Enhancing sensitivity of SPR sensors using nanostructured Au chips coated with functional plasma polymer nanofilms
The sensitivity of surface plasmon resonance (SPR) sensors operating in the Kretschmann configuration was investigated using Au SPR chips with a nano-grating surface functionalized via deposition of a-C:H:O plasma polymer films. The surface of the chips was nanopatterned in order to improve the sens...
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| Опубліковано в: : | Semiconductor Physics Quantum Electronics & Optoelectronics |
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Інститут фізики напівпровідників імені В.Є. Лашкарьова НАН України
2017
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| Цитувати: | Enhancing sensitivity of SPR sensors using nanostructured Au chips coated with functional plasma polymer nanofilms / I.Z. Indutnyi, Yu.V. Ushenin, D. Hegemann, M. Vandenbossche, V.I. Myn’ko, P.E. Shepeliavyi, M.V. Lukaniuk, P.M. Lytvyn, R.V. Khrystosenko // Semiconductor Physics Quantum Electronics & Optoelectronics. — 2017. — Т. 20, № 3. — С. 362-368. — Бібліогр.: 25 назв. — англ. |
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Digital Library of Periodicals of National Academy of Sciences of Ukraine| _version_ | 1860287781914279936 |
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| author | Indutnyi, I.Z. Ushenin, Yu.V. Hegemann, D. Vandenbossche, M. Myn’ko, V.I. Shepeliavyi, P.E. Lukaniuk, M.V. Lytvyn, P.M. Khrystosenko, R.V. |
| author_facet | Indutnyi, I.Z. Ushenin, Yu.V. Hegemann, D. Vandenbossche, M. Myn’ko, V.I. Shepeliavyi, P.E. Lukaniuk, M.V. Lytvyn, P.M. Khrystosenko, R.V. |
| citation_txt | Enhancing sensitivity of SPR sensors using nanostructured Au chips coated with functional plasma polymer nanofilms / I.Z. Indutnyi, Yu.V. Ushenin, D. Hegemann, M. Vandenbossche, V.I. Myn’ko, P.E. Shepeliavyi, M.V. Lukaniuk, P.M. Lytvyn, R.V. Khrystosenko // Semiconductor Physics Quantum Electronics & Optoelectronics. — 2017. — Т. 20, № 3. — С. 362-368. — Бібліогр.: 25 назв. — англ. |
| collection | DSpace DC |
| container_title | Semiconductor Physics Quantum Electronics & Optoelectronics |
| description | The sensitivity of surface plasmon resonance (SPR) sensors operating in the Kretschmann configuration was investigated using Au SPR chips with a nano-grating surface functionalized via deposition of a-C:H:O plasma polymer films. The surface of the chips was nanopatterned in order to improve the sensitivity of the sensor, as compared with the sensitivity of standard Au chips with a flat (unstructured) surface. It was found that deposition of the plasma polymer nanofilms neither affected the degree of refractometer sensitivity enhancement, nor the width of the operation range of the environment refractive index (n), in which the enhancement was observed. Such functionalization of the chip surface merely resulted in the shift of the operation range position to smaller values of n in comparison to non-coated chips, requiring deposition of stable functional films.
|
| first_indexed | 2026-03-18T21:17:58Z |
| format | Article |
| fulltext |
Semiconductor Physics, Quantum Electronics & Optoelectronics, 2017. V. 20, N 3. P. 362-368.
doi: https://doi.org/10.15407/spqeo20.03.362
© 2017, V. Lashkaryov Institute of Semiconductor Physics, National Academy of Sciences of Ukraine
362
PACS 73.20.Mf, 87.85.fk, 81.16.Nd
Enhancing sensitivity of SPR sensors by using nanostructured
Au chips coated with functional plasma polymer nanofilms
I.Z. Indutnyi1, Yu.V. Ushenin1, D. Hegemann2, M. Vandenbossche2, V.I. Myn’ko1,
P.E. Shepeliavyi1, M.V. Lukaniuk1, P.M. Lytvyn 1, R.V. Khrystosenko1
1V. Lashkaryov Institute of Semiconductor Physics NAS of Ukraine
41, prospect Nauky, 03680 Kyiv, Ukraine
E-mail: indutnyy@isp.kiev.ua
2Empa, Swiss Federal Laboratories for Materials Science and Technology,
Lerchenfeldstrasse 5, 9014 St.Gallen, Switzerland
E-mail: dirk.hegemann@empa.ch
Abstract. The sensitivity of surface plasmon resonance (SPR) sensors operating in the
Kretschmann configuration was investigated using Au SPR chips with a nano-grating
surface functionalized via deposition of a-C:H:O plasma polymer films. The surface of
the chips was nanopatterned in order to improve the sensitivity of the sensor, as
compared with the sensitivity of standard Au chips with a flat (unstructured) surface. It
was found that deposition of the plasma polymer nanofilms neither affected the degree of
refractometer sensitivity enhancement, nor the width of the operation range of the
environment refractive index (n), in which the enhancement was observed. Such
functionalization of the chip surface merely resulted in the shift of the operation range
position to smaller values of n in comparison to non-coated chips requiring deposition of
stable functional films.
Keywords: surface plasmon resonance, biosensor, interference lithography, plasma
polymer nanolayer.
Manuscript received 22.06.17; revised version received 03.08.17; accepted for
publication 06.09.17; published online 09.10.17.
1. Introduction
In recent two decades, surface plasmon resonance (SPR)
sensing devices have found wide use in biosensing
applications due to its advantages of high sensitivity,
label-free, real-time and rapid detection. Their
applications range over a large variety of fields including
molecular recognition, biotechnology, medical
diagnostics, drug screening etc. [1-6]. Most of the SPR
biosensors make use of the standard Kretschmann–
Raether configuration [7] to excite the surface plasmon
wave in thin Au layers deposited on a transparent
substrate (biosensor chip), with studied macromolecules
immobilized on the Au surface. Even though SPR
biosensors are more sensitive than other label-free
devices, they are still unable to achieve the direct
detection of small molecular species (a few hundreds of
Daltons). Consequently, various proposals have been
developed to enhance the sensitivity or resolution of
biosensors [8, 9].
Alleyne et al. [10] showed theoretically that by
formation of a grating at the surface of the SPR sensor
chip, used in the Kretschmann–Raether configuration,
the sensitivity can be improved by a factor of up to six as
compared with the sensitivity of the conventional SPR
sensor with a flat metallic layer. In previous works, we
have experimentally demonstrated the possibility to
increase the sensitivity of such SPR sensors through
Semiconductor Physics, Quantum Electronics & Optoelectronics, 2017. V. 20, N 3. P. 362-368.
doi: https://doi.org/10.15407/spqeo20.03.362
© 2017, V. Lashkaryov Institute of Semiconductor Physics, National Academy of Sciences of Ukraine
363
formation of a periodic surface relief on the Au chip
[11, 12].
Another direction for improving the performance of
SPR sensors is functionalization of the Au surface for
immobilization of biorecognition elements on the
sensing film. The most widely used approaches include
formation of self-assembled monolayers (SAMs) of
alkanethiols and disulfides, or polyethylenimine (PEI)
[13, 14]. However, these wet chemical treatments suffer
from low layer growth rate and poor stability at
enhanced temperature and UV irradiation [15].
Beside different wet-chemical methods for Au
surface functionalization, plasma enhanced chemical
vapor deposition offers an attractive alternative as a
versatile, dry and eco-friendly technology supporting
also immunosensing (detection of the reaction between
an antibody and antigen) with small concentrations [16].
One of the most suitable candidates to substitute SAMs
for biosensors surface modification is plasma deposition
of ultrathin functional polymer films (thickness of
5…20 nm) [17, 18]. On the one hand, such thin layers
should not disturb the SPR formation, and on the other
hand, they should provide a substantial number of –
COOH, –NH2, anhydride or other reactive groups.
Functional plasma polymer films, mainly comprising
oxygen- or nitrogen-containing groups, are of increasing
importance for biomedical applications, but also as
adhesion-promoting layers [19-21]. These methods have
already been successfully applied for deposition of
amine-rich thin films on the surface of the gold electrode
for quartz crystal microbalance biosensors [22, 23]. The
response of the immunosensor functionalized via the
cyclopropylamine pulsed plasma polymerization was
reported to show at least 2 times better performance as
compared to the standard sensor employing SAM as the
intermediate layer.
In this work, both approaches were combined to
investigate the sensitivity enhancement of SPR sensors
operating in the Kretschmann–Raether configuration,
based on Au chips with a nano-grating surface
additionally coated by ultrathin a-C:H:O plasma polymer
films. The optical response of the SPR refractometer
depending on the grating relief and the thickness of
functional plasma polymer layer were studied to show
applicability of this approach using stable plasma
coatings.
2. Methods
Experimental SPR chips were prepared by thermal
evaporation in vacuum at the residual pressure 2⋅10−3 Pa
and subsequent deposition of an adhesive Cr layer of
3 nm in thickness, a metal (Au) layer with the thickness
40 to 50 nm, and a chalcogenide glass layer
(As40S40Se20) with the thickness close to 100 nm onto the
substrate. For this purpose, polished 20×20×1 mm plates
of glass F1 (refractive index n = 1.615) were used.
During film deposition, the thickness was monitored
using the quartz thickness meter KIT-1. After
deposition, the total thickness of the film structure was
measured using MII-4 microinterferometer.
For nanostructuring the gold films, we used
interference (interferometric) lithography (IL) based on
vacuum chalcogenide photoresist. This technology is
described in more detail in previous works [11, 12]. The
periodic structure (grating) was formed only on one half
of the chip, whereas the other half was covered with a
flat (non-structured) gold film.
A capacitively coupled, symmetric plasma reactor
(Empa, Switzerland) was used for deposition of
functional plasma polymer layers onto both areas
(structured and flat) of the Au-coated chips. The plasma
reactor configuration based on a cylindrical chamber
(inner diameter of 30 cm) with plane-parallel electrodes
separated by a glass ring (height of 5 cm). The upper
(grounded) electrode contained the gas showerhead with
several gas inlets spread over the entire electrode, while
the chamber was pumped through the lower (grid)
electrode coupled to the RF generator. To ensure
deposition of stable plasma polymer films a gaseous
mixture of CO2 and C2H4 was selected at gas flow rates
of 8 and 4 sccm, respectively (gas ratio 2:1), the
operation gas pressure of 10 Pa, and a power input of
70 W. Functional plasma polymer nanofilms with the
thickness of nominally 5 and 10 nm were deposited onto
the Au SPR chips. These coatings were already
characterized in a previous study [17], where a
deposition rate of 6 nm⋅min−1, a film density of
1.5 g⋅cm−3 and a [O]/[C] ratio of 21% were determined.
To increase the surface reactivity, the terminal O-rich
layer was deposited by increasing the CO2/C2H4 ratio
towards the end of the plasma process without
weakening the film structure [24]. Thus, the films
comprise COOH functional groups at the surface (of the
order of 1 at.%).
The prepared samples were investigated using the
two-channel SPR refractometer Plasmon-71 (V.Ye.
Lashkaryov Institute of Semiconductor Physics NAS of
Ukraine) with the operation wavelength 850 nm. The
experiment was carried out in the Kretschmann–Raether
configuration. For comparative studies of the sensitivity
of the nanopatterned and standard sensor chips, we used
solutions of glycerol (refractive index n = 1.474 at
20 °C) in water (n = 1.333 at 20 °C). The solution was
introduced into the two-channel flow cuvette that was
located above the two-channel chip in a way to allow the
contact of the investigated liquid with the Au film. Thus,
one channel of the device was responsible for the
reference Au film with flat surface, while the second
channel recorded the nanostructured film (with the
surface relief in the form of the grating). For
determination of the surface patterns of the etched
periodic structure and their dimensions, a Dimension
3000 Scanning Probe Microscope (Digital Instruments
Inc., Tonawanda, NY, USA) was used. The spatial
frequency of the gratings was determined using the
Semiconductor Physics, Quantum Electronics & Optoelectronics, 2017. V. 20, N 3. P. 362-368.
doi: https://doi.org/10.15407/spqeo20.03.362
© 2017, V. Lashkaryov Institute of Semiconductor Physics, National Academy of Sciences of Ukraine
364
optical stand based on the goniometer G5M with a
measurement accuracy of ±5 line/mm.
3. Results and discussion
Theoretical modeling in [10] was carried out for a
sinusoidal surface relief grating with a small depth of the
relief. The conditions for enhancing the nanopatterned
biosensor sensitivity as compared to a flat chip surface
are satisfied when the period of the grating corresponds
to the conditions for Bragg reflection of plasmons.
For the Au–water interface and excitation
wavelength 850 nm, the Bragg resonance condition
corresponds to a grating period of about 309 nm (spatial
frequency, ν = 3240 mm−1) [12]. If the refractive index
of the medium in contact with gold is larger, the
resonance condition is satisfied at smaller values of the
grating period. In particular, for glycerol, the Bragg
resonance corresponds to a period of 277 nm (ν =
3610 mm−1). Based on those estimations [12],
interference lithography (IL) was used to fabricate Au
chips with the spatial frequency of a periodic nanorelief
falling inside this range.
As an example, Fig. 1a shows the AFM image of
Au grating formed by IL on the gold layer with a
thickness close to 45 nm by wet etching through
chalcogenide photoresist resistive mask. The period of
this grating is 296.6±0.5 nm (spatial frequency ν =
3372 mm−1). Fig. 1b shows the same sample but coated
with the nominally 10 nm thick functional plasma
polymer layer. The average depth of the grating relief
reached 21±2 nm after preparation (Fig. 1a) and
19±2 nm after plasma film deposition (Fig. 1b). The
functional plasma polymer nanofilm, induced in this
way, has only a minimal distortion of the grating relief.
The SPR refractometer Plasmon-71 allows to plot
the angular dependences of the internal reflection
intensity, R(θ), for a gold film to be measured and the
position of the R(θ) minimum to be determined. The
latter corresponds to the excitation of surface plasmons
at the Au film/investigated liquid interface. The position
of R(θ) minimum was found to be very sensitive to
variations in n of the medium near the Au film surface,
which enabled to record small changes of n. It was
shown in the previous paper [12] that formation of the
periodic grating on the surface of the gold chip changed
the shape of reflection curve near the Bragg resonance in
comparison with the same measurements using the
standard Au chip. This change is consistent with the
results of theoretical modeling [10]. The increase of n
resulted in a shift of the position of reflectance
minimum, Δθmin, toward larger angles. For
nanostructured chips, this shift is higher in the same
range of Δn, as compared to that of standard chips
having flat surface. The sensitivity of the method is
characterized by the ratio of Δθmin to Δn. Hence, the
sensitivity of the nanostructured chips is higher than that
of standard chips.
The dependences of position of SPR resonance,
θmin, on the refractive index of the environment are
shown in more detail in Figs. 2a-2c for two-channel
chips, one half of which were covered with the flat,
unstructured gold film and the other half obtained the
surface relief in the form of Au grating with the period
302.0±0.5 nm and depth of relief 17.5±2 nm. The
samples were fixed in the SPR refractometer in a way
that the plane of incidence of the probing p-polarized
laser beam was parallel to the grating wave vector
(perpendicular to the grating grooves, i.e. azimuthal
angle φ = 0). The sample in Fig. 2a is uncoated, whereas
Fig. 1. AFM image and cross-sectional profile of the Au grating with the period 296.6±0.5 nm, as-prepared (a), and coated with a
10 nm thick functional plasma polymer layer (b).
Semiconductor Physics, Quantum Electronics & Optoelectronics, 2017. V. 20, N 3. P. 362-368.
doi: https://doi.org/10.15407/spqeo20.03.362
© 2017, V. Lashkaryov Institute of Semiconductor Physics, National Academy of Sciences of Ukraine
365
Fig. 2. The dependences of the SPR position, θmin, on the refractive index of the environment, n, for Au standard chips with a flat
surface (curve 1 in (a), (b), and (c)) and Au gratings with the period 302.0±0.5 nm and depth of relief 17.5±2 nm (curve 2 in (a),
(b) and (c)). The samples in (a) are uncoated; in (b) and (c) – coated with 5 and 10 nm thick functional plasma polymer layers,
respectively.
the samples in Figs. 2b and 2c are coated with 5 and
10 nm thick functional plasma polymer layers,
respectively. The curves 1 in all the plots give the
dependence of θmin on n for the standard Au film with
the flat (non-structured) surface. The coating thickness
for the nanofilms was selected to minimize potential
changes of the grating geometry before applying the
uniform oxygen-functionalized surface [18].
It can be seen for the uncoated sample (Fig. 2a) that
the angular position of θmin on the unstructured Au film
increases monotonically with the refractive index n, and
the slope of this dependence (the ratio Δθmin to Δn) is
almost constant within the entire investigation interval of
n. For the structured Au chip (curves 2), the dependence
of θmin on n is nonlinear. When approaching the Bragg
resonance condition, the slope of this dependence is
noticeably lower in comparison with the result obtained
for the standard chip. Consequently, a region with the
enhanced slope (and, accordingly, with higher
sensitivity) can be observed in the narrow interval of
refractive index variation near Bragg resonance
(Δn = 0.0066; in Fig. 2a, this section lies between two
vertical dashed lines). The experimental data points
obtained for both the standard and structured chips in the
range of enhanced sensitivity are approximated by
straight line segments. The ratio between the slopes of
those segments, i.e., the sensitivity ratio between the
structured and standard chips, amounts to 3.6.
In our previous paper [12], it was shown that the
degree of sensitivity enhancement and the range of the
environment refractive index value, in which this
enhancement was observed (operation range), strongly
depended on the depth of the grating relief. The width of
the refractive index operation range decreased with the
increasing depth of relief, while the sensitivity was
increased. It was found that optimum values of the relief
depth for increasing the sensitivity of SPR sensors were
between 10 and 23 nm. A two-to-fourfold gain in
sensitivity could thus be experimentally realized for SPR
biosensors by forming a grating on the operation surface
of the sensor chips. Thus, for the functionalization of
these grated chips, ultrathin (here: 5 and 10 nm thick)
and highly stable plasma polymer films are required as
described in what follows.
Figs. 2b and 2c shows how the functional plasma
polymer layers deposited on the gold surfaces affects the
sensitivity of the chips (both standard and
nanostructured). It is seen that, for the standard Au chips
by increasing the film thickness, the values of θmin are
increased within the entire investigation interval of n, as
compared with the uncoated Au chip. For example, for
n = 1.36, θmin is increased from 61.46° (for uncoated Au)
to 62.62° and 63.42° for coated chips with 5 and 10 nm
thick plasma polymer layers, respectively. However, the
slope of θmin on n dependence, and hence the sensitivity,
is not changed and remains about 100 deg/RIU (where
RIU stands for refractive index unit).
Similarly, the values of θmin increased with
increasing the thickness of plasma polymer film on the
nanostructured chips (Figs. 2b, 2c, curves 2). In addition,
the film deposition on the chip surface resulted in the
shift of the operation range position by 0.0086 RIU (for
5 nm) and 0.0144 RIU (for 10 nm) to smaller values of n
in comparison with the non-coated chips. The width of
the operation range slightly increased from 0.0066 RIU
for the uncoated chip to 0.0068 RIU and 0.009 RIU for
the chips with 5 and 10 nm of plasma coating,
respectively. The sensitivity in the operation range
remained almost unchanged independently of the
functionalization added to the SPR chips, giving values
of 360 deg/RIU, 380 deg/RIU and 360 deg/RIU (Figs.
2a-2c, curves 2).
Semiconductor Physics, Quantum Electronics & Optoelectronics, 2017. V. 20, N 3. P. 362-368.
doi: https://doi.org/10.15407/spqeo20.03.362
© 2017, V. Lashkaryov Institute of Semiconductor Physics, National Academy of Sciences of Ukraine
366
Hence, the gain in sensitivity for sensor chips
owing to the nanostructuring of their surface can be
observed in a limited range of medium refractive index
variation. This conclusion agrees with the theoretical
results of ref. [10], where the enhancement was
predicted in a Δn-interval narrower than 0.01.
Biochemical processes investigated with SPR
refractometers are often accompanied by the deposition
of monolayers of biomolecules inducing very small
changes in the refractive index values. Considering a
refractive index resolution of SPR refractometers of
Δn ~ 10–6 RIU [6], the operation range Δn even less than
0.01 RIU appears to be sufficient for these measu-
rements.
The question is how to adjust the position of the
operation range with respect to the refractive index of
the investigated environment. We have shown recently
[12] that the most convenient method for the required
adjustment might be a change in the azimuth angle.
Fig. 3a shows the dependences of θmin on n for the same
two-channel chip as in Fig. 2b (coated with a 5 nm thick
functional plasma polymer layer), but the sample was
fixed in the SPR refractometer so that the plane of
incidence was rotated by 4.6 degrees with respect to the
grating wave vector (φ = 4.6°). Fig. 3b gives the results
for the same sample at φ = 7.5°. It is evident that the
operation range was shifted towards higher refractive
indices with increasing the azimuthal angle, by 0.01 RIU
at φ = 4.6° and by 0.023 RIU at φ = 7.5°.
Fig. 4 displays the similar dependences for the two-
channel chip coated with 10 nm thick functional plasma
polymer layer (the same as in Fig. 2c). The sample was
fixed in the SPR refractometer at φ = 6.0° (a) and
φ = 11.0° (b). In this case, the operation range was also
shifted towards higher refractive indices with increase of
the azimuthal angle by 0.011 RIU at φ = 6.0° and by
0.039 RIU at φ = 11°. In both cases, the increase of the
azimuthal angle also induced a slightly widened
operation range.
Immunosensor applications require stable surfaces,
when immersion into aqueous conditions is used [15, 22,
25]. Since the applied plasma polymer thickness yields a
shift of the operation range position, it is important to
demonstrate that the structured chips coated with a
functional plasma layer remain stable in aqueous
environments, i.e., unveil no film loss. Fig. 5 displays
the results of the stability test in distilled water over 4
days for the sample coated with 5 nm thick a-C:H:O
plasma polymer layers. Curve 1 shows the dependence
of θmin on n for the Au film with unstructured surface,
curve 2 the same dependence for the as-prepared
nanostructured chip (Au grating with the period of
302.0±0.5 nm and the depth of relief of 19±2 nm). The
samples were oriented in the way that the plane of
incidence was perpendicular to the grating grooves.
Curve 3 finally gives the results obtained on the same
sample after immersion in water. It is evident that the
chip sensitivity characteristics have not changed during
immersion in water (deviations between curves 2 and 3
are within measurement errors). Hence, the functional a-
C:H:O films as deposited on the Au chips were found to
be stable in aqueous medium for at least 4 days.
Fig. 3. The dependences of SPR position, θmin, on the refractive index of the environment, n, for the Au standard sensor (curves 1)
and Au gratings with the period 302.0±0.5 nm and depth of relief 17.5±2 nm (curves 2) coated with 5 nm thick functional plasma
polymer layer: (a) φ = 4.6° and (b) φ = 7.5°.
Semiconductor Physics, Quantum Electronics & Optoelectronics, 2017. V. 20, N 3. P. 362-368.
doi: https://doi.org/10.15407/spqeo20.03.362
© 2017, V. Lashkaryov Institute of Semiconductor Physics, National Academy of Sciences of Ukraine
367
Fig. 4. The same dependences as in Fig. 3, for the identical sample coated with 10 nm thick functional plasma polymer layer: (a)
φ = 6° and (b) φ = 11°.
Fig. 5. The dependences of θmin on n for the Au standard
sensor (curves 1) and Au grating with the period 302.0±0.5 nm
and relief depth 19±2 nm, coated with 5 nm thick functional
plasma polymer layer at φ = 0°: as-prepared (curves 2), and
after immersion in H2O for 96 hours (curves 3).
4. Conclusions
The obtained results demonstrate that functionalization
of the chip surface by plasma polymer nanofilms of
nominal 5 and 10 nm thickness did not affect the
sensitivity of SPR Au chips (both standard and
nanostructured). This functionalization of the
nanostructured chips with the enhanced sensitivity
merely results in the shift of the operation range position
to smaller values of the refractive index of the studied
environment with increase in the plasma polymer film
thickness. The operation range position, however, can be
adjusted to the refractive index of the environment by
the azimuthal rotation of the chip. Hence, with small
variations of the azimuth angle, SPR measurements can
be performed making use of the increased sensitivity (a
two-to-fourfold gain in sensitivity can be realized) over a
wide range of the refractive index changes. In addition,
the plasma polymer deposition enables functionalization
of the single nanostructured chip (here, with oxygen-
functional groups) without deteriorating the beneficial
effects due to the nanograting. These plasma polymer
layers were stable in aqueous medium for at least 4 days.
Acknowledgement
The involved institutes are grateful for funding by the
Swiss National Science Foundation (SNSF), grant no.
IZ73Z0_152661 – SCOPES.
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|
| id | nasplib_isofts_kiev_ua-123456789-214944 |
| institution | Digital Library of Periodicals of National Academy of Sciences of Ukraine |
| issn | 1560-8034 |
| language | English |
| last_indexed | 2026-03-18T21:17:58Z |
| publishDate | 2017 |
| publisher | Інститут фізики напівпровідників імені В.Є. Лашкарьова НАН України |
| record_format | dspace |
| spelling | Indutnyi, I.Z. Ushenin, Yu.V. Hegemann, D. Vandenbossche, M. Myn’ko, V.I. Shepeliavyi, P.E. Lukaniuk, M.V. Lytvyn, P.M. Khrystosenko, R.V. 2026-03-05T12:01:08Z 2017 Enhancing sensitivity of SPR sensors using nanostructured Au chips coated with functional plasma polymer nanofilms / I.Z. Indutnyi, Yu.V. Ushenin, D. Hegemann, M. Vandenbossche, V.I. Myn’ko, P.E. Shepeliavyi, M.V. Lukaniuk, P.M. Lytvyn, R.V. Khrystosenko // Semiconductor Physics Quantum Electronics & Optoelectronics. — 2017. — Т. 20, № 3. — С. 362-368. — Бібліогр.: 25 назв. — англ. 1560-8034 PACS: 73.20.Mf, 87.85.fk, 81.16.Nd https://nasplib.isofts.kiev.ua/handle/123456789/214944 https://doi.org/10.15407/spqeo20.03.362 The sensitivity of surface plasmon resonance (SPR) sensors operating in the Kretschmann configuration was investigated using Au SPR chips with a nano-grating surface functionalized via deposition of a-C:H:O plasma polymer films. The surface of the chips was nanopatterned in order to improve the sensitivity of the sensor, as compared with the sensitivity of standard Au chips with a flat (unstructured) surface. It was found that deposition of the plasma polymer nanofilms neither affected the degree of refractometer sensitivity enhancement, nor the width of the operation range of the environment refractive index (n), in which the enhancement was observed. Such functionalization of the chip surface merely resulted in the shift of the operation range position to smaller values of n in comparison to non-coated chips, requiring deposition of stable functional films. The involved institutes are grateful for funding by the Swiss National Science Foundation (SNSF), grant no. IZ73Z0_152661 – SCOPES. en Інститут фізики напівпровідників імені В.Є. Лашкарьова НАН України Semiconductor Physics Quantum Electronics & Optoelectronics Enhancing sensitivity of SPR sensors using nanostructured Au chips coated with functional plasma polymer nanofilms Article published earlier |
| spellingShingle | Enhancing sensitivity of SPR sensors using nanostructured Au chips coated with functional plasma polymer nanofilms Indutnyi, I.Z. Ushenin, Yu.V. Hegemann, D. Vandenbossche, M. Myn’ko, V.I. Shepeliavyi, P.E. Lukaniuk, M.V. Lytvyn, P.M. Khrystosenko, R.V. |
| title | Enhancing sensitivity of SPR sensors using nanostructured Au chips coated with functional plasma polymer nanofilms |
| title_full | Enhancing sensitivity of SPR sensors using nanostructured Au chips coated with functional plasma polymer nanofilms |
| title_fullStr | Enhancing sensitivity of SPR sensors using nanostructured Au chips coated with functional plasma polymer nanofilms |
| title_full_unstemmed | Enhancing sensitivity of SPR sensors using nanostructured Au chips coated with functional plasma polymer nanofilms |
| title_short | Enhancing sensitivity of SPR sensors using nanostructured Au chips coated with functional plasma polymer nanofilms |
| title_sort | enhancing sensitivity of spr sensors using nanostructured au chips coated with functional plasma polymer nanofilms |
| url | https://nasplib.isofts.kiev.ua/handle/123456789/214944 |
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