The effect of ion implantation on structural damage in compositionally graded AlGaN layers
Compositionally graded AlₓGa₁₋ₓN alloys with the Al concentration in the (7 ≤ x ≤ 32) range were implanted with Ar+ ions to study the structural and strain changes (strain engineering). It was shown that ion implantation leads to ~0.3…0.46% hydrostatic strains and a relatively low damage of the crys...
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| Опубліковано в: | Semiconductor Physics Quantum Electronics & Optoelectronics |
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| Дата: | 2019 |
| ISSN: | 1560-8034 |
| Автори: | , , , , , , |
| Формат: | Стаття |
| Мова: | Англійська |
| Опубліковано: |
Інститут фізики напівпровідників імені В.Є. Лашкарьова НАН України
2019
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| Теми: | |
| Онлайн доступ: | https://nasplib.isofts.kiev.ua/handle/123456789/215418 |
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| Назва журналу: | Digital Library of Periodicals of National Academy of Sciences of Ukraine |
| Цитувати: | The effect of ion implantation on structural damage in compositionally graded AlGaN layers / O.I. Liubchenko, V.P. Kladko, H.V. Stanchu, T.M. Sabov, V.P. Melnik, S.B. Kryvyi, A.Ye. Belyaev // Semiconductor Physics Quantum Electronics & Optoelectronics. — 2019. — Т. 22, № 1. — С. 119-129. — Бібліогр.: 40 назв. — англ. |
Репозитарії
Digital Library of Periodicals of National Academy of Sciences of Ukraine| _version_ | 1862661983398002688 |
|---|---|
| author | Liubchenko, O.I. Kladko, V.P. Stanchu, H.V. Sabov, T.M. Melnik, V.P. Kryvyi, S.B. Belyaev, A.Ye. |
| author_facet | Liubchenko, O.I. Kladko, V.P. Stanchu, H.V. Sabov, T.M. Melnik, V.P. Kryvyi, S.B. Belyaev, A.Ye. |
| citation_txt | The effect of ion implantation on structural damage in compositionally graded AlGaN layers / O.I. Liubchenko, V.P. Kladko, H.V. Stanchu, T.M. Sabov, V.P. Melnik, S.B. Kryvyi, A.Ye. Belyaev // Semiconductor Physics Quantum Electronics & Optoelectronics. — 2019. — Т. 22, № 1. — С. 119-129. — Бібліогр.: 40 назв. — англ. |
| collection | DSpace DC |
| container_title | Semiconductor Physics Quantum Electronics & Optoelectronics |
| description | Compositionally graded AlₓGa₁₋ₓN alloys with the Al concentration in the (7 ≤ x ≤ 32) range were implanted with Ar+ ions to study the structural and strain changes (strain engineering). It was shown that ion implantation leads to ~0.3…0.46% hydrostatic strains and a relatively low damage of the crystal structure. The ion-implantation leads mainly to an increase in the density of point defects, while the dislocation configuration is almost unaffected. The density of microdefects is sufficiently reduced after the post implantation annealing. The structural quality of the AlₓGa₁₋ₓN layers strongly depends on the Al concentration and worsens with increasing Al. The implantation-induced structural changes in highly dislocated AlₓGa₁₋ₓN layers are generally less pronounced. Based on the X-ray diffraction, a model is developed to explain the strain field behavior in the AlₓGa₁₋ₓN/GaN heterostructures by migration of point defects and strain field redistribution. The approach to simulate 2θ/ω scans using statistical dynamical theory of X-ray diffraction for implanted compositionally graded structures, AlGaN, has been developed.
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| first_indexed | 2026-03-23T18:50:58Z |
| format | Article |
| fulltext | |
| id | nasplib_isofts_kiev_ua-123456789-215418 |
| institution | Digital Library of Periodicals of National Academy of Sciences of Ukraine |
| issn | 1560-8034 |
| language | English |
| last_indexed | 2026-03-23T18:50:58Z |
| publishDate | 2019 |
| publisher | Інститут фізики напівпровідників імені В.Є. Лашкарьова НАН України |
| record_format | dspace |
| spelling | Liubchenko, O.I. Kladko, V.P. Stanchu, H.V. Sabov, T.M. Melnik, V.P. Kryvyi, S.B. Belyaev, A.Ye. 2026-03-16T10:57:54Z 2019 The effect of ion implantation on structural damage in compositionally graded AlGaN layers / O.I. Liubchenko, V.P. Kladko, H.V. Stanchu, T.M. Sabov, V.P. Melnik, S.B. Kryvyi, A.Ye. Belyaev // Semiconductor Physics Quantum Electronics & Optoelectronics. — 2019. — Т. 22, № 1. — С. 119-129. — Бібліогр.: 40 назв. — англ. 1560-8034 PACS: 61.05.-a, 61.05.C-, 61.10.Nz, 61.72.-y, 68.55.Ln, 68.65.-k, 78.55.Cr, 78.70.Ck https://nasplib.isofts.kiev.ua/handle/123456789/215418 https://doi.org/10.15407/spqeo22.01.119 Compositionally graded AlₓGa₁₋ₓN alloys with the Al concentration in the (7 ≤ x ≤ 32) range were implanted with Ar+ ions to study the structural and strain changes (strain engineering). It was shown that ion implantation leads to ~0.3…0.46% hydrostatic strains and a relatively low damage of the crystal structure. The ion-implantation leads mainly to an increase in the density of point defects, while the dislocation configuration is almost unaffected. The density of microdefects is sufficiently reduced after the post implantation annealing. The structural quality of the AlₓGa₁₋ₓN layers strongly depends on the Al concentration and worsens with increasing Al. The implantation-induced structural changes in highly dislocated AlₓGa₁₋ₓN layers are generally less pronounced. Based on the X-ray diffraction, a model is developed to explain the strain field behavior in the AlₓGa₁₋ₓN/GaN heterostructures by migration of point defects and strain field redistribution. The approach to simulate 2θ/ω scans using statistical dynamical theory of X-ray diffraction for implanted compositionally graded structures, AlGaN, has been developed. en Інститут фізики напівпровідників імені В.Є. Лашкарьова НАН України Semiconductor Physics Quantum Electronics & Optoelectronics Sensors The effect of ion implantation on structural damage in compositionally graded AlGaN layers Article published earlier |
| spellingShingle | The effect of ion implantation on structural damage in compositionally graded AlGaN layers Liubchenko, O.I. Kladko, V.P. Stanchu, H.V. Sabov, T.M. Melnik, V.P. Kryvyi, S.B. Belyaev, A.Ye. Sensors |
| title | The effect of ion implantation on structural damage in compositionally graded AlGaN layers |
| title_full | The effect of ion implantation on structural damage in compositionally graded AlGaN layers |
| title_fullStr | The effect of ion implantation on structural damage in compositionally graded AlGaN layers |
| title_full_unstemmed | The effect of ion implantation on structural damage in compositionally graded AlGaN layers |
| title_short | The effect of ion implantation on structural damage in compositionally graded AlGaN layers |
| title_sort | effect of ion implantation on structural damage in compositionally graded algan layers |
| topic | Sensors |
| topic_facet | Sensors |
| url | https://nasplib.isofts.kiev.ua/handle/123456789/215418 |
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