The effect of ion implantation on structural damage in compositionally graded AlGaN layers

• Veröffentlicht in: Semiconductor Physics Quantum Electronics & Optoelectronics
• Datum: 2019
• Hauptverfasser: Liubchenko, O.I., Kladko, V.P., Stanchu, H.V., Sabov, T.M., Melnik, V.P., Kryvyi, S.B., Belyaev, A.Ye.
• Format: Artikel
• Sprache: Englisch
• Veröffentlicht: Інститут фізики напівпровідників імені В.Є. Лашкарьова НАН України 2019
• Schlagworte: Sensors
• Online Zugang: https://nasplib.isofts.kiev.ua/handle/123456789/215418
• Назва журналу: Digital Library of Periodicals of National Academy of Sciences of Ukraine
• Zitieren: The effect of ion implantation on structural damage in compositionally graded AlGaN layers / O.I. Liubchenko, V.P. Kladko, H.V. Stanchu, T.M. Sabov, V.P. Melnik, S.B. Kryvyi, A.Ye. Belyaev // Semiconductor Physics Quantum Electronics & Optoelectronics. — 2019. — Т. 22, № 1. — С. 119-129. — Бібліогр.: 40 назв. — англ.

Compositionally graded AlₓGa₁₋ₓN alloys with the Al concentration in the (7 ≤ x ≤ 32) range were implanted with Ar+ ions to study the structural and strain changes (strain engineering). It was shown that ion implantation leads to ~0.3…0.46% hydrostatic strains and a relatively low damage of the crys...