Влияние протонного облучения на AlGaN/GaN транзисторы c высокой подвижностью электронов
Деградация транзисторов под влиянием протонного облучения с энергией 1,8 МэВ измерялась до плотности протонного излучения 3⋅10¹⁵ см⁻². Структуры c высокой электронной подвижностью на основе AlGaN/AlN/GaN имеют более высокое значение электронной мобильности, чем структуры на основе AlGaN/GaN, и облад...
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| Published in: | Наносистеми, наноматеріали, нанотехнології |
|---|---|
| Date: | 2011 |
| Main Authors: | Батаев, М., Батаев, Ю., Бриллсон, Л. |
| Format: | Article |
| Language: | Russian |
| Published: |
Інститут металофізики ім. Г.В. Курдюмова НАН України
2011
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| Online Access: | https://nasplib.isofts.kiev.ua/handle/123456789/73395 |
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| Journal Title: | Digital Library of Periodicals of National Academy of Sciences of Ukraine |
| Cite this: | Влияние протонного облучения на AlGaN/GaN транзисторы c высокой подвижностью электронов / М. Батаев, Ю. Батаев, Л. Бриллсон // Наносистеми, наноматеріали, нанотехнології: Зб. наук. пр. — К.: РВВ ІМФ, 2011. — Т. 9, № 1. — С. 85-92. — Бібліогр.: 8 назв. — рос. |
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