APA (7th ed.) Citation

Bacherikov, Y., Dmitruk, N., Konakova, R., Kolomys, O., Okhrimenko, O., Strelchuk, V., . . . Svetlichnyi, A. (2018). Comparison of properties inherent to thin titanium oxide films formed by rapid thermal annealing on SiC and porous SiC substrates. Semiconductor Physics Quantum Electronics & Optoelectronics.

Chicago Style (17th ed.) Citation

Bacherikov, Yu.Yu, N.L Dmitruk, R.V Konakova, O.F Kolomys, O.B Okhrimenko, V.V Strelchuk, O.S Lytvyn, L.M Kapitanchuk, and A.M Svetlichnyi. "Comparison of Properties Inherent to Thin Titanium Oxide Films Formed by Rapid Thermal Annealing on SiC and Porous SiC Substrates." Semiconductor Physics Quantum Electronics & Optoelectronics 2018.

MLA (8th ed.) Citation

Bacherikov, Yu.Yu, et al. "Comparison of Properties Inherent to Thin Titanium Oxide Films Formed by Rapid Thermal Annealing on SiC and Porous SiC Substrates." Semiconductor Physics Quantum Electronics & Optoelectronics, 2018.

Warning: These citations may not always be 100% accurate.