Ievtushenko, A., Dusheyko, M., Karpyna, V., Bykov, O., Lytvyn, P., Olifan, O., . . . Lashkarev, G. (2017). The influence of substrate temperature on properties of Cu-Al-O films deposited using the reactive ion beam sputtering method. Semiconductor Physics Quantum Electronics & Optoelectronics.
Чикаго стиль цитування (17-те видання)Ievtushenko, A.I, et al. "The Influence of Substrate Temperature on Properties of Cu-Al-O Films Deposited Using the Reactive Ion Beam Sputtering Method." Semiconductor Physics Quantum Electronics & Optoelectronics 2017.
Стиль цитування MLA (8-ме видання)Ievtushenko, A.I, et al. "The Influence of Substrate Temperature on Properties of Cu-Al-O Films Deposited Using the Reactive Ion Beam Sputtering Method." Semiconductor Physics Quantum Electronics & Optoelectronics, 2017.