Buchumschlag

Comparison of properties inherent to thin titanium oxide films formed by rapid thermal annealing on SiC and porous SiC substrates

The comparative analysis of optical characteristics inherent to TiO₂/SiC and TiO₂/por-SiC/SiC structures has been performed. It has been shown that, in these structures, regardless of the substrate structure, formation of TiO₂ layers with approximately the same width, 60 nm, takes place. In this cas...

Ausführliche Beschreibung

Gespeichert in:
Bibliographische Detailangaben
Veröffentlicht in:Semiconductor Physics Quantum Electronics & Optoelectronics
Datum:2018
Hauptverfasser: Bacherikov, Yu.Yu., Dmitruk, N.L., Konakova, R.V., Kolomys, O.F., Okhrimenko, O.B., Strelchuk, V.V., Lytvyn, O.S., Kapitanchuk, L.M., Svetlichnyi, A.M.
Format: Artikel
Sprache:Englisch
Veröffentlicht: Інститут фізики напівпровідників імені В.Є. Лашкарьова НАН України 2018
Schlagworte:
Sensors
Online Zugang:https://nasplib.isofts.kiev.ua/handle/123456789/215195
Tags: Tag hinzufügen
Keine Tags, Fügen Sie den ersten Tag hinzu!
Назва журналу:Digital Library of Periodicals of National Academy of Sciences of Ukraine
Zitieren:Comparison of properties inherent to thin titanium oxide films formed by rapid thermal annealing on SiC and porous SiC substrates / Yu.Yu. Bacherikov, N.L. Dmitruk, R.V. Konakova, O.F. Kolomys, O.B. Okhrimenko, V.V. Strelchuk, O.S. Lytvyn, L.M. Kapitanchuk, A.M. Svetlichnyi // Semiconductor Physics Quantum Electronics & Optoelectronics. — 2018. — Т. 21, № 2. — С. 200-205. — Бібліогр.: 24 назв. — англ.

Institution

Digital Library of Periodicals of National Academy of Sciences of Ukraine

Ähnliche Einträge

Ähnliche Einträge