Ellipsometry of hybrid noble metal-dielectric nanostructures

Angular ellipsometric measurements of thin Ag and Cu films covered by a HfO₂ protective layer were performed. The ellipsometric parameters ψ and ∆ were measured in θ = 43°…85° light incidence angle range, where ψ is the azimuth of restored linear polarization, ∆ and is the phase shift between p- and...

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Veröffentlicht in:Semiconductor Physics Quantum Electronics & Optoelectronics
Datum:2018
Hauptverfasser: Yampolskiy, A.L., Makarenko, O.V., Poperenko, L.V., Lysiuk, V.O.
Format: Artikel
Sprache:Englisch
Veröffentlicht: Інститут фізики напівпровідників імені В.Є. Лашкарьова НАН України 2018
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Online Zugang:https://nasplib.isofts.kiev.ua/handle/123456789/215317
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Назва журналу:Digital Library of Periodicals of National Academy of Sciences of Ukraine
Zitieren:Ellipsometry of hybrid noble metal-dielectric nanostructures / A.L. Yampolskiy, O.V. Makarenko, L.V. Poperenko, V.O. Lysiuk // Semiconductor Physics Quantum Electronics & Optoelectronics. — 2018. — Т. 21, № 4. — С. 412-416. — Бібліогр.: 16 назв. — англ.

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