization of the deposition
process, and the macroparticle filtration deposition
system avoids the appearance of inclusions and
associated voids [15].
The goal of this work is to experimentally determine
the surface morphology changes, sputtering yields of
WN coatings that are deposited by the cathodic arc
evaporation on stainless steel 410 AISI substrates and
mailto:g.d.t@kipt.kharkov.ua
58 ISSN 1562-6016. Problems of Atomic Science and Technology. 2023. №1(143)
exposed to low-energy deuterium plasma with fluence
(1…4.5)1024 D2
+/m2.
1. MATERIALS AND METHODS
A set of tungsten coatings was formed using an
physical vapor deposition (PVD) method in a “Bulat-6”
system equipped with a W (99.9 %) cathode of 60 mm
diameter [16]. WN coatings deposited on the substrates
of stainless steel 410 AISI. Chemical composition of
martensitic AISI 410S steel in weight % according to
ASTM A240: Fe up to 85; Cr 11,5-13,5; Ni up to 0.6;
Mn up to 1; Si to 1; C up to 0.08; P up to 0.04; S up to
0.03. The substrate-cathode distance was about 250 mm.
A vacuum-arc plasma source with magnetic
stabilization of a cathode spot was used. The coatings
application parameters are described in [17].
The WN coatings have been irradiated with deuterium
ions using glow gas-discharge plasma at 1000 V. The
design and principle of operation of the gaseous plasma
source used for irradiation of the samples is described in
[18].
The erosion yield was primarily evaluated by a mass -
loss technique. Before and after plasma exposure, the
mass of each target was measured by a microbalance
system. The erosion rate was calculated from the mass
losses and the total deuterium fluence.
Investigations of surface microstructure were
performed using scanning electron microscope JEOL
JSM-7001F before and after irradiation. Chemical
composition of the coatings was determined by energy
dispersive X-ray spectroscopy – EDS.
2. RESULTS AND DISCUSSION
Fig. 1 shows a view of initial WN coating deposited
by CAE on the substrate of stainless steel 410 AISI. The
coating thickness is about 4 µm. The surface of the
deposited WN coatings is composed of grain-like
protrusions. The large island-like grains are further
subdivided into cellular subunits (see Fig. 1,a).
WN-coating has near stoichiometric concentration of
N ~ 50 at.% according to EDS analysis (see Fig. 1,b)
and a microstructure with elements of a cellular subunits
(see Fig. 1,c). As reported in [19], it is the tops of the
columnar grains that cause island-like protrusions. The
structure of WN-coating is dense and without pores (see
Fig. 1,с). The dense structure into those coatings may be
explained by sufficiently high energy of deposited
tungsten ions and by the high degree of plasma
ionization relatively to the flow of evaporated material
which is characteristic of cathodic arc evaporation
method [14].
Only one phase was revealed in the WN coating −
hexagonal tungsten nitride WN-δ (hexagonal system,
space group № 187, structural type WC) with crystallite
size ~ 29.8 nm and microstrain ~ 7.81∙10-3 [17].
Fig. 2 shows a SEM image of plasma-induced
surface changes in a WN coating bombarded at 300 K
with 1 keV D2
+ (0.5 keV/D) to (2...4.5)·1024 D2
+/m2.
The evolution of the surface of δ -WN coating due to
exposure to a deuterium plasma as shown in Figs. 2,a,b
is caused by the sputtering process of cellular structure
at an intermediate dose of irradiation up to obtaining
needle like morphology at a dose 4.5·1024 D2
+/m2.
Fig. 3,a shows a view of initial WN coatings
deposited by CAE on the substrates of stainless steel
410 AISI with a tungsten intermediate layer. SEM
fracture cross-section images of this coating is shown in
Fig. 3,b. WN coatings have a dense structure and
without pores. The coating thickness is about 5 µm. The
evolution of the surface of WN coating due to exposure
to a deuterium plasma 1·1024 D2
+/m2 are caused by the
sputtering process (see Fig. 3,c).
a
b
c
Fig. 1. SEM images of initial surface of WN coating
CAE deposited on the substrate of stainless steel
410 AISI (а), EDS X-ray spectrums of surface (b) and
SEM fracture cross-section images of WN coating (c)
X-ray EDS spectra of the surface were measured for
the initial and plasma-irradiated coatings. Insignificant
amounts of impurities (most often on the surface itself)
were detected in these measurements. Nevertheless,
these impurities were not taken into account in further
determining the W:N ratio. For the initial samples the
ratio close to stoichiometric about 50 + 50 % is
observed. After irradiation this ratio changes (Table 1).
WN
Substrate
1 µm
ISSN 1562-6016. Problems of Atomic Science and Technology. 2023. №1(143) 59
The change of the stoichiometric composition of the
coating deposited on a stainless steel substrate is
virtually independent of the deuterium fluence. An
acceleration of the process of changing the
stoichiometry of the coating towards its enrichment with
tungsten is observed in the case of coating using an
intermediate layer of tungsten.
Thus, the sample exposed to D plasma at 300 K
shows a significantly higher W surface concentration
than the unexposed sample. This is agreed with the
anticipated removal of N from the surface due to D
implantation. In ref. [20] based on the available data it
was concluded that up to 80 % of the retained D is
released as deuterated ammonia or water. These two
species cannot be surely distinguished, but it is assumed
that ammonia isotopologues dominate. The release of
ammonia occurs together with the release of molecular
hydrogen.
a
b
Fig. 2. SEM images of morphology of WN coatings after
irradiation at 300 K with 1 keV D2
+ to 2·1024D2
+/m2(a)
and to 4.5·1024 D2
+/m2 (b)
Table 1
W and N fractions before and after exposure to D
plasma
Substrate/coating
Dose,
1024 D2/m2
Element
N, at.% W, at.%
SS/WNinitial – ~ 50 ~ 50
SS/WN 1 40 60
SS/WN 4 39 61
SS/W/WNinitial – ~ 49 ~ 49
SS/W/WN 2 25 75
SS/W/WN 3.8 ~ 0 ~ 100
Table 2 shows the results for the sputtering yields
(Y) of W and WN coatings The sputtering yield was
determined from the weight loss and the total deuterium
fluence for accordingly 500 eV/D as dominant
impinging energy. It should be noted that in this case
the number of deuterium particles that fell on the entire
sample, not traditionally on the area m-2, was taken into
account.
As seen in Table 2, values of the experimentally
measured sputtering yield of the tungsten coatings
SS/WN exposed to the D plasma are 1.7 times more
than SS/W/WN. For coatings W/WN, there is an almost
proportional rise in the sputtering yields with increasing
irradiation dose. It should be noted that the W coatings
have the sputtering yields which is almost the same as
for the coatings WN. However, this value was obtained
at a irradiation dose almost four times lower.
a
b
c
Fig. 3. SEM image of initial surface of WN coatings
CAE deposited on the substrate of stainless steel 410
AISI with a tungsten intermediate layer (а), SEM
fracture cross-section images of WN coatings (b) and
morphology of WN coatings after irradiation at 300 K
with 1 keV D2
+ to 2·1024 D2
+/m2 (c)
W
WN
Substrat
e
60 ISSN 1562-6016. Problems of Atomic Science and Technology. 2023. №1(143)
It is possible that this peculiarity in the sputtering
yields of the tungsten coating is related to its structure,
which differs significantly from the structure of WN
coatings. Fig. 4 shows an SEM image the surface
microstructure of the W coatings in the initial state and
after exposed to plasma. Initial W coatings exhibit
surfaces of densely packed “nanoridges” or overlapping
tiles (see Fig. 4,a). Previously reported in [21] that these
“nanoridges” were observed on the -W phase film
surfaces irrespective of the film thickness. The
overlapping tiles preferentially sputtered at this dose
(see Fig. 4,b).
Table 2
Sputtering yields of coatings for deuterium (500 eV)
Substrate/coating
Dose,
1023 D2/sample
Y,
10-2at./ion
SS/WN 5.5 2.4
SS/WN 6.5 2.4
SS/W/WN 5.6 1.4
SS/W/WN 8.6 2
SS/W 1.5 2.4
a
b
Fig. 4. SEM images of morphology of W coatings in
initial state (a) and after irradiation at 300 K with 1 keV
D2
+ to 1.5·1023 D2
+on surface of sample (b)
A comparison of the surface morphologies of the
coatings in Figs. 1, 3, 4 shows that the surface roughness is
greatest in the case of the tungsten coating. In [22], it is
noted that under the current experimental parameters, with
the increase of the initial surface roughness, the sputtering
morphology and the surface roughness of CLF-1 steel
changed to different degrees after erosion of D, which
eventually led to the increase of the sputtering rate. The
effect of incident D-plasma angle on the sputtering and
redeposition behaviour of the material may explain this
phenomenon. Besides, both the specific surface area of the
contact plasma and the erosion behaviour of the material
by D-plasma increased with the original surface roughness.
Figs. 5,a,b shows respectively SEM top view and
cross-section micrographs of a W/WN coatings. There are
few agglomerations pyramid-like in the surface possibly
increase the surface roughness. The pyramid is a drop of
cathode material with tungsten nitride deposited on it (see
Fig. 5,c). Fig. 5,d shows the beginning of pyramid
sputtering and crater formation after it falling out at
fracture.
Sputtering yields of RAFM-related materials, in
particular W, by energetic D ion bombardment were
measured by means of the thin film technique under well-
defined laboratory conditions 23. The bombardment
energy ranged from 60 to 2000 eV/D, which is important
in modeling the interaction of ions with material in fusion
devices. Comparison with published data for W shows that
the here presented data agree with the published data
within the experimental un-certainties; however, the yields
for sputter-deposited films seem to be systematically
higher than the published data which were measured for
bulk materials. The authors were unable to determine
whether this is a real effect or an experimental error.
In ref. [24] commented, interest in tungsten nitrides is
due to its lower tungsten sputtering rate compared to pure
tungsten in a nuclear fusion device. Tungsten is sputtered
mainly by impurities as the sputtering threshold for
hydrogen isotopes and helium ions is more than 100 eV.
This is especially evident at the strike points in the divertor
region, where energies lower than 100 eV and fluxes in the
order of 1024 ion/m2s are expected. The content of some
intrinsic impurities N, O and C is reduced by the use of
getters, as beryllium in ITER. But the bombardment of
other wall materials, as the getters themselves, is
unavoidable, and could lead to an excessive sputtering,
especially when the so-called self-sputtering with tungsten
atoms occurs. sputtering: A decrease in the tungsten atom
physical sputtering is expected due to the accumulation of
nitrogen at the surface, its preferential sputtering, and the
similar bonding energy between NW and WW.
Chemical sputtering of nitrogen by hydrogen is
confirmed by the production of ammonia, not only during
N2 seeded pulses but also during subsequent non-seeded
ones [11]. In this way the equilibrium between wall
nitrogen implantation and erosion by hydrogen in
conditions similar to those of ITER is expected to occur in
the initial 0.1…1 s of the discharge [9].
Few works have been devoted to the study of nitrogen
erosion from tungsten nitrides by hydrogen plasma [9]. N
was implanted at 2.5 keV, and the saturation was reached
at 2.3·1020 N/m2 with an implantation thickness of 10 nm.
That film presented a decrease of sputtering yield with
5 keV Ar close to the estimated by SDTRIM.SP.
Oppositely, the sputtering yield with deuterium at 2.5 keV
was half than predicted: around 0.022...0.044. Although
the code correctly models dynamic retention, the value of
the experimentally measured erosion was even smaller
than the code predicted. SDTRIM.SP was also used to
estimate the W sputtering decrease with different % N in a
D plasma. For pure N plasma a decrease of 30 % of W
erosion is observed. Therefore, experiments at fluence, and
ISSN 1562-6016. Problems of Atomic Science and Technology. 2023. №1(143) 61
if possible, fluxes equivalent to the ones expected in ITER
are highly desirable, as the material degradation changes
drastically with both parameters.
a
b
c
d
Fig. 5. SEM fracture cross-section images of W/WN
coatings (а, b), EDS X-ray spectrums of surface
pyramid-like agglomeration (c) and morphology of WN
coatings after irradiation at 300 K with 1 keV D2
+
to 1·1024 D2
+/m2 (d)
The microstructures, the behavior of H in W2N1,
W1N1 and W2N3 during dissolution, diffusion and
retention have been systematically studied by theoretical
calculations [25]. It was found that the H atom prefers
to dissolve in tungsten nitride compounds than in the W
crystal under the same conditions. Tungsten nitride
compounds play the role of a holding element due to the
formation of strong N-H bonds after the dissolution of
the H atoms in the compounds. Moreover, the H atoms
do not form H2 molecules at vacant sites. It has been
demonstrated that tungsten nitride films, which can
form on top of the first wall W due to nitrogen gas
seeding or can be deposited on top of the first wall W
experimentally, significantly reduce hydrogen retention
in the first wall W.
CONCLUSIONS
Processes of sputtering, surface modification and
change of the stoichiometric composition of W and WN
coatings deposited on stainless steel by cathodic arc
evaporation were studied under the influence of low-
energy (500 eV) deuterium plasma with fluence of
(1…4.5)1024 D2
+/m2 at room temperature. All deposited
coatings having dense microstructure without pores.
Initial WN-coating has near stoichiometric
concentration of N ~ 50 at. % and a microstructure with
columnar structure elements.
The stoichiometric ratio of W:N is close to about
50 : 50 % for the initial coating. The change of the
stoichiometric composition of the WN coatings on SS is
almost (~ 40 at.% N : 60 at.% W)independent on the
deuterium fluence in rage of (1…4)1024 D2
+/m2. A
tungsten enrichment up to 100 at.% is observed for
SS/W/WN coatings.
The experimentally measured sputtering yield of the
tungsten coatings SS/WN exposed to the D plasma are
1.7 times more than for SS/W/WN and is 2.4∙10-2 at./ion
and 1.4·10-2 at./ion, respectively. For coatings W/WN,
there is an almost proportional rise of the sputtering
yields with an increasing of fluence. A sputtering yield
of W coatings is higher compared to WN and bulk
tungsten coatings, which may be due to an increase of
the initial surface roughness of W coatings.
ACKNOWLEDGEMENTS
The work was financially supported by the National
Academy of Science of Ukraine and The European
Federation of Academies of Sciences and Humanities
(ALLEA), within the framework the “European Fund
for Displaced Scientists”, Grant EFDS-FL2-04.
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Article received 10.01.2023
МОРФОЛОГІЯ ТА РОЗПИЛЕННЯ ПОКРИТТІВ З НІТРИДУ ВОЛЬФРАМУ
ПІД ВПЛИВОМ ДЕЙТЕРІЄВОЇ ПЛАЗМИ
Г.Д. Толстолуцька, О.С. Купрін, А.В. Нікітін, Р.Л. Василенко
Досліджено вплив низькоенергетичної (500 еВ/D) дейтерієвої плазми з флюенсом (1...4,5)·1024 D2
+/м2 за
кімнатної температури на процеси розпилення, модифікацію поверхні та зміну стехіометричного складу
покриттів W і WN, осаджених на нержавіючу сталь катодним дуговим випаровуванням. Опромінення
дейтерієвою плазмою змінює склад покриття WN, спостерігається його збагачення вольфрамом до 100 %.
Результати досліджень ерозії показали, що коефіцієнти розпилення для покриттів WN і W становлять
~ 2,4·10-2 ат./іон і систематично перевищують опубліковані дані для об'ємних матеріалів.
https://vant.kipt.kharkov.ua/CONTENTS/CONTENTS_2019_4.html
https://vant.kipt.kharkov.ua/CONTENTS/CONTENTS_2019_4.html
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| id | nasplib_isofts_kiev_ua-123456789-196049 |
| institution | Digital Library of Periodicals of National Academy of Sciences of Ukraine |
| issn | 1562-6016 |
| language | English |
| last_indexed | 2025-11-24T15:07:09Z |
| publishDate | 2023 |
| publisher | Національний науковий центр «Харківський фізико-технічний інститут» НАН України |
| record_format | dspace |
| spelling | Tolstolutskaya, G.D. Kuprin, A.S. Nikitin, A.V. Vasilenko, R.L. 2023-12-09T10:11:15Z 2023-12-09T10:11:15Z 2023 Morphology and sputtering of tungsten nitrides coatings exposed to deuterium plasma / G.D. Tolstolutskaya, A.S. Kuprin, A.V. Nikitin, R.L. Vasilenko // Problems of Atomic Science and Technology. — 2023. — № 1. — С. 57-62. — Бібліогр.: 25 назв. — англ. 1562-6016 PACS: 52.40Hf, 28.52Fa, 68.49Sf, 79.20Rf DOI: https://doi.org/10.46813/2023-143-057 https://nasplib.isofts.kiev.ua/handle/123456789/196049 Processes of sputtering, surface modification and change in the stoichiometric composition of W and WN coatings deposited on stainless steel by cathodic arc evaporation were studied under the influence of low-energy (500 eV/D) deuterium plasma with fluence of (1…4.5)·10²⁴ D₂⁺/m² at room temperature. The composition of the WN coating changes under the influence of deuterium plasma, its enrichment with tungsten up to 100% is observed. Results of erosion studies indicated that the sputtering yields for coatings WN and W are ∼2.4·10⁻² at./ion and to be systematically higher than the published data which were measured for bulk materials. Досліджено вплив низькоенергетичної (500 еВ/D) дейтерієвої плазми з флюенсом (1…4,5)·10²⁴ D₂⁺/m² за кімнатної температури на процеси розпилення, модифікацію поверхні та зміну стехіометричного складу покриттів W і WN, осаджених на нержавіючу сталь катодним дуговим випаровуванням. Опромінення дейтерієвою плазмою змінює склад покриття WN, спостерігається його збагачення вольфрамом до 100%. Результати досліджень ерозії показали, що коефіцієнти розпилення для покриттів WN і W становлять ∼2.4·10⁻² ат./іон і систематично перевищують опубліковані дані для об’ємних матеріалів. The work was financially supported by the National Academy of Science of Ukraine and The European Federation of Academies of Sciences and Humanities (ALLEA), within the framework the “European Fund for Displaced Scientists”, Grant EFDS-FL2-04. en Національний науковий центр «Харківський фізико-технічний інститут» НАН України Problems of Atomic Science and Technology Plasma dynamics and plasma-wall interaction Morphology and sputtering of tungsten nitrides coatings exposed to deuterium plasma Морфологія та розпилення покриттів з нітриду вольфраму під впливом дейтерієвої плазми Article published earlier |
| spellingShingle | Morphology and sputtering of tungsten nitrides coatings exposed to deuterium plasma Tolstolutskaya, G.D. Kuprin, A.S. Nikitin, A.V. Vasilenko, R.L. Plasma dynamics and plasma-wall interaction |
| title | Morphology and sputtering of tungsten nitrides coatings exposed to deuterium plasma |
| title_alt | Морфологія та розпилення покриттів з нітриду вольфраму під впливом дейтерієвої плазми |
| title_full | Morphology and sputtering of tungsten nitrides coatings exposed to deuterium plasma |
| title_fullStr | Morphology and sputtering of tungsten nitrides coatings exposed to deuterium plasma |
| title_full_unstemmed | Morphology and sputtering of tungsten nitrides coatings exposed to deuterium plasma |
| title_short | Morphology and sputtering of tungsten nitrides coatings exposed to deuterium plasma |
| title_sort | morphology and sputtering of tungsten nitrides coatings exposed to deuterium plasma |
| topic | Plasma dynamics and plasma-wall interaction |
| topic_facet | Plasma dynamics and plasma-wall interaction |
| url | https://nasplib.isofts.kiev.ua/handle/123456789/196049 |
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