Mechanical strain in the structure of an array of silicon nanowires grown on a silicon substrate

We present experimental research on mechanical strains in the structure consisting of an array of silicon nanowires grown using the metal-enhanced CVD technique on boron-doped Si(111) and Si(100) substrates. Using the electron beam induced current on a cleaved substrate, electron spin resonance, and...

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Veröffentlicht in:Semiconductor Physics Quantum Electronics & Optoelectronics
Datum:2019
Hauptverfasser: Klimovskaya, A.I., Shanina, B.D., Nikolenko, A.S., Lytvyn, P.M., Kalashnyk, Yu.Yu., Strelchuk, V.V.
Format: Artikel
Sprache:Englisch
Veröffentlicht: Інститут фізики напівпровідників імені В.Є. Лашкарьова НАН України 2019
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Online Zugang:https://nasplib.isofts.kiev.ua/handle/123456789/215498
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Назва журналу:Digital Library of Periodicals of National Academy of Sciences of Ukraine
Zitieren:Mechanical strain in the structure of an array of silicon nanowires grown on a silicon substrate / A.I. Klimovskaya, B.D. Shanina, A.S. Nikolenko, P.M. Lytvyn, Yu.Yu. Kalashnyk, V.V. Strelchuk // Semiconductor Physics Quantum Electronics & Optoelectronics. — 2019. — Т. 22, № 3. — С. 293-298. — Бібліогр.: 23 назв. — англ.

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Digital Library of Periodicals of National Academy of Sciences of Ukraine