Reduction of reverse leakage current at the TiO₂/GaN interface in field plate Ni/Au/-GaN Schottky diodes

This paper presents the fabrication procedure of a TiO₂ passivated field plate Schottky diode and gives a comparison of Ni/Au/-GaN Schottky barrier diodes without a field plate and with a field plate of varying diameters from 50 to 300 µm. The influence of field oxide (TiO₂) on the leakage current o...

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Veröffentlicht in:Semiconductor Physics Quantum Electronics & Optoelectronics
Datum:2021
Hauptverfasser: Shashikala, B.N., Nagabhushana, B.S.
Format: Artikel
Sprache:Englisch
Veröffentlicht: Інститут фізики напівпровідників імені В.Є. Лашкарьова НАН України 2021
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Online Zugang:https://nasplib.isofts.kiev.ua/handle/123456789/216298
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Назва журналу:Digital Library of Periodicals of National Academy of Sciences of Ukraine
Zitieren:Reduction of reverse leakage current at the TiO₂/GaN interface in field plate Ni/Au/-GaN Schottky diodes / B.N. Shashikala, B.S. Nagabhushana // Semiconductor Physics Quantum Electronics & Optoelectronics. — 2021. — Т. 24, № 4. — С. 399-406. — Бібліогр.: 27 назв. — англ.

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