Properties of nanosized ZnO:Ho films deposited using explosive evaporation

The properties of nanosized ZnO:Ho thin films deposited by the explosive evaporation method have been studied. This work is aimed at studying the effect of high deposition rate on the oxide characteristics of interest from the viewpoint of photocatalysis, namely: morphology and structure, electrical...

Ausführliche Beschreibung

Gespeichert in:
Bibliographische Detailangaben
Veröffentlicht in:Semiconductor Physics Quantum Electronics & Optoelectronics
Datum:2021
Hauptverfasser: Kаsumov, А.М., Strelchuk, V.V., Kolomys, О.F., Bykov, О.І., Yukhymchuk, V.О., Zahornyi, М.М., Kоrotkov, K.А., Kаravaieva, V.М., Kоrychev, S.F., Ievtushenko, А.І.
Format: Artikel
Sprache:Englisch
Veröffentlicht: Інститут фізики напівпровідників імені В.Є. Лашкарьова НАН України 2021
Schlagworte:
Online Zugang:https://nasplib.isofts.kiev.ua/handle/123456789/216183
Tags: Tag hinzufügen
Keine Tags, Fügen Sie den ersten Tag hinzu!
Назва журналу:Digital Library of Periodicals of National Academy of Sciences of Ukraine
Zitieren:Properties of nanosized ZnO:Ho films deposited using explosive evaporation / А.М. Kаsumov, V.V. Strelchuk, О.F. Kolomys, О.І. Bykov, V.О. Yukhymchuk, М.М. Zahornyi, K.А. Kоrotkov, V.М. Kаravaieva, S.F. Kоrychev, А.І. Ievtushenko // Semiconductor Physics Quantum Electronics & Optoelectronics. — 2021. — Т. 24, № 2. — С. 139-147. — Бібліогр.: 36 назв. — англ.

Institution

Digital Library of Periodicals of National Academy of Sciences of Ukraine