Simulation of capacitively coupled RF discharge in argon

• Veröffentlicht in: Problems of Atomic Science and Technology
• Datum: 2023
• Hauptverfasser: Lisovskiy, V., Dudin, S., Shakhnazarian, A., Platonov, P., Yegorenkov, V.
• Format: Artikel
• Sprache: Englisch
• Veröffentlicht: Національний науковий центр «Харківський фізико-технічний інститут» НАН України 2023
• Schlagworte: Gas discharge, plasma-beam discharge and their applications
• Online Zugang: https://nasplib.isofts.kiev.ua/handle/123456789/196190
• Назва журналу: Digital Library of Periodicals of National Academy of Sciences of Ukraine
• Zitieren: Simulation of capacitively coupled RF discharge in argon / V. Lisovskiy, S. Dudin, A. Shakhnazarian, P. Platonov, V. Yegorenkov // Problems of Atomic Science and Technology. — 2023. — № 4. — С. 129-133. — Бібліогр.: 21 назв. — англ.

In this work, the axial profiles of the density of electrons and positive ions, the mean electron energy, the electric field strength, and the potential were obtained, both on average over the period and in dynamics. It was shown that argon discharges are dominated by ionization by electrons that ga...